Novel Nano-Fabrication Technique with Low Edge Roughness
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概要
- 論文の詳細を見る
In this paper, a novel nano-fabrication technique usable for low-cost and high-throughput mass-production is reported. In this technique, the nanometer slit mask can be fabricated by the combination of the conventional photolithography and anodic oxidation methods. This study has been focused on the demonstration of the method to reduce the pattern-edge fluctuation (nano edge roughness) in the slit mask, and a roughness as small as the equivalent level to the electron beam resist is achieved for a 30 nm size by improving the anodic oxidation process. Additionally the usable roughness level in a 10 nm size is also achieved. From these results, it is concluded that the fine nano-fabrication technique can be realized for the mass-production of nano-devices.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-06-15
著者
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Matsumura Hideki
School Of Materials Science Jaist (japan Advanced Institute Of Science And Technology)
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Hashioka Shingi
School Of Materials Science Japan Advanced Institute Of Science And Technology(jaist)
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Hashioka Shingi
School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Tatsunokuchi-machi, Ishikawa 923-1292, Japan
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Mogi Takahiro
School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Tatsunokuchi-machi, Ishikawa 923-1292, Japan
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Matsumura Hideki
School of Material Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Matsumura Hideki
School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Tatsunokuchi-machi, Ishikawa 923-1292, Japan
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