Ohdaira Keisuke | Japan Advanced Inst. Of Sci. And Technol. (jaist) Asahidai Nomi-shi Ishikawa-ken 923-1292 Jpn
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概要
- 同名の論文著者
- Japan Advanced Inst. Of Sci. And Technol. (jaist) Asahidai Nomi-shi Ishikawa-ken 923-1292 Jpnの論文著者
関連著者
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Ohdaira Keisuke
Japan Advanced Inst. Of Sci. And Technol. (jaist) Asahidai Nomi-shi Ishikawa-ken 923-1292 Jpn
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Matsumura Hideki
Japan Advanced Inst. Sci. And Technol. (jaist) Ishikawa Jpn
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Ohdaira Keisuke
Japan Advanced Inst. Sci. And Technol. (jaist) Ishikawa Jpn
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Fujiwara Tomoko
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Endo Yohei
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Usami Noritaka
Institute For Material Research Tohoku University
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Fujiwara Kozo
Institute For Materials Research (imr) Tohoku University
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Fujiwara K
Institute For Materials Research (imr) Tohoku University
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Nishizaki Shogo
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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中島 一樹
富山大学工学部
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USAMI Noritaka
Institute for Materials Research, Tokoku University
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Usami N
Institute For Materials Research (imr) Tohoku University
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OHDAIRA Keisuke
Institute for Materials Research (IMR), Tohoku University
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FUJIWARA Kozo
Institute for Materials Research (IMR), Tohoku University
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NAKAJIMA Kazuo
Institute for Materials Research (IMR), Tohoku University
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Shiba Kazuhiro
Japan Advanced Institute Of Science And Technology (jaist)
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TAKEMOTO Hiroyuki
Japan Advanced Institute of Science and Technology (JAIST)
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Nakajima Kazuo
Institute For Materials Research (imr) Tohoku University
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Nakajima Kazuo
Institute for Materials Reseach, Tohoku University, 2-1-1 Katahira-cho, Aoba-ku, Sendai 980-8577, Japan
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PAN Wugen
Institute for Materials Research (IMR), Tohoku University
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KITAMURA Masayuki
Institute for Materials Research (IMR), Tohoku University
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SUGAWARA Takamasa
Institute for Materials Research (IMR), Tohoku University
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KUTSUKAKE Kentaro
Institute for Materials Research (IMR), Tohoku University
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NOSE Yoshitaro
Institute for Materials Research (IMR), Tohoku University
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SHISHIDO Toetsu
Institute for Materials Research (IMR), Tohoku University
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Pan W
Tohoku Univ. Sendai Jpn
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Sasaki Takahiko
Institute For Materials Research(imr) Tohoku University
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Nakajima K
Nuclear Engineering Research Laboratory University Of Tokyo
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Matsumura Hideki
Japan Advanced Institute Of Science And Technology (jaist)
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Nakajima Kensuke
Research Institute Of Electrical Communication Tohoku University
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Kitamura Masayuki
Institute For Materials Research (imr) Tohoku University
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Shishido T
Tohoku Univ. Sendai‐shi
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Sugawara Takamasa
Institute For Materials Research (imr) Tohoku University
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Ohdaira Keisuke
School Of Materials Science Japan Advanced Institute Of Science And Technology (jaist)
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Ohdaira Keisuke
Institute For Materials Research (imr) Tohoku University
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Nose Yoshitaro
Institute For Materials Research (imr) Tohoku University
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Kutsukake Kentaro
Institute For Materials Research (imr) Tohoku University
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Miyamoto Motoharu
Japan Advanced Institute of Science and Technology (JAIST), Nomi, Ishikawa 923-1292, Japan
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Usami Noritaka
Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Ohdaira Keisuke
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Keisuke Ohdaira
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Ohdaira Keisuke
Japan Advanced Institute of Science and Technology, Nomi, Ishikawa 923-1292, Japan
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Ohdaira Keisuke
Japan Advanced Institute of Science and Technology (JAIST), Nomi, Ishikawa 923-1292, Japan
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Sawada Keisuke
Japan Advanced Institute of Science and Technology, Nomi, Ishikawa 923-1292, Japan
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Varlamov Sergey
University of New South Wales, Sydney, NSW 2052, Australia
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Kazuhiro Shiba
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Shishido Toetsu
Institute for Materials Reseach, Tohoku University, 2-1-1 Katahira-cho, Aoba-ku, Sendai 980-8577, Japan
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Koyama Koichi
Japan Advanced Institute of Science and Technology (JAIST), Nomi, Ishikawa 923-1292, Japan
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Hayakawa Taro
Japan Advanced Institute of Science and Technology (JAIST), Nomi, Ishikawa 923-1292, Japan
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Nakashima Yuki
Japan Advanced Institute of Science and Technology (JAIST), Nomi, Ishikawa 923-1292, Japan
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Tomoko Fujiwara
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Nakajima Kazuo
Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Matsumura Hideki
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Hideki Matsumura
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Matsumura Hideki
Japan Advanced Institute of Science and Technology (JAIST), Nomi, Ishikawa 923-1292, Japan
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Matsumura Hideki
Japan Advanced Institute of Science and Technology, Nomi, Ishikawa 923-1292, Japan
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Ishii Shohei
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Tomura Naohito
Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
著作論文
- Selection of material for the back electrodes of thin-film solar cells using polycrystalline silicon films formed by flash lamp annealing (Special issue: Solid state devices and materials)
- Formation of Several-Micrometer-Thick Polycrystalline Silicon Films on Soda Lime Glass by Flash Lamp Annealing
- Study on stability of amorphous silicon thin-film transistors prepared by catalytic chemical vapor deposition
- Formation of Highly Uniform Micrometer-Order-Thick Polycrystalline Silicon Films by Flash Lamp Annealing of Amorphous Silicon on Glass Substrate
- High-Quality Polycrystalline Silicon Films with Minority Carrier Lifetimes over 5 μs Formed by Flash Lamp Annealing of Precursor Amorphous Silicon Films Prepared by Catalytic Chemical Vapor Deposition
- High-Efficiency Concave and Conventional Solar Cell Integration System Using Focused Reflected Light
- Analysis of the Dark-Current Density in Solar Cells Based on Multicrystalline SiGe
- Floating Zone Growth of Si Bicrystals Using Seed Crystals with Artificially Designed Grain Boundary Configuration
- Drastic Improvement of Minority Carrier Lifetimes Observed in Hydrogen-Passivated Flash-Lamp-Crystallized Polycrystalline Silicon Films
- Microstructure of Polycrystalline Silicon Films Formed through Explosive Crystallization Induced by Flash Lamp Annealing
- Selection of Material for the Back Electrodes of Thin-Film Solar Cells Using Polycrystalline Silicon Films Formed by Flash Lamp Annealing
- Formation of Several-Micrometer-Thick Polycrystalline Silicon Films on Soda Lime Glass by Flash Lamp Annealing
- Formation of Highly Uniform Micrometer-Order-Thick Polycrystalline Silicon Films by Flash Lamp Annealing of Amorphous Silicon on Glass Substrate
- Large-Grain Polycrystalline Silicon Films Formed through Flash-Lamp-Induced Explosive Crystallization
- Low Temperature Phosphorus Doping in Silicon Using Catalytically Generated Radicals
- High-Quality Polycrystalline Silicon Films with Minority Carrier Lifetimes over 5 μs Formed by Flash Lamp Annealing of Precursor Amorphous Silicon Films Prepared by Catalytic Chemical Vapor Deposition
- Defect Termination of Flash-Lamp-Crystallized Large-Grain Polycrystalline Silicon Films by High-Pressure Water Vapor Annealing