HEYA Akira | University of Hyogo
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概要
関連著者
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HEYA Akira
University of Hyogo
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MATSUO Naoto
University of Hyogo
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KAWAMOTO Naoya
Yamaguchi University
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SERIKAWA Tadashi
Osaka University
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Heya Akira
Department Of Materials Science & Chemistry University Of Hyogo
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Kawamoto N
Department Of Electrical And Electronic Engineering Yamaguchi University
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Matsuo N
Department Of Materials Science & Chemistry University Of Hyogo
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Matsuo Naoto
Univ. Hyogo Hyogo
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Matsuo Naoto
University of Hyogo, 2167 Shosha, Himeji, Hyogo 671-2280, Japan
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Matsumura Hideki
Japan Advanced Inst. Sci. And Technol. (jaist) Ishikawa Jpn
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Matsumura Hideki
Japan Advanced Institute Of Science And Technology (jaist)
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Matsumura Hideki
School Of Materials Science Japan Advanced Institute Of Science And Technology (jaist)
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Serikawa Tadashi
Osaka University, 11-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Heya Akira
University of Hyogo, 2167 Shosha, Himeji, Hyogo 671-2280, Japan
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Kawamoto Naoya
Yamaguchi University, 2-16-1 Tokiwadai, Ube, Yamaguchi 755-8611, Japan
著作論文
- Effect of Hydrogen on Secondary Grain Growth of Polycrystalline Silicon Films by Excimer Laser Annealing in Low-Temperature Process
- Excimer Laser Annealing of Hydrogen Modulation Doped a-Si Film
- Behavior of Hydrogen in Excimer Laser Annealing of Hydrogen-Modulation-Doped Amorphous Silicon Layer
- Properties of Surface-Modification Layer Generated by Atomic Hydrogen Annealing on Poly(ethylene naphthalate) Substrate
- Hydrogen Modulation-Doped Structures to Improve Crystalline Fraction of Polycrystalline Silicon Films Prepared by Excimer Laser Annealing at Low Energy Densities
- Surface Modification of Poly(ethylene naphthalate) Substrate and Its Effect on SiNx Film Deposition by Atomic Hydrogen Annealing
- Surface Treatment of Plastic Substrates using Atomic Hydrogen Generated on Heated Tungsten Wire at Low Temperatures