Sakamoto Toshitugu | Faculty Of Engineering Science Osaka University
スポンサーリンク
概要
関連著者
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Murase Kazuo
Department Of Applied Chemistry Faculty Of Science And Engineering Chuo University
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Takaoka S
Graduate School Of Science Osaka University
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TAKAOKA Sadao
Department of Physics,Faculty of Science,Osaka University
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MURASE Kazuo
Department of Physics,Faculty of Science,Osaka University
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Gamo Kenji
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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邑瀬 和生
大阪教養
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Namba S
Japan Atomic Energy Res. Inst. Kyoto Jpn
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Nonoyama Shinji
Quantum Material Research Laboratory Frontier Research Program The Institute Of Physical And Chemica
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GAMO Kenji
Department of Electrical Engineering,Faculty of Engineering Sciences,Osaka University
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Gamo K
Osaka Univ. Osaka
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SAKAMOTO Tetsuo
Institute of Industrial Science, The University of Tokyo
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Murase K
Ntt Corp. Kanagawa Jpn
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Namba S
Osaka Univ. Osaka
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TAKAHARA Junichi
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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Takagaki Y
Ntt Basic Res. Lab. Kanagawa Jpn
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Namba S
Inst. Physical And Chemical Research Wako
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SAKAMOTO Toshitsugu
Fundamental Research Laboratories, NEC Corporation
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Namba Susumu
Research Center For Extreme Materials And Department Of Electrical Engineering Osaka University
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Namba Susumu
Frontier Research Program Riken
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MIKI Kazushi
Research Center for Advanced Carbon Materials and Nanotechnology Research Institute National Institu
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MIKI Kazushi
Nanotechnology Research Institute-AIST
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TAKAGAKI Yukihiko
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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Yuba Yoshihiko
Department Of Physical Science Graduate School Of Engineering Science Osaka University
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SAKAMOTO Kunihiro
Electrotechnical Laboratory
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Kim Pil
Riken The Institute Of Physical And Chemical Research
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NAMBA Susumu
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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TOYODA Koichi
RIKEN, The Institute of physical and Chemical Research
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SHIOKAWA Takao
RIKEN, The Institute of Physical and Chemical Research
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SAKAMOTO Tsunenori
Electrotechnical Laboratory
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OTO Kenichi
Graduate School of Science, Osaka University
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Aoyagi Y
Interdisciplinary Graduate School Of Science & Engineering Tokyo Institute Of Technology
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Aoyagi Y
Inst. Physics And Chemical Res. (riken) Wako Jpn
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Taniguchi H
Mitsubishi Cable Ind. Ltd. Hyogo Jpn
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MATSUI Shinji
Fundamental Res. Labs., NEC Corporation
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Taniguchi H
Faculty Of Engineering Science Osaka University
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TAKAOKA Sadao
Faculty of Science, Osaka University
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YUBA Yoshihiko
Department of Electrical Engineering, Faculty of Engineering Sciense, Osaka University
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Gamo Kenji
Graduate School Of Engineering Science Osaka University
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Gamo Kenji
Department Of Physical Science Graduate School Of Engineering Science Osaka University:research Cent
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Gamo Kenji
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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Taniguchi H
Department Of Materials Science And Technology Graduate School Of Engineering Sciences Kyushu Univer
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Taniguchi H
Kyushu Univ. Fukuoka Jpn
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BABA Toshio
Fundamental Research Laboratories, NEC Corporation
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KAWAURA Hisao
Fundamental and Environmental Research Laboratories, NEC Corporation
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ANDO Akira
National Institute for Fusion Science
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Fujita J
Crest-jst
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Ando Akira
Murata Mfg. Co. Ltd.
