Development of Highly Accurate X-Ray Mask with High-Density Patterns
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-12-30
著者
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Tsuchizawa Tai
Ntt Telecommunications Energy Laboratories
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Tsuchizawa Tai
Ntt Microsystem Integration Labs.
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ODA Masatoshi
NTT Telecommunications Energy Laboratories
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UCHIYAMA Shingo
NTT System Electronics Laboratories
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Okada I
Ntt Advanced Technology Corporation
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Shimada M
Ntt Microsystem Integration Lab. Kanagawa Jpn
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Shimada M
Hiroshima Univ. Higashi‐hiroshima
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Ohkubo Takashi
Ntt Telecommunications Energy Laboratories
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Tsuchizawa T
Ntt Telecommunications Energy Lab. Kanagawa Jpn
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SHIMADA Masaru
NTT Telecommunications Energy Laboratories
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UCHIYAMA Shingo
NTT Telecommunications Energy Laboratories
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ONO Toshiro
NTT Telecommunications Energy Laboratories
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ITABASHI Seiichi
NTT Advanced Technology Corporation
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OKADA Ikuo
NTT Advanced Technology Corporation
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Uchiyama S
Canon Inc. Utsunomiya Jpn
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Uchiyama Susumu
Department Of Electronics Nagoya University
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Ohkubo Tadakatsu
Faculty Of Engineering Nagaoka University Of Technology
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Shimada M
Graduate School Of Natural Science And Technology Kanazawa University
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Tsuchizawa T
Microsystem Integration Laboratories Ntt Corporation
関連論文
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- LSI On-Chip Optical Interconnection with Si Nano-Photonics
- A Study on the Design and Properties of an SiON/SiO_2 Waveguide : The Effect of the Substrate on Propagation Loss
- Improving X-Ray Mask Pattern Placement Accuracy by Correcting Process Distortion in Electron Beam Writing
- Precise Delineation Characteristics of Advanced Electron Beam Mask Writer EB-X3 for Fabricating 1x X-Ray Masks
- X-Ray Mask Fabrication Using New Membrane Process Techniques
- LSI on-chip optical interconnection with Si nano-photonics
- Spectral responsivity of Ge pin photodiodes on silicon-on-insulator via selective epitaxial growth (光エレクトロニクス)
- Polarization splitter and rotator for polarization diversity system in silicon-based micro-photonic circuits (光エレクトロニクス)
- Photonic-Band-Gap Waveguides and Resonators in SOI Photonic Crystal Slabs(Photonic Crystals and Their Device Applications)
- Microphotonics Devices Based on Silicon Wire Waveguiding System(Photonic Crystals and Their Device Applications)
- Giant Magnetoresistance in FeNiCo/Cu Multilayers
- H-Mode Outside Divertor Free from Peripheral Disruption in Doublet III
- Plasma Shapes for Achieving High Heating Efficiency during Neutral Beam Injection in Doublet III
- Effect of Post-Growth Annealing on Morphology of Ge Mesa Selectively Grown on Si
- Neutral Stream Extraction from Electron Cyclotron Resonance Plasma by Using Parallel Magnetic Field
- Generation of Electron Cyclotron Resonance Neutral Stream and Its Application to Si Etching
- Electron Cyclotron Resonance Plasma Etching of α-Ta for X-Ray Mask Absorber Using Chlorine and Fluoride Gas Mixture
- Etching Characteristics of α-Type Ta Film Using Cl_2 Electron Cyclotron Resonance(ECR)Plasma
- Development of Highly Accurate X-Ray Mask with High-Density Patterns
- LSI On-Chip Optical Interconnection with Si Nano-Photonics
- Analysis of Domain Wall Motion under Influence of Magneto-Elastic Coupling in Orthoferrite
- Analysis of One-Dimensional Domain Wall Motion under a Biased In-Plane Field
