Matsumura Hideki | Japan Advanced Inst. Sci. And Technol. (jaist) Ishikawa Jpn
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概要
関連著者
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Matsumura Hideki
Japan Advanced Inst. Sci. And Technol. (jaist) Ishikawa Jpn
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Matsumura Hideki
School Of Materials Science Japan Advanced Institute Of Science And Technology (jaist)
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MASUDA Atsushi
Japan Advanced Institute of Science and Technology
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Matsumura Hideki
School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST)
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HEYA Akira
Industrial Research Institute of Ishikawa (IRII)
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IZUMI Akira
Japan Advanced Institute of Science and Technology (JAIST)
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Ohdaira Keisuke
Japan Advanced Inst. Of Sci. And Technol. (jaist) Asahidai Nomi-shi Ishikawa-ken 923-1292 Jpn
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NIKI Toshikazu
Japan Science and Technology Agency (JST)
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UMEMOTO Hironobu
Japan Advanced Institute of Science and Technology (JAIST)
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Masuda A
Japan Advanced Institute Of Science And Technology
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TAKANO Masahiro
Industrial Research Institute of Ishikawa (IRII)
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Nakamura T
National Defense Acad. Kanagawa Jpn
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YONEZAWA Yasuto
Industrial Research Institute of Ishikawa (IRII)
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MINAMIKAWA Toshiharu
Industrial Research Institute of Ishikawa (IRII)
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MATSUMURA Hideki
School of Materials Science, Japan Advanced Institute of Science and Technology
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HEYA Akira
JAIST(Japan Advanced Institute of Science and Technology)
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Niki Toshikazu
Ishikawa Seisakusho Ltd.
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Yonezawa Yasuto
Industrial Research Institute Of Ishikawa
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MUROI Susumu
Ishikawa Seisakusho, Ltd.
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MASUDA Atsushi
School of Materials Science, Japan Advanced Institute of Science and Technology
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Minamikawa Toshiharu
Industrial Research Institute Of Ishikawa
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Matsumura Hideki
School Of Materials Science Jaist (japan Advanced Institute Of Science And Technology)
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Izumi A
School Of Materials Science Japan Advanced Institute Of Science And Technology (jaist)
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Muroi Susumu
Ishikawa Seisakusho Ltd.
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Matsumura Hideki
School of Material Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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MINAMI Shigehira
Ishikawa Seisakusho, Ltd.
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Masuda Atsushi
School Of Materials Science Japan Advanced Institute Of Science And Technology
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Minami Shigehira
Ishikawa Seisakusho Ltd.
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Masuda Atsushi
School of Material Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Fujiwara Tomoko
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Endo Yohei
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Takano Masahiro
Industrial Research Institute of Ishikawa
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Kawamoto N
Department Of Electrical And Electronic Engineering Yamaguchi University
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Matsumura Hideki
Japan Advanced Institute Of Science And Technology (jaist)
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Nakamura T
Department Of Earth And Ocean Sciences National Defense Academy
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Matsuo N
Department Of Materials Science & Chemistry University Of Hyogo
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Matsuo Naoto
Univ. Hyogo Hyogo
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Miura T
Environmental Health Sciences Division National Lnstitute For Environmental Studies:(present Address
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Yonezawa Y
Industrial Research Institute Of Ishikawa
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Nishizaki Shogo
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Koyama Koichi
Japan Advanced Institute of Science and Technology (JAIST), Nomi, Ishikawa 923-1292, Japan
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Hayakawa Taro
Japan Advanced Institute of Science and Technology (JAIST), Nomi, Ishikawa 923-1292, Japan
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Nakashima Yuki
Japan Advanced Institute of Science and Technology (JAIST), Nomi, Ishikawa 923-1292, Japan
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MATSUO Naoto
Department of Materials Science & Chemistry, University of Hyogo
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KAWAMOTO Naoya
Department of Electrical and Electronic Engineering, Yamaguchi University
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Kasai Hiroto
Japan Advanced Institute of Science and Technology (JAIST)
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OSONO Tetsuo
Japan Advanced Institute of Science and Technology (JAIST)
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DOGUCHI Yoshiteru
Industrial Research Institute of Ishikawa (IRII)
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MORIMOTO Takashi
School of Materials Science, Japan Advanced Institute of Science and Technology