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Namba Susumu
Faculty Of Engineering Science Osaka University
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Namba Susumu
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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Namba Susumu
Nagasaki Institute Of Applied Science
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Namba Susumu
Riken The Institute Of Physical And Chemical Research
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GAMO Kenji
Faculty of Engineering Science, Osaka University
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OCHIAI Yukinori
Fundamental Res. Labs., NEC Corporation
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Matsumoto K
Electrotechnical Lab. Ibaraki‐kenn Jpn
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Matsumoto Kazuhiko
Electrotechnical Laboratory (etl)
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Matsumoto Kazuhiko
Advanced Industrial Science And Technology:tsukuba University:crest
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TSUKAGOSHI Kazuhito
Department of Physics,Graduate School of Science,Osaka University
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OTO Kenichi
Department of Physics, Faculty of Science, Osaka University
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Aoyagi Yoshinobu
Riken
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WAKAYA Fujio
Department of Electronics and Materials Physics, School of Engineering Science, Osaka University
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二瓶 好正
東京理科大学総合研究機構
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HARAGUCHI Masaru
Department of Surgery, National Oita Hospital
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Haraguchi Masaru
Renesas Technol. Itami‐shi Jpn
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Haraguchi Masaru
Department Of Physics Faculty Of Science Osaka University
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Haraguchi Masaru
Department Of Electrical And Electronics Engineering Sophia University
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Haraguchi Masaru
Renesas Technology Corporation
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Namba Susumu
The Institute Of Physical And Chemical Research
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MASUYAMA Akio
Faculty of Engineering, Toyo University
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Masuyama A
Faculty Of Engineering Toyo University
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Masuyama Akio
Faculty Of Engineering Toyo University
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TANIGUCHI Hiroaki
Department of Energy Sciences, Tokyo Institute of Technology
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MURASE Kazuo
Faculty of Science, Osaka University
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Matsumoto K
Nippon Sanso Corp. Ibaraki Jpn
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NAGAO Taro
Department of Physics,Graduate School of Science,Osaka University
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Taniguchi Hiroaki
Department Of Electrical Engineering Osaka Institute Of Technology
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MURASE Kazuo
Research Center of Extreme Materials, Osaka University
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Junichi Yanagisawa
Department Of Physical Science Graduate School Of Engineering Science Osaka University:research Cent
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Shiokawa Takao
The Institute of Physical and Chemical Research Wako
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Toyoda Koichi
The Institute of Physical and Chemical Research Wako
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Murase Kazuo
Faculty Of Science Osaka University
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Nagao T
Gunma Univ. Gunma
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Ochiai Yukinori
Faculty Of Engineering Science Osaka University
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YANAGISAWA Junichi
Department of Physical Science, Graduate School of Engineering Science, Osaka University
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SERIKAWA Tadashi
NTT Interdisciplinary Research Labs.
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ISHIDA Shuichi
Science University of Tokyo in Yamaguchi
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Kim Pil
The Institute Of Physical And Chemical Research
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SATO Katsuaki
Faculty of Technology, Tokyo University of Agriculture and Technology
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Sato Katsuaki
Faculty Of Technology Tokyo University Of Agriculture And Technology
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Matsumoto T
Institute Of Scientific And Industrial Reserch Univ Of Osaka
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AKSENOV Igor
Faculty of Technology, Tokyo University of Agriculture and Technology
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NISHIKAWA Nobuyuki
Faculty of Technology, Tokyo University of Agriculture and Technology
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SHINZATO Takeshi
Faculty of Technology, Tokyo University of Agriculture and Technology
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Ahmed H
Univ. Cambridge Cambridge Gbr
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Matsuhata H
Aist Tsukuba Jpn
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Matsuhata Hirofumi
Division Of Electron Devices Electrotechnical Laboratory
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MATSUHATA Hirofumi
Electrotechnical Laboratory
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若家 冨士男
Osaka Univ. Osaka
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蒲生 健次
大阪大学基礎工学部
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Suzuki M
Shizuoka Univ. Hamamatsu
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Aksenov I
Joint Res. Center For Atom Technol. Ibaraki Jpn
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Aksenov Igor
Faculty Of Technology Tokyo University Of Agriculture And Technology:(present Address)institute Of P
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Sato K
Depertment Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Hwang Sung
School Of Electrical Engineering Korea University:institute Of Quantum Information Processing And Sy
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Hwang Sung
Fundamental Research Laboratories Nec Corporation
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Mori K
Saga Univ. Saga Jpn
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Sato K
National Institute For Fusion Science
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TANAKA Teruhiko
Departments of Neurosurgery, Aomori Prefectural Central Hospital
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YUBA Yoshihiko
Faculty of Engineering Science, Osaka University
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Aoyagi Y
Riren (the Institute Of Physical And Chemical Research)
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蒲生 健次
大阪大学基礎工学部電気工学科
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ISHIBASHI Koji
Advanced Device Laboratory, The Institute of Physical and Chemical Research (RIKEN)
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YAMAZAWA Masahiro
Faculty of Engineering Science, Osaka University
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MATSUMOTO Toshiharu
