Namba S | Faculty Of Engineering Osaka University
スポンサーリンク
概要
関連著者
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Nonoyama Shinji
Quantum Material Research Laboratory Frontier Research Program The Institute Of Physical And Chemica
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Namba S
Japan Atomic Energy Res. Inst. Kyoto Jpn
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Gamo Kenji
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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Sakamoto Toshitugu
Faculty Of Engineering Science Osaka University
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Namba S
Osaka Univ. Osaka
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Namba Susumu
Research Center For Extreme Materials And Department Of Electrical Engineering Osaka University
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GAMO Kenji
Faculty of Engineering Science, Osaka University
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Namba Susumu
Faculty Of Engineering Science Osaka University
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Gamo Kenji
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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Namba Susumu
Frontier Research Program Riken
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Namba S
Inst. Physical And Chemical Research Wako
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Namba Susumu
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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GAMO Kenji
Department of Electrical Engineering,Faculty of Engineering Sciences,Osaka University
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Namba Susumu
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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Aoyagi Y
Inst. Physics And Chemical Res. (riken) Wako Jpn
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Aoyagi Y
Interdisciplinary Graduate School Of Science & Engineering Tokyo Institute Of Technology
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Murase Kazuo
Department Of Applied Chemistry Faculty Of Science And Engineering Chuo University
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Shiokawa Takao
Semiconductor Laboratory Riken The Institute For Physical And Chemical Research
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MURASE Kazuo
Department of Physics,Faculty of Science,Osaka University
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NAMBA Susumu
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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Takagaki Y
Ntt Basic Res. Lab. Kanagawa Jpn
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Takaoka Sadao
Department Of Geography Faculty Of Science Tokyo Metropolitan University
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TAKAOKA Sadao
Department of Physics,Faculty of Science,Osaka University
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Gamo K
Osaka Univ. Osaka
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TAKAI Mikio
Faculty of Engineering Science, and Research Center for Extreme Materials, Osaka University
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Yuba Yoshihiko
Department Of Physical Science Graduate School Of Engineering Science Osaka University
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ISHIBASHI Koji
Advanced Device Laboratory, The Institute of Physical and Chemical Research (RIKEN)
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TAKAGAKI Yukihiko
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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Ishibashi K
Riken Saitama Jpn
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Aoyagi Yoshinobu
Nanoelectronic Materials Laboratory Frontier Research Program Riken
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Ishibashi Koji
Semiconductors Laboratory The Institute Of Physical And Chemical Research (riken)
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Kim P
Riken The Institute Of Physical And Chemical Research
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Kim Pil
Riken The Institute Of Physical And Chemical Research
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Masuda Kohzoh
Material Science Tsukuba University
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TAKAHARA Junichi
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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TOYODA Koichi
RIKEN, The Institute of physical and Chemical Research
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SHIOKAWA Takao
RIKEN, The Institute of Physical and Chemical Research
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Namba Susumu
Nagasaki Institute Of Applied Science
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Namba Susumu
Riken The Institute Of Physical And Chemical Research
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Kawabe M
Univ. Tsukuba Ibaraki Jpn
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Kawabe M
Nikko Materials Co. Ltd. Saitama Jpn
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Kawabe Mitsuo
Institute Of Applied Physics University Of Tsukuba
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Taniguchi H
Mitsubishi Cable Ind. Ltd. Hyogo Jpn
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Aoyagi Y
Riren (the Institute Of Physical And Chemical Research)
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Aoyagi Yoshinobu
Riken
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Taniguchi H
Faculty Of Engineering Science Osaka University
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Taniguchi H
Department Of Materials Science And Technology Graduate School Of Engineering Sciences Kyushu Univer
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Taniguchi H
Kyushu Univ. Fukuoka Jpn
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Yuba Yoshihiko
Faculty Of Engineering Science Osaka University
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Ochiai Yukinori
Faculty Of Engineering Science Osaka University
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邑瀬 和生
大阪教養
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Namba Susumu
The Institute Of Physical And Chemical Research
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Kawabe Mitsuo
Institute Of Materials Science University Of Tsukuba
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YUBA Yoshihiko
Faculty of Engineering Science, Osaka University
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GAMO Kenji
Research Center for Extereme Materials, Osaka University
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NAMBA Susumu
Research Center for Extereme Materials, Osaka University
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Masuda Kohzoh
Department Of Electric Engineering Faculty Of Engineering Science Osaka University
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YAMASHIRO Tomoki
Department of Electric Engineering, Faculty of Engineering Science, Osaka University
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Kosugi Toshihiko
Department Of Electric Engineering Faculty Of Engineering Science Osaka University
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Yamamoto Tokujirou
