Enhancement of secondary grain growth of low-temperature polycrystalline silicon by visible laser irradiation: visible-laser-induced lateral crystallization (Special issue: Active-matrix flatpanel displays and devices: TFT technologies and related materia

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文

著者

• Kawamoto N

  Department Of Electrical And Electronic Engineering Yamaguchi University

関連論文

• Influence of Laser Plasma Soft X-Ray Irradiation on Crystallization of a-Si Film by Infrared Furnace Annealing
• Enhancement of secondary grain growth of low-temperature polycrystalline silicon by visible laser irradiation: visible-laser-induced lateral crystallization (Special issue: Active-matrix flatpanel displays and devices: TFT technologies and related materia
• Influence of Post Excimer Laser Annealing on Crystallinity of Precursor Polycrystalline Si Film Formed by Solid Phase Crystallization
• Role of Hydrogen in Polycrystalline Si by Excimer Laser Annealing
• Crystal Growth of Low-Temperature Processed Poly-Si by Excimer Laser Annealing - Dependences of Poly-Si Grain on Energy Density and Shot Number -
• Influence of Hydrogen in a-Si on Recrystallization of Low-Temperature Processed Poly-Si Film by Excimer Laser Annealing
• Influence of Microroughness of Si and Native Oxide on Adsorption of Organic Carbon in Water
• Internal Stress in Polycrystalline Si Film Recrystallized by Excimer Laser Annealing
• Effect of Hydrogen and Thermal Conductivity on Nucleation of Polycrystalline Si by Excimer Laser Annealing
• Grain Morphology of Recrystallized Polycrystalline-Si Film by Excimer Laser Annealing
• Characteristics of Recrystallized poly-Si Film Prepared by ELA of a-Si Deposited on SiO2 / SiN / Glass Using PE-CVD Method
• Effect of Hydrogen on Secondary Grain Growth of Polycrystalline Silicon Films by Excimer Laser Annealing in Low-Temperature Process
• Effects of High Nitrogen Pressure and Thermal Treatment on Adhesion to Amorphous Silicon/Silicon Nitride/Polyethersulfone Substrate during Excimer Laser Annealing
• Excimer Laser Annealing of Hydrogen Modulation Doped a-Si Film
• Grain Enlargement of Polycrystalline Silicon by Multipulse Excimer Laser Annealing: Role of Hydrogen
• Effects of High Nitrogen Pressure and Thermal Treatment on Adhesion to Amorphous Silicon/Silicon Nitride/Polyethersulfone Substrate during Excimer Laser Annealing

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