Faculty of Engineering Science, Osaka University
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SAKAMOTO Toshitugu
Faculty of Engineering Science, Osaka University
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TAKAGAKI Yukihiko
Faculty of Engineering Science, Osaka University
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GAMO Kenji
Research Center for Extereme Materials, Osaka University
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NAMBA Susumu
Research Center for Extereme Materials, Osaka University
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NAGOYA Tasuku
Department of Electrical Engineering, Faculty of Engineering Sciense, Osaka University
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Sato Katsuaki
Faculty Of Technology Tokyo University Of Agriculture & Techonology
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Sato Kuninori
Institute For Fusion Science
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Ishibashi K
Riken Saitama Jpn
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MORI Katsumi
Fundamental Research Laboratories, NEC Corporation
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Matsuhata H
Toyota Technological Institute:(present Address)electrotechnical Laboratory
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Yamazawa M
Faculty Of Engineering Science Osaka University
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Yuba Yoshihiko
Faculty Of Engineering Science Osaka University
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Aoyagi Yoshinobu
Nanoelectronic Materials Laboratory Frontier Research Program Riken
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Sato K
National Defense Acad. Yokosuka Jpn
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Sato K
Faculty Of Technology Tokyo Universily Of Agriculture And Technology
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Nakamura K
Department Of Electrical Engineering School Of Engineering Nagoya University
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SHIHOYAMA Kazuhiko
Center for Optronics Products, HOYA Corporation
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YAMASHIRO Tomoki
Department of Electric Engineering, Faculty of Engineering Science, Osaka University
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SHIRAI Seiiti
NTT Interdisciplinary Research Labs.
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大山 忠司
阪大教養
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Fukumi K
National Inst. Advanced Industrial Sci. And Technol. Jpn
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ISHIDA Masahiko
NEC Fundamental and Environmental Research Laboratories
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OCHIAI Yukinori
NEC Fundamental and Environmental Research Laboratories
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HARA Tamio
Toyota Technological Institute
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AOYAGI Yoshinobu
The Institute of Physical and Chemical Research
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Nunoshita M
Graduate School Of Materials Science Nara Institute Of Science And Technology
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NAKANISHI Hisayuki
Faculty of Science and Technology, Science University of Tokyo
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SAKAMOTO Takao
Faculty of Technology, Tokyo University of Agriculture and Technology
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Kobayashi K
Dep. Of Electronic Sci. And Engineering Kyoto Univ. Katsura Nishikyo Kyoto 615-8510 Japaninnovative
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Nunoshita M
Mitsubishi Electric Corp. Hyogo Jpn
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Nunoshita Masahiro
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Nunoshita Masahiro
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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NUNOSHITA Masahiro
Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation
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大山 忠司
Osaka Univ. Osaka
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Fujita Jun-ichi
Nec Fundamental Research Laboratories
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Hara T
Toyota Technological Inst. Nagoya Jpn
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YAMAMOTO Takahiro
Department of Materials Engineering, University of Tokyo
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Nomura E
Nec Corp. Ibaraki Jpn
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Nomura Eiichi
Fundamental Research Laboratories Nec Corporation
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Nomura Eiichi
Fundamental Research Labs Nec Corporation
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MANAKO Shoko
Fundamental Res. Labs., NEC Corporation
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FUJITA Jun-ichi
Fundamental Res. Labs., NEC Corporation
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OHNISHI Yoshitake
Fundamental Research Laboratories, NEC Corporation
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MATSUI Shinji
Himeji Institute of Technology, Graduate School of Science, LASTI
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Gamo Kenji
Graduate School of Engineering Science, Osaka University
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TANIGICHI Hiroaki
Faculty of Engineering Science, Osaka University
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TANIGUCHI Hiroaki
Faculty of Engineering Science, Osaka University
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OWARI Masanori
Environmental Science Center, The University of Tokyo
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MIYAZAKI Hiroshi
Department of Internal Medicine III, Kurume University School of Medicine
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OKUMURA Hajime
Electrotechnical Laboratory (ETL)
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ISHIBASHI Koji
Frontier Research Program, RIKEN
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SHIOKAMA Takao
RIKEN, The Institute of physical and Chemical Research
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NAMBA Susumu
Frontire Research Program
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ISHIBASHI Koji
RIKEN, Frontier Research Program
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HAMAGAKI Manabu
RIKEN, The Institute of Physical and Chemical Research
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HARA Tamio
RIKEN, The Institute of Physical and Chemical Research
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SUZUKI Masayoshi
Fundamental Research Laboratories, NEC Corporation
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Miyamoto Isao
Faculty of Engineering, Toyo University
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Ochiai Yukinori
Fuculty of Engineering Science, Osaka University
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Kamigaki K
College Of Liberal Arts Toyama University
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Taniguchi Hiroaki
Faculty Of Engineering Science Osaka University
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Okumura H
National Institute Of Advanced Industrial Science And Technology Power Electronics Research Center
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Okumura H
Electrotechnical Lab. Ibaraki Jpn
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Okumura Hajime
Nakano Central Research Institute Nakano Vinegar Co. Ltd.
