Namba Susumu | Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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概要
- 同名の論文著者
- Faculty Of Engineering Science And Research Center For Extreme Materials Osaka Universityの論文著者
関連著者
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Namba Susumu
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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Namba Susumu
Faculty Of Engineering Science Osaka University
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Namba Susumu
Frontier Research Program Riken
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Namba S
Inst. Physical And Chemical Research Wako
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Namba Susumu
Nagasaki Institute Of Applied Science
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Gamo Kenji
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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GAMO Kenji
Faculty of Engineering Science, Osaka University
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Namba S
Japan Atomic Energy Res. Inst. Kyoto Jpn
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Nonoyama Shinji
Quantum Material Research Laboratory Frontier Research Program The Institute Of Physical And Chemica
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TAKAI Mikio
Faculty of Engineering Science, and Research Center for Extreme Materials, Osaka University
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Namba Susumu
Research Center For Extreme Materials And Department Of Electrical Engineering Osaka University
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Namba S
Osaka Univ. Osaka
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Satoh Minoru
Nagaoka University Of Technology
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Satoh M
Tohoku Univ. Sendai Jpn
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Yasuoka Yoshizumi
Department of Electronic Engineering, The National Defense Academy
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SATOU Mamoru
Government Industrial Research Institute
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Yasuoka Y
National Defense Acad. Yokosuka‐shi Jpn
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Yasuoka Yoshizumi
Department Of Electrical And Electronic Engineering National Defense Academy
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Satou Mamoru
Goverment Industrial Research Institute
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Namba Susumu
The Institute Of Physical And Chemical Research
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Masuda Kohzoh
Faculty Of Engineering Science Osaka University
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CHAYAHARA Akiyoshi
Government Industrial Research Institute
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Gamo K
Osaka Univ. Osaka
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Chayahara Akiyoshi
Department Of Electrical Engineering Hiroshima University
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Matsui Shinji
Nippon Electric Co. Ltd
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Kim P
Riken The Institute Of Physical And Chemical Research
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Kim Pil
The Institute Of Physical And Chemical Research
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SEGAWA Yusaburo
The Institute of Physical and Chemical Research
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Segawa Yusaburo
Institute Of Physical And Chemical Research
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Aoyagi Y
Semiconductor Laboratory Riken The Institute For Physical And Chemical Research
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Masuda Kohzoh
Material Science Tsukuba University
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Ishibashi Koji
Department Of Applied Physics And Dimes Delft University Of Technology:the Institute Of Physical And
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Segawa Y
Photodynamics Research Center The Institute Of Physical And Chemical Research (riken)
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HARAKAWA Kenichi
Department of Electronic Engineering, The National Defense Academy
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SANDA Hiroyuki
Faculty of Engineering Science and Tesearch Center for Extreme Materials, Osaka University
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Harakawa K
Takenaka Corp. Inzai Jpn
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KINOMURA Atsushi
National Institute of Advanced Industrial Science and Technology
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Aoyagi Y
The Institute Of Physical And Chemical Research
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Sakamoto Toshitugu
Faculty Of Engineering Science Osaka University
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Shiokawa Takao
Semiconductor Laboratory Riken The Institute For Physical And Chemical Research
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Sanda Hiroyuki
Faculty Of Engineering Science And Tesearch Center For Extreme Materials Osaka University
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Nakai Hideo
Department Of Industrial Chemistry Tokyo University Of Agriculture And Technology
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Nakai Hiroyuki
Faculty Of Engineering Science Osaka University
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YUBA Yoshihiko
Faculty of Engineering Science, Osaka University
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KINOMURA Atsushi
Osaka National Research Institute, AIST
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TAKAI Mikio
Osaka University, Faculty of Engineering Science and Research Center for Extreme Materials
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NAMBA Susumu
Osaka University, Faculty of Engineering Science and Research Center for Extreme Materials
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Yuba Yoshihiko
Faculty Of Engineering Science Osaka University
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Aoyagi Yoshinobu
Frontier Research Program Riken
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Aoyagi Yoshinobu
The Institute Of Physical And Chemical Research (riken):microelectronics R & D Center Chinese Ac
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Takai Mikio
Osaka Univ. Osaka Jpn
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Sugimoto A
Department Of Physics And Crest-jst Tokyo Institute Of Technology
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SHIMIZU Takashi
Department of Neurosurgery, Saiseikai Kurihashi Hospital
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HARA Tamio
Toyota Technological Institute
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MASUYAMA Akio
Faculty of Engineering, Toyo University