Department Of Materials Science And Engineering Kyoto University
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KOSUGI Toshihiko
NTT Wireless System Laboratories
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TANIGAWA Takaho
ULSI Device Development Laboratories NEC Corporation
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Tanigawa Takaho
Faculty Of Engineering Science Osaka University
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HARA Tamio
Toyota Technological Institute
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MASUYAMA Akio
Faculty of Engineering, Toyo University
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Masuyama A
Faculty Of Engineering Toyo University
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Masuyama Akio
Faculty Of Engineering Toyo University
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TANIGUCHI Hiroaki
Department of Energy Sciences, Tokyo Institute of Technology
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Nakai Hideo
Department Of Industrial Chemistry Tokyo University Of Agriculture And Technology
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Nakai Hiroyuki
Faculty Of Engineering Science Osaka University
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AOYAGI Yoshinobu
Institute of Physical and Chemical Research (RIKEN)
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Taniguchi Hiroaki
Department Of Electrical Engineering Osaka Institute Of Technology
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Shiokawa Takao
The Institute of Physical and Chemical Research Wako
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Toyoda Koichi
The Institute of Physical and Chemical Research Wako
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AIHARA Ryuzo
Eiko Engineering Co.Ltd.
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Aoyagi Yoshinobu
Institute Of Physical And Chemical Research
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Yoshizawa T
Graduate School Of Science And Engineering University Of Toyama
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Hamagaki M
The Institute Of Physical And Chemical Research (riken)
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Hamagaki Manabu
Akashi Technical Institute Kawasaki Heavy Industries
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Ochiai Yuichi
Institute Of Materials Science University Of Tsukuba
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Yuba Yoshihiko
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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Nagatomo S
Shizuoka Univ. Shizuoka Jpn
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Minamisono Tadanori
Faculty of Science, Osaka University
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Kim Pil
The Institute Of Physical And Chemical Research
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NAKASHIMA Shin-ichi
Faculty of Engineering, Osaka University
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AOYAGI Yoshinobu
Quantum Materials Research Laboratory, Frontier Research Program, Riken
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NAMBA Susumu
Quantum Materials Research Laboratory, Frontier Research Program, Riken
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Matsumoto T
Institute Of Scientific And Industrial Reserch Univ Of Osaka
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AOKI Kazunori
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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Takaoka S
Graduate School Of Science Osaka University
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Suzuki M
Shizuoka Univ. Hamamatsu
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Murase K
Ntt Corp. Kanagawa Jpn
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Hara T
Toyota Technological Inst. Nagoya Jpn
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Namba Susumu
Institute Of Physical And Chemical Research
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Mori K
Saga Univ. Saga Jpn
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Aoki Kazunori
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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Aoki Kazunori
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kobe University
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He Xi
Faculty Of Engineering Science Osaka University:institute Of Semiconductor Processing Systems
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MATSUI Shinji
Fundamental Res. Labs., NEC Corporation
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NAGAO Taro
Department of Physics,Graduate School of Science,Osaka University
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YAMAZAWA Masahiro
Faculty of Engineering Science, Osaka University
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MATSUMOTO Toshiharu
Faculty of Engineering Science, Osaka University
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SAKAMOTO Toshitugu
Faculty of Engineering Science, Osaka University
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TAKAGAKI Yukihiko
Faculty of Engineering Science, Osaka University
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TAKAOKA Sadao
Faculty of Science, Osaka University
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MURASE Kazuo
Research Center of Extreme Materials, Osaka University
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NAGOYA Tasuku
Department of Electrical Engineering, Faculty of Engineering Sciense, Osaka University
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YUBA Yoshihiko
Department of Electrical Engineering, Faculty of Engineering Sciense, Osaka University
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HAMAGAKI Manabu
RIKEN, The Institute of Physical and Chemical Research
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HARA Tamio
RIKEN, The Institute of Physical and Chemical Research
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MORI Katsumi
Fundamental Research Laboratories, NEC Corporation
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Yamazawa M
Faculty Of Engineering Science Osaka University
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Nagao T
Gunma Univ. Gunma
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SHIHOYAMA Kazuhiko
Center for Optronics Products, HOYA Corporation
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Namba S
Faculty Of Engineering Science Osaka University
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KOSUGI Toshihiko
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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AOYAGI Yoshinobu
Laboratory for Quantum Materials, Frontier Research Program, Institute of Physical and Chemical Rese
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SHIHOYAMA Kazuhiko
Faculty of Engineering, Toyo University
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Matsumoto Takuya
Institute Of Scientific And Industrial Reserch Univ Of Osaka
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Murakami Kouichi
Faculty Of Engineering Science Osaka University
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Yamazawa Masahiro
Faculty Of Engineering Science Osaka University
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Mizuno M.