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UMEMOTO Hironobu
School of Materials Science, Japan Advanced Institute of Science and Technology
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IZUMI Akira
School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST)
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Heya Akira
Department Of Materials Science & Chemistry University Of Hyogo
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Usami Noritaka
Institute For Material Research Tohoku University
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Shiba Kazuhiro
Japan Advanced Institute Of Science And Technology (jaist)
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TAKEMOTO Hiroyuki
Japan Advanced Institute of Science and Technology (JAIST)
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Kawamoto Naoya
Department Of Electrical And Electronic Engineering Yamaguchi University
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Matsuo Naoto
Department Of Electrical And Electronic Engineering Yamaguchi University
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Ohdaira Keisuke
Green Devices Research Center, Japan Advanced Institute of Science and Technology (JAIST), Nomi, Ishikawa 923-1292, Japan
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Izumi Akira
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Matsuo Naoto
Department of Electrical & Electronic Engineering, Yamaguchi University
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Kawamoto Naoya
Department of Electrical & Electronic Engineering, Yamaguchi University, 2557 Tokiwadai, Ube 755-8611, Japan
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Hamada H
National Institute Of Fitness And Sports In Kanoya
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Hamada H
Materials And Devices Development Center Bu Sanyo Electric Co. Ltd.
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Morimoto Rui
School Of Materials Science Japan Advanced Institute Of Science And Technology (jaist)
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Morimoto Rui
School Of Materials Science Japan Advanced Institute Of Science And Technokogy (jaist)
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HEYA Akira
Department of Materials Science & Chemistry, University of Hyogo
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Miyoshi Tadaki
Department Of Electrical And Electronic Engineering Yamaguchi University
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Matsumura H
Japan Advanced Inst. Of Sci. And Technol. (jaist) Ishikawa Jpn
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Matsumura H
Japan Advanced Inst. Sci. And Technol. Ishikawa Jpn
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MAEHASHI Kenzo
The Institute of Scientific and Industrial Research, Osaka University
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MATSUMOTO Kazuhiko
The Institute of Scientific and Industrial Research, Osaka University
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高野 昌宏
石川県工業試験場機械金属部
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KAMINISHI Daisuke
The Institute of Scientific and Industrial Research, Osaka University
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OZAKI Hirokazu
The Institute of Scientific and Industrial Research, Osaka University
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OHNO Yasuhide
The Institute of Scientific and Industrial Research, Osaka University
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INOUE Koichi
The Institute of Scientific and Industrial Research, Osaka University
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SERI Yasuhiro
Japan Advanced Institute of Science and Technology
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NIKI Toshikazu
Ishikawa Seisakusho, Ltd.
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IKARI Tokuo
Kuraray Co., Ltd.
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YONEYAMA Koji
School of Materials Science, Japan Advanced Institute of Science and Technology
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ISHIBASHI Keiji
Advanced Technology Development Division, ANELVA Corporation
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TAWARAYAMA Hiromasa
Department of Materials Science and Engineering, Interdisciplinary Graduate School of Science and En
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KAWAZOE Hiroshi
Kawazoe Frontier Technologies Corporation
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KAMESAKI. Koji
School of Materials Science, JAIST (Japan Advanced Institute of Science and Technology)
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IZUMI Akira
JAIST(Japan Advanced Institute of Science and Technology)
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MASUDA Atsushi
JAIST(Japan Advanced Institute of Science and Technology)
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MATSUMURA Hideki
JAIST(Japan Advanced Institute of Science and Technology)
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Minamikawa Toshiharu
Japan Advanced Institute of Science and Technology
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Nakamura Takashi
Japan Advanced Institute of Science and Technology
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Fujimori Yoshikazu
Japan Advanced Institute of Science and Technology
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Ozaki Hirokazu
The Institute Of Scientific And Industrial Research Osaka University
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Maehashi Kenzo
The Institute Of Scientific And Industrial Research Osaka University
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Miyoshi Tadaki
Department Of Electrical And Electronic Engineering
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KITAMON Yoshitaka
Department of Electrical and Electronic Engineering, Yamaguchi University
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HARADA Yasunori
Department of Material Science and Solid State Physics, Graduate School of Engineering, University o
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HAMADA Hiroki
Materials and Devices Development Center BU, SANYO Electric Co., Ltd.
