Direct Writing of Gratings by Electron Beam in Poly(metyl methacrylate) Optical Waveguides
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概要
- 論文の詳細を見る
Changes in refractive index and in film thickness caused by electron beam irradiation are studied in poly (metyl methacrylate), PMMA. The index at 0.633 μm increases by 8% and the thickness decreases by 12% after 10^<-3> C/cm^2 irradiation. Utilizing these phenomena, gratings with periods of 0.8 and 2 μm are fabricated in PMMA waveguides as Bragg diffraction beam splitters. The effective index change of a guided mode due to the electron beam irradiation is analyzed. An expression for the diffraction efficiency is derived by the coupled wave theory. The dependence of the diffraction efficiency on the grating length is measured, and fairly good agreement is obtained between the experiment and the theory.
- 社団法人応用物理学会の論文
- 1979-02-05
著者
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Namba Susumu
Faculty Of Engineering Science Osaka University
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Kawabe Mitsuo
Faculty Of Engineering Science Osaka University
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Kotani Hideo
Faculty Of Engineering Science Osaka University
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Namba Susumu
Faculty Of Engineering Science And Research Center For Extreme Materials (rcem) Osaka University
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Kawabe Mitsuo
Faculty Of Engineering Science Osaka University:(present Address)institute Of Material Science Unive
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