IZUMI Akira | Japan Advanced Institute of Science and Technology (JAIST)
スポンサーリンク
概要
関連著者
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IZUMI Akira
Japan Advanced Institute of Science and Technology (JAIST)
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Izumi A
School Of Materials Science Japan Advanced Institute Of Science And Technology (jaist)
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Matsumura Hideki
Japan Advanced Inst. Sci. And Technol. (jaist) Ishikawa Jpn
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MASUDA Atsushi
Japan Advanced Institute of Science and Technology
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HEYA Akira
Industrial Research Institute of Ishikawa (IRII)
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NIKI Toshikazu
Japan Science and Technology Agency (JST)
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UMEMOTO Hironobu
Japan Advanced Institute of Science and Technology (JAIST)
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TAKANO Masahiro
Industrial Research Institute of Ishikawa (IRII)
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HEYA Akira
JAIST(Japan Advanced Institute of Science and Technology)
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Matsumura Hideki
School Of Materials Science Japan Advanced Institute Of Science And Technology (jaist)
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Masuda A
Japan Advanced Institute Of Science And Technology
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Nakamura T
National Defense Acad. Kanagawa Jpn
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YONEZAWA Yasuto
Industrial Research Institute of Ishikawa (IRII)
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MINAMIKAWA Toshiharu
Industrial Research Institute of Ishikawa (IRII)
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MUROI Susumu
Ishikawa Seisakusho, Ltd.
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IZUMI Akira
School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST)
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Minamikawa Toshiharu
Industrial Research Institute Of Ishikawa
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Muroi Susumu
Ishikawa Seisakusho Ltd.
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Niki Toshikazu
Ishikawa Seisakusho Ltd.
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Yonezawa Yasuto
Industrial Research Institute Of Ishikawa
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Sokolov Nikolai
Ioffe Physico-technical Institute Russian Academy Of Sciences
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MINAMI Shigehira
Ishikawa Seisakusho, Ltd.
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TSUTSUI Kazuo
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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Tsutsui K
Sony Corp. Tokyo Jpn
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Minami Shigehira
Ishikawa Seisakusho Ltd.
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Tsutsui Kazuo
Interdisciplinary Graduate School Of Science & Engineering Tokyo Institute Of Technology
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Matsumura Hideki
School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST)
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Takano Masahiro
Industrial Research Institute of Ishikawa
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Ravikumar K.g.
Department Of Physical Electronics Tokyo Institute Of Technology
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Ravikumar K.g.
The Advanced Tech. R&d Center Fujikura Ltd.
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ARAI Shigehisa
Research Center for Quantum Effect Electronics, Tokyo Institute of Technology
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Arai S
Research Center For Quantum Effect Electronics Tokyo Institute Of Technology
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Arai Shigehisa
Department Of Physical Electronics Tokyo Institute Of Technology
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Arai Shigehisa
Faculty Of Engineering Tokyo Institute Of Technology
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DOGUCHI Yoshiteru
Industrial Research Institute of Ishikawa (IRII)
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MASUDA Atsushi
School of Materials Science, Japan Advanced Institute of Science and Technology
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MATSUMURA Hideki
School of Materials Science, Japan Advanced Institute of Science and Technology
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Arai Shigehisa
Department Of Electrical And Electronics Engineering Tokyo Institute Of Technology
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SUEMATSU Yasuharu
Department of Physical Electronics, Tokyo Institute of Technology
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KIKUGAWA Tomoyuki
Anritsu Co.
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SHIMOMURA Kazuhiko
Department of Physical Electronics, Tokyo Institute of Technology
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IZUMI Akira
Department of Physical Electronics, Tokyo Institute of Technology
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OHKI Yoshimasa
Department of Physical Electronics, Tokyo Institute of Technology
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Suematsu Yasuharu
Department Of Electronic Engineering Kohgakuin University
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Nakamura T
Department Of Earth And Ocean Sciences National Defense Academy
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Matsumura Hideki
School Of Materials Science Jaist (japan Advanced Institute Of Science And Technology)
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OHKI Yoshio
NTT Advanced Technology Corporation
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Ohki Y
Matsushita Electric Industrial Co. Ltd. Osaka Jpn
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Izumi Akira
Department Of Anatomy Iwate Medical University School Of Medicine
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Miura T
Environmental Health Sciences Division National Lnstitute For Environmental Studies:(present Address
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Yonezawa Y
Industrial Research Institute Of Ishikawa
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Shimomura K
Department Of Electrical And Electronic Engineering Sophia University
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Shimomura Kazuhiko
Department Of Electrical And Electronic Engineering Sophia Universiry
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Masuda Atsushi
School Of Materials Science Japan Advanced Institute Of Science And Technology
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MATSUBARA Noriyuki
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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KUSHIDA Yusuke
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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Kushida Yusuke
Interdisciplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Matsubara N
Nippon Concrete Industries Co. Ltd.