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Ohno Yasuhide
The Institute Of Scientific And Industrial Research Osaka University
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Matsumura H
Japan Advanced Institute Of Science And Technology (jaist)
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Matsumura Hideki
Graduate School Of Science And Engineering Tokyo Institute Of Technology
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FURUKAWA Seijiro
Department of Physical Electronics, Faculty of Engineering, Tokyo Institute of Technology
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HEYA Akira
University of Hyogo
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MATSUO Naoto
University of Hyogo
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KAWAMOTO Naoya
Yamaguchi University
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Sasaki Kimihiro
Department Of Electrical And Computer Engineering Faculty Of Engineering Kanazawa University
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Hamada Hiroki
Materials And Devices Development Center Bu Sanyo Electric Co. Ltd.
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Kaminishi Daisuke
The Institute Of Scientific And Industrial Research Osaka University
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Mochizuki Takayasu
Laboratory Of Advanced Science And Technology For Industry (lasti) University Of Hyogo
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Suzuki Yasuyuki
Department Of Cardiology Nihon University Surugadai Hospital
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Matsumura Hideki
Jaist (japan Advanced Institute Of Science And Technology)
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Izumi Akira
Jaist (japan Advanced Institute Of Science And Technology)
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Ikari Tokuo
Kuraray Co. Ltd.
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Ohara Kentaro
School Of Materials Science Japan Advanced Institute Of Science And Technology
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Morita Daisuke
School Of Materials Science Japan Advanced Institute Of Science And Technology
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Kamesaki. Koji
School Of Materials Science Jaist (japan Advanced Institute Of Science And Technology)
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TASHIRO Yoshinari
Department of Applied Electronics, Tokyo Institute of Technology
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NISHIZAKI Shogo
School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST)
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OHDAIRA Keisuke
School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST)
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Yamawaki Moroyuki
School of Materials Science, Japan Advanced Institute of Science and Technology, Asahidai, Tatsunoku
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Miyoshi T
Department Of Electrical And Electronic Engineering Yamaguchi University
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Matsumoto Kazuhiko
The Institute Of Scientific And Industrial Research Osaka University
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Ohdaira Keisuke
School Of Materials Science Japan Advanced Institute Of Science And Technology (jaist)
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Nishizaki Shogo
School Of Materials Science Japan Advanced Institute Of Science And Technology (jaist)
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Furukawa Seijiro
Department Of Applied Electronics Interdisciplinary Graduate School Of Science And Engineering Tokyo
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Fujimori Yoshikazu
Japan Advanced Institute Of Science And Technology:rohm Co. Ltd.