Department Of Materials Science And Engineering Kyoto University
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Mori K
Department Of Radiological Sciences Ibaraki Prefectural University Of Health Sciences
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Murase K
Graduate School Of Science Osaka University
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Mizuno M
Institute Of Materials Science University Of Tsukuba
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Ishida Shuichi
Division Of Cardiovascular Medicine Department Of Internal Medicine Ohmori Hospital Toho University
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SANDA Atsuo
Faculty of Engineering, Saitama University
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Tsukagoshi K
Inst. Physics And Chemical Res. (riken) Wako Jpn
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MIZUNO Masahiro
Institute of Materials Science, University of Tsukuba
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ISHIBASHI Koji
Laboratory for Quantum Materials, Frontier Research Program, Institute of Physical and Chemical Rese
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Kawai Hiroshi
Department of Bacteriology, Osaka Dental University
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Tamura Shigeharu
Government Industrial Research Institute
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AOYAGI Yoshinobu
The Institute of Physical and Chemical Research
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OKAMOTO Hiroaki
Faculty of Engineering Science, Osaka University
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MASUDA Kohzoh
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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Aoyagi Y
Semiconductor Laboratory Riken The Institute For Physical And Chemical Research
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Hara Tamio
The Institute Of Physical And Chemical Research
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Iwaki Masaya
Institute Of Chemical And Physical Research
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Masuda Kohzoh
Faculty Of Engineering Science Osaka University
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Ishibashi Koji
Department Of Applied Physics And Dimes Delft University Of Technology:the Institute Of Physical And
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Izumi Masahiro
Faculty Of Engineering Science Osaka University
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MURASE Kazuo
Faculty of Science, Osaka University
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KIM Pit
The Institute of Physical and Chemical Research
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TAKAI Mikio
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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ZHANG Yu
Faculty of Engineering Science, Osaka University
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TOBA Hiroshi
Faculty of Engineering Science, Osaka University
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YOKOTA Katsuhiro
Faculty of Engineering, Kansai University
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TANIGICHI Hiroaki
Faculty of Engineering Science, Osaka University
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TANIGUCHI Hiroaki
Faculty of Engineering Science, Osaka University
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ISHIBASHI Koji
Frontier Research Program, RIKEN
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SHIOKAMA Takao
RIKEN, The Institute of physical and Chemical Research
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NAMBA Susumu
Frontire Research Program
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ISHIBASHI Koji
RIKEN, Frontier Research Program
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SUZUKI Masayoshi
Fundamental Research Laboratories, NEC Corporation
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Miyamoto Isao
Faculty of Engineering, Toyo University
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Ochiai Yukinori
Fuculty of Engineering Science, Osaka University
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Aihara Ryuso
JEOL LTD.
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Murase Kazuo
Faculty Of Science Osaka University
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Taniguchi Hiroaki
Faculty Of Engineering Science Osaka University
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Aoyagi Y
The Institute Of Physical And Chemical Research
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Toba Hiroshi
Faculty Of Engineering Science Osaka University:(present Address)yokosuka Electrical Communication L
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Okamoto Hiroaki
Faculty Of Engineering Science Osaka University
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ISHIHARA Shinji
Research Reactor Institute, Kyoto University
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KIMURA Itsuro
Research Reactor Institute, Kyoto University
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Bird Jonathan
Nano-electronics Riken
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KOSUGI Toshihiro
Department of Electric Engineering, Faculty of Engineering Science, Osaka University
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AIHARA Ryuzo
Eico Engineering Co. Lid.