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Matsumoto T
Institute Of Scientific And Industrial Reserch Univ Of Osaka
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Masuyama A
Faculty Of Engineering Toyo University
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Masuyama Akio
Faculty Of Engineering Toyo University
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Hara T
Toyota Technological Inst. Nagoya Jpn
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Iwaki Masaya
Institute Of Chemical And Physical Research
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SHIMIZU Ryuichi
Department of Applied Physics, Osaka University
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YAMAGUCHI Yasuhide
Research Laboratory for Electronic Materials, Mitsui Mining and Smelting Co., LTD
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YAMAGISHI Kiyoshi
Research Laboratory for Electronic Materials, Mitsui Mining and Smelting Co., LTD
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KIM Pit
The Institute of Physical and Chemical Research
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Taniguchi H
Mitsubishi Cable Ind. Ltd. Hyogo Jpn
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Shimizu T
Nagoya Univ. Nagoya Jpn
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Yamaguchi Y
Core Technology Laboratory Mitsui Kinzoku
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AOYAGI Yoshinobu
Frontier Research Program, The Institute of Physical and Chemical Research (RIKEN)
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Aoyagi Y
Riren (the Institute Of Physical And Chemical Research)
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YOKOTA Katsuhiro
Faculty of Engineering, Kansai University
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Taniguchi H
Faculty Of Engineering Science Osaka University
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YAMAZAWA Masahiro
Faculty of Engineering Science, Osaka University
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MATSUMOTO Toshiharu
Faculty of Engineering Science, Osaka University
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SAKAMOTO Toshitugu
Faculty of Engineering Science, Osaka University
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TAKAGAKI Yukihiko
Faculty of Engineering Science, Osaka University
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TAKAOKA Sadao
Faculty of Science, Osaka University
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MURASE Kazuo
Research Center of Extreme Materials, Osaka University
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FUJII Kanenaga
Government Industrial Research Institute
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Yong Feng
Facully of Engineering Science and Research Center for Extreme Materials, Osaka university
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SANDA Hiroyuki
Central Research Laboratory, Glory Ltd.
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SHIGEMATU Hisao
Faculty of Engineering Science and Tesearch Center for Extreme Materials, Osaka University
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MATSUO Takahiro
Osaka University, Faculty of Engineering Science and Research Center for Extreme Materials
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Gamo Kenji
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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Gamo Kenji
Faculty Of Engineering Science Osaka University
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TOYODA Koichi
RIKEN, The Institute of physical and Chemical Research
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NAMBA Susumu
Frontire Research Program
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SHIOKAWA Takao
RIKEN, The Institute of Physical and Chemical Research
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Taniguchi H
Department Of Materials Science And Technology Graduate School Of Engineering Sciences Kyushu Univer
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Taniguchi H
Kyushu Univ. Fukuoka Jpn
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Takagaki Y
Ntt Basic Res. Lab. Kanagawa Jpn
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Yamazawa M
Faculty Of Engineering Science Osaka University
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Yuba Yoshihiko
Department Of Physical Science Graduate School Of Engineering Science Osaka University
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SHIHOYAMA Kazuhiko
Center for Optronics Products, HOYA Corporation
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Yong Feng
Facully Of Engineering Science And Research Center For Extreme Materials Osaka University
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ISHIHARA Shinji
Research Reactor Institute, Kyoto University
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KIMURA Itsuro
Research Reactor Institute, Kyoto University
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Ochiai Yukinori
Faculty Of Engineering Science Osaka University
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OGAI Keiko
Department of Applied Physics, Faculty of Engineering, Osaka University
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ISHIBASHI Kouji
Frontier Research Program, RIKEN
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SHIMIZU Ryuichi
Faculty of Engineering, Osaka University
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OGAI Keiko
Toyota Technological Institute
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SHIHOYAMA Kazuhiko
Faculty of Engineering, Toyo University
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Matsumoto Takuya
Institute Of Scientific And Industrial Reserch Univ Of Osaka
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Kosugi Toshihiko
Department Of Electric Engineering Faculty Of Engineering Science Osaka University
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Nishimura Tadashi
Faculty Of Engineering Science Osaka University
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Yamazawa Masahiro
Faculty Of Engineering Science Osaka University
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Yamaguchi Y
Fuji Xerox Co. Ltd. Kanagawa Jpn
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KOSUGI Toshihiko
NTT Wireless System Laboratories
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Kimura Itsuro
Research Reactor Institute Kyoto University
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Ogai Keiko
Department Of Applied Physics Osaka University
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Hamagaki M
The Institute Of Physical And Chemical Research (riken)
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Hamagaki Manabu
Akashi Technical Institute Kawasaki Heavy Industries
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Anzai Y
Storage Technology Research Center Research & Development Group Hitachi Ltd.
