Effects of Oxygen Gas Addition and Substrate Cooling on Preparation of Amorphous Carbon Nitride Films by Magnetron Sputtering
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概要
- 論文の詳細を見る
Amorphous carbon nitride (a-C_<1-x>N_x) films were prepared by magnetron sputtering using nitrogen (N_2) and oxygen (O_2) gases in order to reduce the sp^2 structural region and to reduce triple bonding between carbon and nitrogen atoms (C≡N) with oxygen radical. Furthermore, these films were prepared at liquid-nitrogen temperature in order to increase the nitrogen concentration. Electron spin resonance (ESR), infrared (IR) absorption, ultra-violet visual (UV-vis) spectroscopy and X-ray photoelectron spectroscopy (XPS) were used to investigate the effects of O_2 gas addition and substrate cooling on the preparation of a-C_<1-x>N_x films by magnetron sputtering.
- 1998-09-15
著者
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Yokomichi Haruo
Department Of Electronics And Informatics Toyama Prefectural University
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Masuda Atsushi
School Of Materials Science Japan Advanced Institute Of Science And Technology
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SAKIMA Hiroyuki
Department of Electronics and Informatics, Toyama Prefectural University
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Sakima Hiroyuki
Department Of Electronics And Informatics Toyama Prefectural University
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Masuda Atsushi
School of Material Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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