Relationship between Textured Structure of Substrates and Defect Density of Catalytic Chemical Vapor Deposition Amorphous Silicon Films
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概要
- 論文の詳細を見る
The relationship between the textured structure of substrates and the defect density of amorphous silicon (a-Si) films is extensively studied for the films obtained by catalytic chemical vapor deposition (Cat-CVD). The performance of solar cells using Cat-CVD a-Si films decreases with increasing substrate haze ratio owing to an increase in the defect density of the Cat-CVD a-Si films. The defect density of the Cat-CVD a-Si films measured by electron spin resonance (ESR) measurement is more sensitive to the textured structure than that of plasma-enhanced CVD (PECVD) films because of their lower hydrogen content.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-05-15
著者
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Matsumura Hideki
School Of Materials Science Jaist (japan Advanced Institute Of Science And Technology)
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Ohdaira Keisuke
School Of Materials Science Japan Advanced Institute Of Science And Technology (jaist)
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Koyama Koichi
School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Sugita Ken
School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Matsumura Hideki
School of Material Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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