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Souda R
National Institute For Research In Inorganic Materials
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Masuda Noboru
Faculty Of Engineering Science Osaka University
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邑瀬 和生
大阪教養
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Uchida Takashi
Department of Urban Engineering, Osaka City University
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NAKASHIMA Shin-ichi
Faculty of Engineering, Osaka University
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Tamura Shigeharu
Government Industrial Research Institute
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MIYOSHI Tadaki
Technical College, Yamaguchi University
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IWAI Sohachi
The Institute of Physical and Chemical Research
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IIMURA Yasufumi
The Institute of Physical and Chemical Research
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AOYAGI Yoshinobu
The Institute of Physical and Chemical Research
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OKAMOTO Hiroaki
Faculty of Engineering Science, Osaka University
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Miyoshi T
Yamaguchi Univ. Yamaguchi Jpn
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NAMBA Susumu
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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Aoyagi Y
Inst. Physics And Chemical Res. (riken) Wako Jpn
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Murase K
Ntt Corp. Kanagawa Jpn
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Hara Tamio
The Institute Of Physical And Chemical Research
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Masui Norio
Faculty Of Engineering Science Osaka University
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Kimura Y
Ntt Access Network Systems Laboratories Optical Soliton Transmission Research Group
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Satoh Masaharu
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Iimura Y
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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Iimura Yasufumi
Division Of Electronic And Information Engineering Graduate School Of Technology Tokyo University Of
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MURASE Kazuo
Faculty of Science, Osaka University
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SUGIMOTO Akiko
Core Technology Laboratory, Mitsui Mining and Smelting Co., Ltd.
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ANZAI Yutaka
Core Technology Laboratory, Mitsui Mining and Smelting Co., Ltd.
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YAMAGISHI Kiyoshi
Core Technology Laboratory, Mitsui Mining and Smelting Co., Ltd.
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ODA Seiji
The Institute of Physical and Chemical Research
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KODAMA Nobuhiro
TOSOH Corporation
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SUGIMOTO Akiko
Research Laboratory for Electronic Materials, Mitsui Mining and Smelting Co., LTD
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NOBE Yukio
Research Laboratory for Electronic Materials, Mitsui Mining and Smelting Co., LTD
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SUGIMOTO Akiko
The Institute of Physical and Chemical Research
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ANZAI Yutaka
Research Laboratory for Electronic Materials, Mitsui Mining and Smelting Co., Ltd.
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GAMO Kenji
Department of Electrical Engineering,Faculty of Engineering Sciences,Osaka University
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Aoyagi Yoshinobu
Riken
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TANIGICHI Hiroaki
Faculty of Engineering Science, Osaka University
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TANIGUCHI Hiroaki
Faculty of Engineering Science, Osaka University
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Inoue Ken-ichi
Electronics Research Laboratory Kobe Steel Ltd.
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ISHIBASHI Kiyotaka
Electronics Research Laboratory, Kobe Steel, Ltd.
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KAWATA Yutaka
Electronics Research Laboratory, Kobe Steel, Ltd.
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KIUCHI Masato
Government Industrial Research Institute
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KINOMURA Atsushi
Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University
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NAGATOMO Syohei
D.S. Scanner Co., Ltd
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LU Yong
Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University
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NAGATOMO Syohei
D. S. Scanner Co., Ltd.
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KIMURA Yoshihide
Department of Applied Physics, Osaka University
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CHAYAHARA Akiyoshi
Laboratory of Purified Materials, National Institute of Advanced Industrial Science and Technology
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HAMAGAKI Manabu
RIKEN, The Institute of Physical and Chemical Research
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HARA Tamio
RIKEN, The Institute of Physical and Chemical Research
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Murase Kazuo
Faculty Of Science Osaka University
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Taniguchi Hiroaki
Faculty Of Engineering Science Osaka University
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Aoyagi Yoshinobu
Nanoelectronic Materials Laboratory Frontier Research Program Riken
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Nakamura Takehiro
Faculty Of Engineering Science Osaka University
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Satoh M
Department Of Physics Faculty Of Science Okayama University
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Okamoto Hiroaki
Faculty Of Engineering Science Osaka University
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Lu Y
National Univ. Singapore Singapore
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Imura Y
Japan Quality Assurance Organization Shizuoka Jpn
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NAFATOMO Syohei
D.S. Scanner Co.Ltd.