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MIMURA Ryou
JEOL Ltd
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AIHARA Ryuzo
JEOL Ltd
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Xu Zheng
Faculty of Engineering Science, Osaka University
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KOSUGI Toshihiko
Faculty of Engineering Science, Osaka University
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ISHIDA Shuichi
Science University of Tokyo in Yamaguchi
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YOSHIMATSU Seiji
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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TAKAOKA Sadao
Nagasaki Institute of Applied Science
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ISHIBASHI Koji
Institute of Physical and Chemical Research (RIKEN)
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HAMAGAKI Manabu
The Institute of Physical and Chemical Research (RIKEN)
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MIZOBUCHI Akira
Department of Physics, Faculty of Science, Osaka University
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Miyauchi Michihiro
Faculty Of Engineering Osaka University
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Noh S
Korea Res. Inst. Standards And Sci. Daejeon Kor
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Zhang Yu
Faculty Of Engineering Science Osaka University
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ISHIDA Shuichi
Department of Physics,Faculty of Science,Osaka University
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Tamura S
Sony Corp. Yokohama Jpn
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Kimura Itsuro
Research Reactor Institute Kyoto University
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Xu Z
Saga Univ. Saga
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Mimura R
Jeol Ltd
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Hamagaki Manabu
The Institute Of Physical And Chemical Research
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Onishi T
Matsushita Electric Industrial Co. Ltd. Kyoto Jpn
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Wakaya Fujio
Department Of Electronics And Materials Physics School Of Engineering Science Osaka University
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Tamura Susumu
Faculty Of Engineering Kansai University
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Kagami Manabu
Tokyo Research Laboratory Mitsubishi Rayon Co. Ltd.
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Miyamoto Isao
Faculty Of Engineering Toyo University
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Ishida Toshio
Department Of Ophthalmology Teikyo University School Of Medicine
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Ishida Toshio
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University:(present Addres
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Mizobuchi Akira
Department Of Nuclear Science Faculty Of Science Osaka University
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Kusumi Yukihiro
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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Ishihara Shinji
Research Reactor Institute Kyoto University
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Miyake Hideo
Department Of Surgery Japanese Red Cross Nagoya First Hospital
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TSUCHIMOTO Junichi
Faculty of Engineering Science, Osaka University
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NOH Sam
Laboratory for Quantum Materials, Frontier Research Program, Institute of Physical and Chemical Rese
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NAMBA Susumu
Laboratory for Quantum Materials, Frontier Research Program, Institute of Physical and Chemical Rese
著作論文
- Ion Beam Etching of InP. II. Reactive Etching with Halogen-Based Source Gases
- Ion Beam Etching of InP. I. Ar Ion Beam Etching and Fabrication of Grating for Integrated Optics
- Low-Energy Ion-Beam Irradiation Effects on Two-Dimensional Electron Gas in Modulation-Doped AlGaAs/ GaAs Heterostructure : Micro/nanofabrication and Devices
- Low-Energy Ion-Beam Irradiation Effects on Two-Dimensional Electron Gas in Modulation-Doped AlGaAs/GaAs Heterostructure
- Anderson Localization and Universal Conductance Fluctuations with Spin-Orbit Interactions in δ-Doped GaAs Films and Wires
- Phase Coherence Length in Planar Doped Thin GaAs Wires Fabricated by Ion Beam Etching : Microfabrication and Physics
- Phase Coherence Length in Planar Doped Thin GaAs Wires Fabricated by Ion Beam Etching
