SERIKAWA Tadashi | Osaka University
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概要
関連著者
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SERIKAWA Tadashi
Osaka University
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HEYA Akira
University of Hyogo
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MATSUO Naoto
University of Hyogo
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KAWAMOTO Naoya
Yamaguchi University
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URAOKA Yukiharu
Nara Institute of Science and Technology
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Heya Akira
Department Of Materials Science & Chemistry University Of Hyogo
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Kawamoto N
Department Of Electrical And Electronic Engineering Yamaguchi University
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UENO Hitoshi
Nara Institute of Science and Technology
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SUGAWARA Yuta
Nara Institute of Science and Technology
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YANO Hiroshi
Nara Institute of Science and Technology
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HATAYAMA Tomoaki
Nara Institute of Science and Technology
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Matsuo N
Department Of Materials Science & Chemistry University Of Hyogo
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Matsuo Naoto
Univ. Hyogo Hyogo
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Fuyuki Takashi
Nara Inst. Sci. And Technol. Nara Jpn
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Uraoka Yukiharu
Nara Institute of Science and Technology, 8916-5 Takayama, Ikoma, Nara 630-0192, Japan
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Serikawa Tadashi
Osaka University, 11-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Heya Akira
University of Hyogo, 2167 Shosha, Himeji, Hyogo 671-2280, Japan
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Kawamoto Naoya
Yamaguchi University, 2-16-1 Tokiwadai, Ube, Yamaguchi 755-8611, Japan
著作論文
- Excimer Laser Annealing of Hydrogen Modulation Doped a-Si Film
- Behavior of Hydrogen in Excimer Laser Annealing of Hydrogen-Modulation-Doped Amorphous Silicon Layer
- Hydrogen Modulation-Doped Structures to Improve Crystalline Fraction of Polycrystalline Silicon Films Prepared by Excimer Laser Annealing at Low Energy Densities
- Reliability of Low Temperature Polycrystalline Silicon Thin-Film Transistors with Ultrathin Gate Oxide