Matsumura Hideki | School Of Materials Science Japan Advanced Institute Of Science And Technology (jaist)

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概要

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著作論文

Catalytic CVD processes of oxidizing species and the prevention of　oxidization of heated tungsten filaments by H₂
Air-Stable p-Type and n-Type Carbon Nanotube Field-Effect Transistors with Top-Gate Structure on SiN_x Passivation Films Formed by Catalytic Chemical Vapor Deposition
Effect of Atomic Hydrogen on Preparation of Highly Moisture-Resistive SiN_x Films at Low Substrate Temperatures
Highly Moisture-Resistive SiN_x Films Prepared by Catalytic Chemical Vapor Deposition
Low-Resistivity Phosphorus-Doped Polycrystalline Silicon Thin Films Formed by Catalytic Chemical Vapor Deposition and Successive Rapid Thermal Annealing
Catalytic Chemical Sputtering: A Novel Method for Obtaining Large-Grain Polycrystalline Silicon : Surfaces, Interfaces, and Films
Control of Polycrystalline Silicon Structure by the Two-Step Deposition Method
Annealing Effect of Pb(Zr, Ti)O_3 Ferroelectric Capacitor in Active Ammonia Gas Cracked by Catalytic Chemical Vapor Deposition System
Role of Hydrogen in Polycrystalline Si by Excimer Laser Annealing
Effect of Hydrogen on Secondary Grain Growth of Polycrystalline Silicon Films by Excimer Laser Annealing in Low-Temperature Process
Effective Interaction for the Jastrow Model Wave Function with the Transcorrelated Method(Nuclear Physics)
Nanometer Pattern-Mask Fabricated by Conventional Photolithography
Radical Species Formed by the Catalytic Decomposition of NH3 on Heated W Surfaces
Effects of High Nitrogen Pressure and Thermal Treatment on Adhesion to Amorphous Silicon/Silicon Nitride/Polyethersulfone Substrate during Excimer Laser Annealing
Coating techniques of metal chambers for remote catalytic chemical vapor deposition applications

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