Ion Beam Etching of InP. II. Reactive Etching with Halogen-Based Source Gases
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1983-07-20
著者
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Namba Susumu
Faculty Of Engineering Science Osaka University
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GAMO Kenji
Faculty of Engineering Science, Osaka University
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He Xi
Faculty Of Engineering Science Osaka University:institute Of Semiconductor Processing Systems
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YUBA Yoshihiko
Faculty of Engineering Science, Osaka University
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ZHANG Yu
Faculty of Engineering Science, Osaka University
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Gamo Kenji
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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Yuba Yoshihiko
Department Of Physical Science Graduate School Of Engineering Science Osaka University
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Yuba Yoshihiko
Faculty Of Engineering Science Osaka University
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Nonoyama Shinji
Quantum Material Research Laboratory Frontier Research Program The Institute Of Physical And Chemica
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Zhang Yu
Faculty Of Engineering Science Osaka University
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Namba S
Riken The Institute Of Physical And Chemical Research
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Namba Susumu
Faculty Of Engineering Science And Research Center For Extreme Materials (rcem) Osaka University
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Namba S
Faculty Of Engineering Osaka University
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