A Study on the Design and Properties of an SiON/SiO_2 Waveguide : The Effect of the Substrate on Propagation Loss

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概要

• 論文の詳細を見る
• 2007-09-19

著者

• Tsuchizawa Tai

  Ntt Telecommunications Energy Laboratories

• Tsuchizawa Tai

  Ntt Microsystem Integration Labs.

• Ushida Jun

  Mirai-selete

• FUJIKATA Junichi

  MIRAI-Selete

• NOSE Koichi

  MIRAI-Selete

• NISHI Kenichi

  MIRAI-Selete

• OKAMOTO Daisuke

  MIRAI-Selete

• GOMYO Akiko

  MIRAI-Selete

• WATANABE Toshifumi

  NTT Microsystem Integration Labs.

• YAMADA Koji

  NTT Microsystem Integration Labs.

• ITABASHI Seiichi

  NTT Microsystem Integration Labs.

• OHASHI Keishi

  MIRAI-Selete

• OKAMOTO Daisuke

  Nano Electronics Res. Labs., NEC Corp.

• Wada Tetsuro

  System Lsi Development Center Mitsubishi Electric Corporation

• Tsuchizawa T

  Ntt Telecommunications Energy Lab. Kanagawa Jpn

• Nishi Kenichi

  Mirai‐selete Ibaraki Jpn

• Watanabe T

  Microsystem Integration Laboratories Ntt Corporation

• Tsuchizawa T

  Microsystem Integration Laboratories Ntt Corporation

• Yamada K

  Microsystem Integration Laboratories Ntt Corporation

• Itabashi Sei-ichi

  Microsystem Integration Laboratories Ntt Corporation

• Yamada Koji

  NTT Microsystem Integration Laboratories, NTT Corporation

• Itabashi Seiichi

  NTT Microsystem Integration Laboratories, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan

• Tsuchizawa Tai

  NTT Microsystem Integration Laboratories, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan

• Watanabe Toshifumi

  NTT Microsystem Integration Laboratories, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan

• Yamada Koji

  NTT Microsystem Integration Laboratories, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan

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