- Fabrication of Periodic Structures in GaAs by Focused-Ion-Beam Implantation : Microfabrication and Physics
- Fabrication of Periodic Structures in GaAs by Focused-Ion-Beam Implantation
- 40 nm Width Structure of GaAs Fabricated by Fine Focused Ion Beam Lithography and Chlorine Reactive Ion Etching : Techniques, Instrumentations and Measurement
- FIB Exposure Characteristics of LB Film
- Ridge Type Microfabrication by Maskless Ion Implantation of Si into SiO_2 Film
- 30 nm Line Fabrication on PMMA Resist by Fine Focused Be Ion Beam
- The Characteristics of Ion-Beam-Induced Spontaneous Etching of GaAs by Low-Energy Focused Ion Beam Irradiation : Focused Ion Beam Process
- The Characteristics of Ion-Beam-Induced Spontaneous Etching of GaAs by Low-Energy Focused Ion Beam Irradiation
- Low Energy Focused Ion Beam System and Application to Low Damage Microprocess : Etching and Deposition Technology
- Ion Beam Assisted Deposition of Tungsten on GaAs
- Ion Beam Assisted Maskless Etching of GaAs by 50 keV Focused Ion Beam
- Magnetotransport in One-Dimensional Lateral Surface Superlattice Fabricated by Low-Energy Argon Ion Irradiation
- Single Particle Relaxation Times from Shubnikov-de Haas Oscillations in Antidot Structures
- Maskless Etching of AN Using Focused Ion Beam
- Maskless Ion Beam Assisted Etching of Si Using Chlorine Gas
- New High Current Low Energy Ion Source
- Distribution Profiles and Annealing Characteristics of Defects in GaAs Induced by Low-Energy FIB Irradiation : Electrical Properties of Condensed Matter
- Residual Local Strain in Gallium Arsenide Induced by Laser Pyrolytic Etchingin CCl_4 Atmosphere
- Local Temperature Rise during Laser Induced Etching of Gallium Arsenide in SiCl_4 Atmosphere
- Maskless Dry Etching of Gallium Arsenide with a Submicron Line-Width by Laser Pyrolysis in CCl_4 Gas Atmosphere
- Shubnikov-de Haas Oscillations in a Narrow GaAs/AlGaAs Wire
- Aperiodic Conductance Fluctuations in a Narrow GaAs/AlGaAs Wire
- Ion-Implanted Arsenic Profiles in GaAs Encapsulated by SiO_2 and Si_3N_4
- Control of T_c for Niobium by N Ion Implantation
- Lattice-Site Locations of Tin and Antimony Implanted in Gallium Phosphide
- Depth Distribution of Defects in Mg-Ion and Cd-Ion Implanted GaAs
- Photoluminescence Study of Cd-Ion Implanted n-GaAs
- Photoluminescence and Electrical Measurements on Manganese Ion-Implanted GaAs
- Low Temperature Magnetoresistance of a Quasi-Ballistic Narrow Wire Confined by Split Metal Gates
- Size Dependence of Universal Conductance Fluctuations in Narrow N^+ -GaAs Wires : II. LOW TEMPERATURE PROPERTIES OF SOLIDS : Localization, Mesoscopic Systems
- Dynamic Behavior of 30-ps Pulsed-Laser Annealing in Ion-Implanted Si
- A Transverse Electron Beam Source for the Excitation of CW Lasers
- Ballistic Electron Transmission in GaAs-AlGaAs Crossed Wire Junctions
- Residual Strain in Single Crystalline Germanium Islands on Insulator
- Thickness Dependence of SiO_2 Capping Layers on Recrystallization of Germanium Islands on Insulator
- Gallium Arsenide Layers Grown by Molecular Beam Epitaxy on Single Crystalline Germanium Islands on Insulator
- Single Crystalline Germanium Island on Insulator by Zone Melting Recrystallization
- Electrical Properties of Laser-Annealed Glow-Discharge Amorphous Silicon Layers
- Quantum Transport in PtSi Thin Films and Narrow Wires
- Transport Properties in Hexagonal Arrays of Antidots with Different Carrier Densities
- Numerical Study of the Charge Distribution in a Quantum Wire Consisting a Junction of Wide-Narrow Geometry
- Ab Initio Cluster Study of the Interaction of Hydrogen with the GaAs(100) Surface
- Ballistic Electron Transport on Periodic and Quasi-Periodic Triangular Lattices of Scatterers : Micro/nanofabrication and Devices
- Ballistic Electron Transport on Periodic and Quasi-Periodic Triangular Lattices of Scatterers
- Electron Focusing in a Widely Tapered Cross Junction
- Maskless Ion Implantation of Cerium by Focused Ion Beam : Techniques, Instrumentations and Measurement
- Fabrication of Ballistic Quantum Wires and Their Transport Properties : Microfabrication and Physics
- Stoichiometric Change in Gallium Arsenide after Laser-Induced Thermochemical Etching
- Bi-Level Structures for Focused Ion Beam Using Maskless Ion Etching
- Microanalysis by Focused MeV Helium Ion Beam
- Maskless Submicrometer Pattern Formation of Cr Films by Focused Sb Ion Implantation
- Characteristics of Ion Beam Assisted Etching of GaAs Using Focused Ion Beam: Dependence on Gas Pressure
- Pulse Laser Annealing Effects in Si-Implanted GaAs