Contrast of the X-Ray Mask for Synchrotron Radiation and the Characteristics of Replicated Pattern
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1979-06-05
著者
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Namba Susumu
Faculty Of Engineering Science Osaka University
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Namba Susumu
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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Matsui Shinji
Nippon Electric Co. Ltd
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Hasegawa Shinya
Faculty Of Engineering Science Osaka University
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Aritome H
Research Center For Extreme Materials Faculty Of Engineering Science Osaka University
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Aritome Hiroaki
Faculty Of Engineering Osaka University
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Moriwaki Kazuyuki
Faculty Of Engineering Science Osaka University:(present Address) Electrical Communication Laborator
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MATSUI Shinji
Faculty of Engineering Science, Osaka University
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Moriwaki K
Ntt Applied Electronics Laboratories
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Namba Susumu
Faculty Of Engineering Science And Research Center For Extreme Materials (rcem) Osaka University
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