Internal Stress in Polycrystalline Si Film Recrystallized by Excimer Laser Annealing

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概要

• 論文の詳細を見る
• 2004-02-15

著者

• Hamada H

  Materials And Devices Development Center Bu Sanyo Electric Co. Ltd.

• MATSUO Naoto

  Department of Materials Science & Chemistry, University of Hyogo

• KAWAMOTO Naoya

  Department of Electrical and Electronic Engineering, Yamaguchi University

• Kawamoto N

  Department Of Electrical And Electronic Engineering Yamaguchi University

• HAMADA Hiroki

  Materials and Devices Development Center BU, SANYO Electric Co., Ltd.

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