Effects of High Nitrogen Pressure and Thermal Treatment on Adhesion to Amorphous Silicon/Silicon Nitride/Polyethersulfone Substrate during Excimer Laser Annealing
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概要
- 論文の詳細を見る
- 2010-11-20
著者
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MATSUO Naoto
Department of Materials Science & Chemistry, University of Hyogo
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HEYA Akira
Department of Materials Science & Chemistry, University of Hyogo
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KAWAMOTO Naoya
Department of Electrical and Electronic Engineering, Yamaguchi University
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Matsumura Hideki
Japan Advanced Inst. Sci. And Technol. (jaist) Ishikawa Jpn
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MATSUMURA Hideki
School of Materials Science, Japan Advanced Institute of Science and Technology
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Heya Akira
Department Of Materials Science & Chemistry University Of Hyogo
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Kawamoto N
Department Of Electrical And Electronic Engineering Yamaguchi University
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Kawamoto Naoya
Department Of Electrical And Electronic Engineering Yamaguchi University
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Matsumura Hideki
School Of Materials Science Japan Advanced Institute Of Science And Technology (jaist)
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Matsumura Hideki
School Of Materials Science Jaist (japan Advanced Institute Of Science And Technology)
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Matsuo N
Department Of Materials Science & Chemistry University Of Hyogo
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Matsuo Naoto
Univ. Hyogo Hyogo
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Matsuo Naoto
Department Of Electrical And Electronic Engineering Yamaguchi University
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NISHIZAKI Shogo
School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST)
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OHDAIRA Keisuke
School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST)
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Ohdaira Keisuke
School Of Materials Science Japan Advanced Institute Of Science And Technology (jaist)
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Nishizaki Shogo
School Of Materials Science Japan Advanced Institute Of Science And Technology (jaist)
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Matsumura Hideki
School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST)
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Matsuo Naoto
Department of Electrical & Electronic Engineering, Yamaguchi University
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Matsumura Hideki
School of Material Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Kawamoto Naoya
Department of Electrical & Electronic Engineering, Yamaguchi University, 2557 Tokiwadai, Ube 755-8611, Japan
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