Effect of Hydrogen on Secondary Grain Growth of Polycrystalline Silicon Films by Excimer Laser Annealing in Low-Temperature Process

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2006-09-15

著者

• Matsumura Hideki

  Japan Advanced Inst. Sci. And Technol. (jaist) Ishikawa Jpn

• Heya Akira

  Department Of Materials Science & Chemistry University Of Hyogo

• Kawamoto N

  Department Of Electrical And Electronic Engineering Yamaguchi University

• Matsumura Hideki

  Japan Advanced Institute Of Science And Technology (jaist)

• HEYA Akira

  University of Hyogo

• MATSUO Naoto

  University of Hyogo

• KAWAMOTO Naoya

  Yamaguchi University

• Matsumura Hideki

  School Of Materials Science Japan Advanced Institute Of Science And Technology (jaist)

• Matsuo N

  Department Of Materials Science & Chemistry University Of Hyogo

• Matsuo Naoto

  Univ. Hyogo Hyogo

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