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Namba S
Faculty Of Engineering Science Osaka University
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KUMURA Yoshihide
Department of Applied Physics, Faculty of Engineering, Osaka University
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AIHARA Ryuzo
Eiko Engineering Co.Ltd.
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KOSUGI Toshihiko
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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MIMURA Ryou
JEOL Ltd
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AIHARA Ryuzo
JEOL Ltd
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Xu Zheng
Faculty of Engineering Science, Osaka University
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KOSUGI Toshihiko
Faculty of Engineering Science, Osaka University
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Jin-Zhong YU
Institute of Semicinductors, Chinese Academy of Sciences
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NAMBU Susumu
Faculty of Engineering Science, Osaka university
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ISHIDA Shuichi
Science University of Tokyo in Yamaguchi
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HAMAGAKI Manabu
The Institute of Physical and Chemical Research (RIKEN)
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Nobe Yukio
Core Technology Laboratory, Mitsui Kinzoku
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Murakami Kouichi
Faculty Of Engineering Science Osaka University
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Mochizuki Takayasu
Laboratory Of Advanced Science And Technology For Industry (lasti) University Of Hyogo
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Chayahara Akiyoshi
Government Industrial Research Institute Osaka
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Agawa Yoshiaki
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University:ulvac Japa
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Tamura S
Sony Corp. Yokohama Jpn
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Xu Z
Saga Univ. Saga
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Oda Seiji
The Institute Of Physical And Chemical Research:tosoh Corporation.
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Nobe Yukio
Core Technology Laboratory Mitsui Kinzoku
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Mimura R
Jeol Ltd
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Hamagaki Manabu
The Institute Of Physical And Chemical Research
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Jin-zhong Yu
Institute Of Semicinductors Chinese Academy Of Sciences
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Hirai Koichi
Yakult Institute For Microbiological Research
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Murase K
Graduate School Of Science Osaka University
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Ohsawa Akira
Faculty Of Engineering Science Osaka University
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Tamura Susumu
Faculty Of Engineering Kansai University
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Kawata Yutaka
Electronics Research Laboratory Kobe Steel Ltd.
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Kiuchi M
National Inst. Advanced Industrial Sci. And Technol. Osaka Jpn
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Ishida Shuichi
Division Of Cardiovascular Medicine Department Of Internal Medicine Ohmori Hospital Toho University
著作論文
- Characterization of GaAs and AlGaAs layers grown by laser atomic layer epitaxy
- Flash-Lamp-Pumped Tunable Ti:BeAl_2O_4 Laser
- Passive Mode Locking of a Flashlamp-Pumped Ti:Sapphire Laser
- Flash Lamp Pumped Tunable Forsterite Laser
- Optical Properties and Lasing of Ti^ Doped BeAl_2O_4
- Effects of Heat Treatment on the Sensitivity of Warm Carrier Devices for CH_3OH Laser Radiation
- Thin-Film Long-Wire Antenna for 10.6 μm CO_2 Laser Radiation
- Low-Energy Ion-Beam Irradiation Effects on Two-Dimensional Electron Gas in Modulation-Doped AlGaAs/ GaAs Heterostructure : Micro/nanofabrication and Devices
- Low-Energy Ion-Beam Irradiation Effects on Two-Dimensional Electron Gas in Modulation-Doped AlGaAs/GaAs Heterostructure
- Magnetic Analysis of Quadrupole Lens for MeV Ion Microprobe
- Three-Dimensional Analysis of Locally Implanted Atoms by MeV Helium Ion Microprobe
