Iriguchi Hiroki | NTT Advanced Technology Corporation, 3-1 Morinosato Wakamiya, Atsugi-shi, Kanagawa 243-0198, Japan

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概要

• Iriguchi Hirokiの詳細を見る
• 同名の論文著者
• NTT Advanced Technology Corporation, 3-1 Morinosato Wakamiya, Atsugi-shi, Kanagawa 243-0198, Japanの論文著者

関連著者

• Tsuchizawa Tai

  Ntt Telecommunications Energy Laboratories

• ODA Masatoshi

  NTT Telecommunications Energy Laboratories

• IRIGUCHI Hiroki

  NTT Advanced Technology Crporation

• TAKAHASHI Chiharu

  NTT Telecommunications Energy Laboratories

• SHIMADA Masaru

  NTT Telecommunications Energy Laboratories

• UCHIYAMA Shingo

  NTT Telecommunications Energy Laboratories

• Iriguchi Hiroki

  NTT Advanced Technology Corporation, 3-1 Morinosato Wakamiya, Atsugi-shi, Kanagawa 243-0198, Japan

• Tsuchizawa Tai

  Ntt Microsystem Integration Labs.

• UCHIYAMA Shingo

  NTT System Electronics Laboratories

• Shimada M

  Ntt Microsystem Integration Lab. Kanagawa Jpn

• Shimada M

  Hiroshima Univ. Higashi‐hiroshima

• Tsuchizawa T

  Ntt Telecommunications Energy Lab. Kanagawa Jpn

• Uchiyama S

  Canon Inc. Utsunomiya Jpn

• Uchiyama Susumu

  Department Of Electronics Nagoya University

• Shimada M

  Graduate School Of Natural Science And Technology Kanazawa University

• Takahashi C

  Ntt Telecommunications Energy Laboratories

• Tsuchizawa T

  Microsystem Integration Laboratories Ntt Corporation

• Takahashi Chiharu

  NTT Telecommunications Energy Laboratories, 3-1 Morinosato Wakamiya, Atsugi-shi, Kanagawa 243-0198, Japan

• Uchiyama Shingo

  NTT Telecommunications Energy Laboratories, 3-1 Morinosato Wakamiya, Atsugi-shi, Kanagawa 243-0198, Japan

• Oda Masatoshi

  NTT Telecommunications Energy Laboratories, 3-1 Morinosato Wakamiya, Atsugi-shi, Kanagawa 243-0198, Japan

• Tsuchizawa Tai

  NTT Telecommunications Energy Laboratories, 3-1 Morinosato Wakamiya, Atsugi-shi, Kanagawa 243-0198, Japan

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著作論文

• Electron Cyclotron Resonance Plasma Etching of α-Ta for X-Ray Mask Absorber Using Chlorine and Fluoride Gas Mixture
• Electron Cyclotron Resonance Plasma Etching of $\alpha$-Ta for X-Ray Mask Absorber Using Chlorine and Fluoride Gas Mixture

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