Shimada M | Ntt Microsystem Integration Lab. Kanagawa Jpn

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著作論文

H-Mode Outside Divertor Free from Peripheral Disruption in Doublet III
Plasma Shapes for Achieving High Heating Efficiency during Neutral Beam Injection in Doublet III
Electron Cyclotron Resonance Plasma Etching of α-Ta for X-Ray Mask Absorber Using Chlorine and Fluoride Gas Mixture
Development of Highly Accurate X-Ray Mask with High-Density Patterns
Initial Boronization of JT-60U Tokamak Using Decaborane
Precursors in Atmospheric-Pressure Chemical Vapor Deposition of Silica Films from Tetraethylorthosilicate/Ozone System
Particle Generation and Film Formation in an Atmospheric-Pressure Chemical Vapor Deposition Reactor Using the Tetraethylorthosilicate (TEOS)/He, TEOS/O_2/He, and TEOS/O_3/He Systems
Gas-Phase Nucleation in an Atmospheric Pressure Chemical Vapor Deposition Process for SiO_2 Films Using Tetraethylorthosilicate (TEOS)
Dependence of Electrically Induced Strain on Orientation and Composition in Pb(Zr_xTi_)O_3 Films
Structure and Piezoelectric Properties of 0.9 Pb(Zr,Ti)O_3-0.1 Pb(Mg,Nb)O_3 Films Prepared by Metalorganic Deposition Process
Comparative Study of Defect Densities Evaluated by Electron Spin Resonance and Constant Photocurrent Method in Undoped and N-Doped Hydrogenated Amorphous Silicon
Photocreated Defects in Very Thin Hydrogenated Amorphous Silicon Films : Semiconductors
Light-Intensity Dependence of Photocreated Defects in Hydrogenated Amorphous Silicon-Nitrogen Alloy Films
SIZE CHANGE OF VERY FINE SILVER AGGLOMERATES BY SINTERING IN A HEATED FLOW
Wall Deposition of Ultrafine Aerosol Particles by Thermophoresis in Nonisothermal Laminar Pipe Flow of Different Carrier Gas

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