- Etching Rate Control by MeV O^+ Implantation for Laser-Chemical Reaction of Ferrite : Beam-Induced Physics and Chemistry
- Local Control of Magnetic Property in Stainless Steel Surface by Ion and Laser Beams : Beam-Induced Physics and Chemistry
- Local Control of Magnetic Property in Stainless Steel Surface by Ion and Laser Beams
- Etching Rate Control by MeV O^+ Implantation for Laser-Chemical Reaction of Ferrite
- Tomography of Microstructures by Scanning Micro-RBS Probe
- Optimization in Spot Sizes of Focused MeV Ion Beam by Precise Adjustment of Lens-Current Excitations : Nuclear Science, Plasmas and Electric Discharges
- Laser-Induced Etching of Mn-Zn ferrite and Its Application : Etching and Deposition Technology
- Microfabricated Submicron Al-Filament Biprism as Applied to Electron Holography : Micro/nanofabrication and Devices
- Microfabricated Submicron Al-Filament Biprism as Applied to Electron Holography
- Low Energy Focused Ion Beam System and Application to Low Damage Microprocess
- Ion Beam Assisted Deposition of Tungsten on GaAs
- Induced Defects in GaAs Etched by Low Energy Ions in Electron Beam excited Plasma(EBEP) System : Etching and Deposition Technology
- Maskless Etching of AN Using Focused Ion Beam
- Maskless Ion Beam Assisted Etching of Si Using Chlorine Gas
- Influence of Beam Current Ripple on Secondary Electron and RBS Mapping Images
- B, As and Si Field Ion Sources
- Field Ion Sources Using Eutectic Alloys
- Fabrication of Niobium Weak Links by Means of Electron Beam Lithography and Ion Implantation : C-1: JOSEPHSON DEVICES
- Fabrication of Submicron Contact Hole with a Focused Ion Beam
- Self-Developing Characteristics of Nitrocellulose Exposed to Ion Beams
- CO_2 Laser Detection Using a Warm Carrier Device with a Thin Film Antenna
- Self-Development Mechanism of Nitrocellulose Resist : Electron Beam Irradiation
- Quick Focus Adjustment for Quadrupole Lens System to Form High-Energy Ion Microbeam
- Residual Local Strain in Gallium Arsenide Induced by Laser Pyrolytic Etchingin CCl_4 Atmosphere
- Local Temperature Rise during Laser Induced Etching of Gallium Arsenide in SiCl_4 Atmosphere
- Maskless Dry Etching of Gallium Arsenide with a Submicron Line-Width by Laser Pyrolysis in CCl_4 Gas Atmosphere
- Optical Waveguiding and Electrooptic Modulation in Ion-Implanted CdTe
- Optical Waveguides Fabricated by B Ion Implanted into Fused Quartz
- A Large Time Delay of the Stimulated Emission in CdS Laser Pumped by an Electron Beam
- Increase in T_c of Nb Films Implanted with N^+_2
- Ion-Implanted Arsenic Profiles in GaAs Encapsulated by SiO_2 and Si_3N_4
- Control of T_c for Niobium by N Ion Implantation
- Comparison between Concentration Profiles of Arsenic Implanted in Silicon Measured by Means of Neutron Activation Analysis and Radioactive Ion Implantation
- A Transverse Electron Beam Source for the Excitation of CW Lasers
- Electrical Properties of Laser-Annealed Glow-Discharge Amorphous Silicon Layers
- Quantum Transport in PtSi Thin Films and Narrow Wires
- Self-Development Properties of Nitrocellulose for Focused Ion Beam Lithography : Techniques, Instrumentations and Measurement
- Contrast of the X-Ray Mask for Synchrotron Radiation and the Characteristics of Replicated Pattern
- A Blazed Si Grating for Soft X-Ray Fabricated by Two-Stage Reactive Ion-Beam Etching
- Graphoepitaxy of Ge Films on SiO_2 by Zone Melting Recrystallization
- Fabrication of 80 nm-Wide Lines in FPM Resist by H^+ Beam Exposure
- Fabrication of Si0_2 Grating Patterns with Vertical Sidewalls by S0R X-Ray Lithography and Reactive Ion-Beam Etching
- Etched Profile of Si by Ion-Bombardment-Enhanced Etching
- Reactive Ion-Beam Etching of Silicon Carbide
- Microfabrication of LiNbO_3 by Reactive Ion-Beam Etching
- Fabrication of SiO_2 Blazed Holographic Gratings by Reactive Ion-Etching
- Fabrication of a Grating Pattern with Submicrometer Dimension in Silicon Crystal by Ion-Bombardment-Enhanced Etching
- Stoichiometric Change in Gallium Arsenide after Laser-Induced Thermochemical Etching
- 8 nm Wide Line Fabrication in PMMA on Si Wafers by Electron Beam Exposure
- A Stable High-Brightness Electron Gun with Zr/W-tip for Nanometer Lithography. : I. Emission Properties in Schottky- and Thermal Field-Emission Regions
- Ion Beam Assisted Deposition of Metal Organic Films Using Focused Ion Beams