Surface Treatment of Plastic Substrates using Atomic Hydrogen Generated on Heated Tungsten Wire at Low Temperatures

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概要

• 論文の詳細を見る

• The surface properties of a plastic substrate were changed by a novel surface treatment called atomic hydrogen annealing (AHA). In this method, a plastic substrate was exposed to atomic hydrogen generated by cracking hydrogen molecules on heated tungsten wire. For the substrate, surface roughness was increased and halogen elements (F and Cl) were selectively etched by AHA. AHA was useful for pretreatment before film deposition on a plastic substrate because the changes in surface state relate to adhesion improvement. It is concluded that this method is a promising technique for preparing high-performance plastic substrates at low temperatures.

• 2007-06-15

著者

• HEYA Akira

  University of Hyogo

• MATSUO Naoto

  University of Hyogo

• Matsuo Naoto

  University of Hyogo, 2167 Shosha, Himeji, Hyogo 671-2280, Japan

関連論文

• Effect of Hydrogen on Secondary Grain Growth of Polycrystalline Silicon Films by Excimer Laser Annealing in Low-Temperature Process
• Excimer Laser Annealing of Hydrogen Modulation Doped a-Si Film
• Behavior of Hydrogen in Excimer Laser Annealing of Hydrogen-Modulation-Doped Amorphous Silicon Layer
• Properties of Surface-Modification Layer Generated by Atomic Hydrogen Annealing on Poly(ethylene naphthalate) Substrate
• Hydrogen Modulation-Doped Structures to Improve Crystalline Fraction of Polycrystalline Silicon Films Prepared by Excimer Laser Annealing at Low Energy Densities
• Surface Modification of Poly(ethylene naphthalate) Substrate and Its Effect on SiNx Film Deposition by Atomic Hydrogen Annealing
• Surface Treatment of Plastic Substrates using Atomic Hydrogen Generated on Heated Tungsten Wire at Low Temperatures

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