- Automotion Properties of Fast σ Bubble
- Anisotropie Bubble Domain Mobility in Orthoferrite
- Initial Boronization of JT-60U Tokamak Using Decaborane
- Giant Magnetoresistance Effect in Amorphous CoFeB Sandwiches
- Giant Magnetoresistance with Low Saturation Field in Ni_Fe_Co_/Cu Multilayers
- Structure and Soft Magnetic Properties of Fe/CoZr Multilayer Films
- Sub-100-nm Device Fabrication using Proximity X-Ray Lithography at Five Levels
- Patterning Yield of Sub-100-nm Holes Limited by Fluctuation of Exposure and Development Reactions in Synchrotron Radiation Lithography Using Biased Mask Patterns
- Lithographic Performance of a Chemically Amplified Resist Developed for Synchrotron Radiation Lithography in the Sub-100-nm Region
- Reduction of Image Shortening in Two-Dimensional Pattern Replication Using X-Ray Lithography
- Dissolution Characteristics and Surface Morphology of Chemically Amplified Resists in X-Ray Lithography
- Precursors in Atmospheric-Pressure Chemical Vapor Deposition of Silica Films from Tetraethylorthosilicate/Ozone System
- Particle Generation and Film Formation in an Atmospheric-Pressure Chemical Vapor Deposition Reactor Using the Tetraethylorthosilicate (TEOS)/He, TEOS/O_2/He, and TEOS/O_3/He Systems
- Gas-Phase Nucleation in an Atmospheric Pressure Chemical Vapor Deposition Process for SiO_2 Films Using Tetraethylorthosilicate (TEOS)
- Kerr Rotation of Quenched High-Temperature-Phase MnBi Film
- Measurement of Magnetostriction Constants in (111)-Oriented Polycrystalline PdCo Alloy and Multilayered Films
- Magneto-Optical Kerr Spectra of Ultrathin Co Films
- Dynamics of an Isolated Stripe Domain in Bubble Film
- Dynamic Properties of Isolated Straight Stripe Domain in Rate Earth Iron Great Film
- Modulated Structure of High-T_c Superconductor Bi-Ca-Sr-Cu-O Studied by High-Resolution Electron Microscopy and Electron Diffraction : Electrical Properties of Condensed Matter
- Dependence of Electrically Induced Strain on Orientation and Composition in Pb(Zr_xTi_)O_3 Films
- Structure and Piezoelectric Properties of 0.9 Pb(Zr,Ti)O_3-0.1 Pb(Mg,Nb)O_3 Films Prepared by Metalorganic Deposition Process
- Simulation of X-Ray Mask Pattern Displacement
- A New Proximity Parameter Evaluation Method Utilizing Auxiliary Patterns for Dose Compensation
- High Transparent Sheet Polarizer Made with Birefringent Materials
- Comparative Study of Defect Densities Evaluated by Electron Spin Resonance and Constant Photocurrent Method in Undoped and N-Doped Hydrogenated Amorphous Silicon
- Photocreated Defects in Very Thin Hydrogenated Amorphous Silicon Films : Semiconductors
- Relation between Electron-Spin-Resonance and Constant-Photocurrent-Method Defect Densities in Hydrogenated Amorphous Silicon
- Light-Intensity Dependence of Photocreated Defects in Hydrogenated Amorphous Silicon-Nitrogen Alloy Films
- Peak Velocity in Orthorhombic Bubble Films
- SIZE CHANGE OF VERY FINE SILVER AGGLOMERATES BY SINTERING IN A HEATED FLOW
- Wall Deposition of Ultrafine Aerosol Particles by Thermophoresis in Nonisothermal Laminar Pipe Flow of Different Carrier Gas
- Monolithic Integration of a Silica-Based Arrayed Waveguide Grating Filter and Silicon Variable Optical Attenuators Based on p--i--n Carrier-Injection Structure
- Fast Optical Power Stabilization using a Germanium Photodiode and a Silicon Variable Optical Attenuator Integrated on a Silicon Photonic Platform
- Fast optical power stabilization using a germanium photodiode and a silicon variable optical attenuator integrated on a silicon photonic platform (レーザ・量子エレクトロニクス)
- Fast optical power stabilization using a germanium photodiode and a silicon variable optical attenuator integrated on a silicon photonic platform (光エレクトロニクス)
- Fast optical power stabilization using a germanium photodiode and a silicon variable optical attenuator integrated on a silicon photonic platform (フォトニックネットワーク)
- Deep-UV Photolithography
- Sub-100-nm Device Fabrication using Proximity X-Ray Lithography at Five Levels
- Phase Demodulation of DPSK Signals Using Dual-Bus Coupled Silicon Micro-Ring Resonator
- Integration of Silicon Nano-Photonic Devices for Telecommunications
- Electron Cyclotron Resonance Plasma Etching of $\alpha$-Ta for X-Ray Mask Absorber Using Chlorine and Fluoride Gas Mixture