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Nakajima Kazuo
Institute For Materials Research (imr) Tohoku University
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Harada Yasunori
Department Of Material Science And Solid State Physics Graduate School Of Engineering University Of
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Yamawaki Moroyuki
School Of Materials Science Japan Advanced Institute Of Science And Technology
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Tashiro Y
Department Of Applied Electronics Tokyo Institute Of Technology
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Inoue Koichi
The Institute For Solid State Physics University Of Tokyo
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Furukawa Seijiro
Department Of Applied Electronics Graduate School Of Science And Technology
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Suzuki Yasuyuki
Department Of Anesthesia And Icu National Children's Hospital
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Kitagawa Y
Department Of Electrical And Electronic Engineering Yamaguchi University
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Kamesaki Koji
School of Materials Science, JAIST (Japan Advanced Institute of Science and Technology)
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Niki Toshikazu
Japan Science and Technology Agency (JST), 2-13 Asahidai, Nomi, Ishikawa 923-1211, Japan
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Miyamoto Motoharu
Japan Advanced Institute of Science and Technology (JAIST), Nomi, Ishikawa 923-1292, Japan
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Masuda Atsushi
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Masuda Atsushi
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Tatsunokuchi, Nomi, Ishikawa 923-1292, Japan
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Umemoto Hironobu
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Umemoto Hironobu
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Tatsunokuchi, Nomi, Ishikawa 923-1292, Japan
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Usami Noritaka
Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Osono Tetsuo
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Tatsunokuchi, Nomi, Ishikawa 923-1292, Japan
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Minamikawa Toshiharu
Industrial Research Institute of Ishikawa (IRII), 2-1 Kuratsuki, Kanazawa, Ishikawa 920-8203, Japan
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Minamikawa Toshiharu
Industrial Research Institute of Ishikawa (IRII), 1-2 Kuratsuki, Kanazawa, Ishikawa 920-8203, Japan
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Ohdaira Keisuke
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Keisuke Ohdaira
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Ohdaira Keisuke
Japan Advanced Institute of Science and Technology, Nomi, Ishikawa 923-1292, Japan
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Sawada Keisuke
Japan Advanced Institute of Science and Technology, Nomi, Ishikawa 923-1292, Japan
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Varlamov Sergey
University of New South Wales, Sydney, NSW 2052, Australia
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Yonezawa Yasuto
Industrial Research Institute of Ishikawa (IRII), 2-1 Kuratsuki, Kanazawa, Ishikawa 920-8203, Japan
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Kazuhiro Shiba
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Ohta Tatsunori
Japan Advanced Institute of Science and Technology (JAIST), Nomi, Ishikawa 923-1292, Japan
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Heya Akira
Industrial Research Institute of Ishikawa (IRII), 2-1 Kuratsuki, Kanazawa, Ishikawa 920-8203, Japan
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Heya Akira
Industrial Research Institute of Ishikawa (IRII), 1-2 Kuratsuki, Kanazawa, Ishikawa 920-8203, Japan
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Miyoshi Tadaki
Department of Electrical & Electronic Engineering, Yamaguchi University
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Ikari Tokuo
Kuraray Co., Ltd., 41 Miyukigaoka, Tsukuba, Ibaraki 305-0841, Japan
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Takano Masahiro
Industrial Research Institute of Ishikawa (IRII), 1-2 Kuratsuki, Kanazawa, Ishikawa 920-8203, Japan
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Minami Shigehira
Ishikawa Seisakusho, Ltd., 200 Fukudome, Matto, Ishikawa 924-0051, Japan
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Tomoko Fujiwara
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Doguchi Yoshiteru
Industrial Research Institute of Ishikawa (IRII), 1-2 Kuratsuki, Kanazawa, Ishikawa 920-8203, Japan
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Nakajima Kazuo
Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Nakajima Kazuo
Institute for Materials Reseach, Tohoku University, 2-1-1 Katahira-cho, Aoba-ku, Sendai 980-8577, Japan
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Matsumura Hideki
