Focusing Characteristics of X-Ray Zone Plates Fabricated by Electron Beam Lithography and Reactive Ion Etching
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概要
- 論文の詳細を見る
Focusing characteristics of zone plates fabricated by a new method using electron beam lithography are investigated by the He-Ne laser (632.8 nm), synchrotron radiation and the characteristic X-ray of carbon (4.47 nm). The measured spot size is that of the reduced image of the radiation source and the value can be close to the diffraction limited value by choosing the appropriate optical system. Focusing characteristics can be quantitatively well interpreted by using the lens formula.
- 社団法人応用物理学会の論文
- 1984-06-20
著者
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Aritome Hiroaki
Faculty Of Engineering Osaka University
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Namba Susumu
Faculty Of Engineering Science And Research Center For Extreme Materials (rcem) Osaka University
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AOKI Hitoshi
Faculty of Engineering Science, Osaka University
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Aoki Hitoshi
Faculty Of Engineering Science Osaka University:(present Address)sharp Corporation.
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