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Masuda Atsushi
School of Material Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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ARAI Shigehisa
Department of Electrical and Electronic Engineering, Tokyo Institute of Technology
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Izumi Akira
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Matsumura Hideki
School of Material Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Ravikumar K.
Department Of Physical Electronics Tokyo Institute Of Technology
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Morimoto Rui
School Of Materials Science Japan Advanced Institute Of Science And Technology (jaist)
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Morimoto Rui
School Of Materials Science Japan Advanced Institute Of Science And Technokogy (jaist)
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高野 昌宏
石川県工業試験場機械金属部
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IKARI Tokuo
Kuraray Co., Ltd.
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KAMESAKI. Koji
School of Materials Science, JAIST (Japan Advanced Institute of Science and Technology)
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IZUMI Akira
JAIST(Japan Advanced Institute of Science and Technology)
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MASUDA Atsushi
JAIST(Japan Advanced Institute of Science and Technology)
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MATSUMURA Hideki
JAIST(Japan Advanced Institute of Science and Technology)
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Matsumura Hideki
Jaist (japan Advanced Institute Of Science And Technology)
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Izumi Akira
Jaist (japan Advanced Institute Of Science And Technology)
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Ikari Tokuo
Kuraray Co. Ltd.
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Kamesaki. Koji
School Of Materials Science Jaist (japan Advanced Institute Of Science And Technology)
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IZUMI Akira
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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Kamesaki Koji
School of Materials Science, JAIST (Japan Advanced Institute of Science and Technology)
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Niki Toshikazu
Japan Science and Technology Agency (JST), 2-13 Asahidai, Nomi, Ishikawa 923-1211, Japan
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Masuda Atsushi
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Umemoto Hironobu
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Minamikawa Toshiharu
Industrial Research Institute of Ishikawa (IRII), 1-2 Kuratsuki, Kanazawa, Ishikawa 920-8203, Japan
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Heya Akira
Industrial Research Institute of Ishikawa (IRII), 1-2 Kuratsuki, Kanazawa, Ishikawa 920-8203, Japan
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Ikari Tokuo
Kuraray Co., Ltd., 41 Miyukigaoka, Tsukuba, Ibaraki 305-0841, Japan
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Takano Masahiro
Industrial Research Institute of Ishikawa (IRII), 1-2 Kuratsuki, Kanazawa, Ishikawa 920-8203, Japan
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Doguchi Yoshiteru
Industrial Research Institute of Ishikawa (IRII), 1-2 Kuratsuki, Kanazawa, Ishikawa 920-8203, Japan
著作論文
- Improvement of Deposition Rate by Sandblasting of Tungsten Wire in Catalytic Chemical Vapor Deposition
- Moisture-Resistive Properties of SiN_x Films Prepared by Catalytic Chemical Vapor Deposition below 100℃ for Flexible Organic Light-Emitting Diode Displays
- Effect of Atomic Hydrogen on Preparation of Highly Moisture-Resistive SiN_x Films at Low Substrate Temperatures
- Highly Moisture-Resistive SiN_x Films Prepared by Catalytic Chemical Vapor Deposition
- Low-Resistivity Phosphorus-Doped Polycrystalline Silicon Thin Films Formed by Catalytic Chemical Vapor Deposition and Successive Rapid Thermal Annealing
- Catalytic Chemical Sputtering: A Novel Method for Obtaining Large-Grain Polycrystalline Silicon : Surfaces, Interfaces, and Films
- Control of Polycrystalline Silicon Structure by the Two-Step Deposition Method
- Electric Field Induced Reflection in GaInAsP/InP MQW Structure
- Electric Field-Induced Absorption in GaInAsP/InP MQW Structures Grown by LPE
- Heteroepitaxial Growth of CdF_2 Layers on CaF_2/Si(111) by Molecular Beam Epitaxy
- CdF_2/CaF_2 Resonant Tunneling Diode Fabricated on Si(111)
- CdF_2/CaF_2 Resonant Tunneling Diode Fabricated on Si(111)
- Improvement of Deposition Rate by Sandblasting of Tungsten Wire in Catalytic Chemical Vapor Deposition
- Moisture-Resistive Properties of SiNx Films Prepared by Catalytic Chemical Vapor Deposition below 100°C for Flexible Organic Light-Emitting Diode Displays