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Hideki Matsumura
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Matsumura Hideki
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Tatsunokuchi, Nomi, Ishikawa 923-1292, Japan
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Matsumura Hideki
Japan Advanced Institute of Science and Technology (JAIST), Nomi, Ishikawa 923-1292, Japan
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Niki Toshikazu
Japan Science and Technology Agency (JST), 2-13 Asahidai, Tatsunokuchi, Nomi, Ishikawa 923-1211, Japan
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Matsumura Hideki
Japan Advanced Institute of Science and Technology, Nomi, Ishikawa 923-1292, Japan
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Ishii Shohei
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Tomura Naohito
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
著作論文
- Theoretical Study for Drastic Improvement of Solar Cell Efficiency
- Catalytic CVD processes of oxidizing species and the prevention of oxidization of heated tungsten filaments by H₂
- Air-Stable p-Type and n-Type Carbon Nanotube Field-Effect Transistors with Top-Gate Structure on SiN_x Passivation Films Formed by Catalytic Chemical Vapor Deposition
- Preparation of Low-Stress SiN_x Films by Catalytic Chemical Vapor Deposition at Low Temperatures
- Improvement of Deposition Rate by Sandblasting of Tungsten Wire in Catalytic Chemical Vapor Deposition
- Moisture-Resistive Properties of SiN_x Films Prepared by Catalytic Chemical Vapor Deposition below 100℃ for Flexible Organic Light-Emitting Diode Displays
- Quantification of Gas-Phase H-Atom Number Density by Tungsten Phosphate Glass
- Effect of Atomic Hydrogen on Preparation of Highly Moisture-Resistive SiN_x Films at Low Substrate Temperatures
- Highly Moisture-Resistive SiN_x Films Prepared by Catalytic Chemical Vapor Deposition
- Low-Resistivity Phosphorus-Doped Polycrystalline Silicon Thin Films Formed by Catalytic Chemical Vapor Deposition and Successive Rapid Thermal Annealing
- Catalytic Chemical Sputtering: A Novel Method for Obtaining Large-Grain Polycrystalline Silicon : Surfaces, Interfaces, and Films
- Control of Polycrystalline Silicon Structure by the Two-Step Deposition Method
- Annealing Effect of Pb(Zr, Ti)O_3 Ferroelectric Capacitor in Active Ammonia Gas Cracked by Catalytic Chemical Vapor Deposition System
- Role of Hydrogen in Polycrystalline Si by Excimer Laser Annealing
- Drastic Improvement of Minority Carrier Lifetimes Observed in Hydrogen-Passivated Flash-Lamp-Crystallized Polycrystalline Silicon Films
- Optical Absorption Properties of Indium-Doped Thin Crystalline Silicon Films
- Effect of Hydrogen on Secondary Grain Growth of Polycrystalline Silicon Films by Excimer Laser Annealing in Low-Temperature Process
- Effective Interaction for the Jastrow Model Wave Function with the Transcorrelated Method(Nuclear Physics)
- Hall Mobility of Low-Temperature-Deposited Polysilicon Films by Catalytic Chemical Vapor Deposition Method
- Microstructure of Polycrystalline Silicon Films Formed through Explosive Crystallization Induced by Flash Lamp Annealing
- Radical Species Formed by the Catalytic Decomposition of NH3 on Heated W Surfaces
- Effects of High Nitrogen Pressure and Thermal Treatment on Adhesion to Amorphous Silicon/Silicon Nitride/Polyethersulfone Substrate during Excimer Laser Annealing
- Coating techniques of metal chambers for remote catalytic chemical vapor deposition applications
- Selection of Material for the Back Electrodes of Thin-Film Solar Cells Using Polycrystalline Silicon Films Formed by Flash Lamp Annealing
- Formation of Several-Micrometer-Thick Polycrystalline Silicon Films on Soda Lime Glass by Flash Lamp Annealing
- Distribution of Phosphorus Atoms and Carrier Concentrations in Single-Crystal Silicon Doped by Catalytically Generated Phosphorous Radicals
- Formation of Highly Uniform Micrometer-Order-Thick Polycrystalline Silicon Films by Flash Lamp Annealing of Amorphous Silicon on Glass Substrate
- Improvement of Deposition Rate by Sandblasting of Tungsten Wire in Catalytic Chemical Vapor Deposition
- Effect of Radical-Doped n+ Back Surface Field Layers on the Effective Minority Carrier Lifetimes of Crystalline Silicon with Amorphous Silicon Passivation Layers Deposited by Catalytic Chemical Vapor Deposition
- Large-Grain Polycrystalline Silicon Films Formed through Flash-Lamp-Induced Explosive Crystallization
- Low Temperature Phosphorus Doping in Silicon Using Catalytically Generated Radicals
- Preparation of Low-Stress SiNx Films by Catalytic Chemical Vapor Deposition at Low Temperatures
- High-Quality Polycrystalline Silicon Films with Minority Carrier Lifetimes over 5 μs Formed by Flash Lamp Annealing of Precursor Amorphous Silicon Films Prepared by Catalytic Chemical Vapor Deposition
- Moisture-Resistive Properties of SiNx Films Prepared by Catalytic Chemical Vapor Deposition below 100°C for Flexible Organic Light-Emitting Diode Displays