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Okumura Hajime
Electrotechnical Laboratory
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Ohyama Teruo
Department Of Physics Gakushuin Univ
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KOBAYASHI Kazuhiro
Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation
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MURAI Hiroyuki
Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation
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SAKAMOTO Takao
Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation
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BAERT Kris
Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation
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TOKIOKA Hidetada
Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation
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SUGAWARA Takashi
Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation
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MATSUTANI Yuuichi
Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation
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NAMIZAKI Hirofumi
Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation
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YAMAMOTO Azusa
Faculty of Science and Engineering, Tokyo University of Science
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NIHEI Yoshimasa
Faculty of Science and Engineering, Tokyo University of Science
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KAITO Takashi
Seiko Instruments Inc.
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Ishida M
Sii Nanotechnology Inc.
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FUJII Ken-ichi
Graduate School of Science, Osaka University
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YOSHIZAWA Takeshi
Graduate School of Science, Osaka University
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OHYAMA Tyuzi
Graduate School of Science, Osaka University
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TAKAOKA Sadao
Graduate School of Science, Osaka University
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MURASE Kazuo
Graduate School of Science, Osaka University
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MATSUTANI Masahiro
Department of Physical Science, Graduate School of Engineering Science, Osaka University
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NAKAGAWA Kazuo
faculty of Science, Osaka University
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OTO Kenichi
faculty of Science, Osaka University
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NAKAO Yukio
Department of Physics, Faculty of Science, Osaka University
著作論文
- Effect of Fermi Level Motion on the Optical, ESR and Transport Properties of CuInSe_2
- ESR and Optical Studies of CuInS_2 Single Crystals
- Calixarene Electron Beam Resist for Nano-Lithography
- Investigation of Hall Resistivity in Antidot Lattices with respect to Commensurability Oscillations
- On the Mechanism of Commensurability Oscillations in Anisotropic Antidot Lattices
- Current-Direction-Dependent Commensurate Oscillations in GaAs/AlGaAs Antidot Superlattice
- Low-Energy Ion-Beam Irradiation Effects on Two-Dimensional Electron Gas in Modulation-Doped AlGaAs/ GaAs Heterostructure : Micro/nanofabrication and Devices
- Low-Energy Ion-Beam Irradiation Effects on Two-Dimensional Electron Gas in Modulation-Doped AlGaAs/GaAs Heterostructure
- Anderson Localization and Universal Conductance Fluctuations with Spin-Orbit Interactions in δ-Doped GaAs Films and Wires
- Phase Coherence Length in Planar Doped Thin GaAs Wires Fabricated by Ion Beam Etching : Microfabrication and Physics
- Phase Coherence Length in Planar Doped Thin GaAs Wires Fabricated by Ion Beam Etching
- Fabrication of Periodic Structures in GaAs by Focused-Ion-Beam Implantation : Microfabrication and Physics
- Fabrication of Periodic Structures in GaAs by Focused-Ion-Beam Implantation
- 40 nm Width Structure of GaAs Fabricated by Fine Focused Ion Beam Lithography and Chlorine Reactive Ion Etching : Techniques, Instrumentations and Measurement
- FIB Exposure Characteristics of LB Film
- Ridge Type Microfabrication by Maskless Ion Implantation of Si into SiO_2 Film
- 30 nm Line Fabrication on PMMA Resist by Fine Focused Be Ion Beam
- A Novel Fabrication Method for Polycrystalline Silicon Thin-Film Transistors with a Self-Aligned Lightly Doped Drain Structure
- Supercritical Fluid Clean-Up of Environmental Samples for the Analysis of Polycyclic Aromatic Hydrocarbons Using Time-of-Flight Secondary Ion Mass Spectrometry
- Potential Modulation of Semiconductor Dot Array System due to Photoexcitation
- Electron-Beam-Induced Oxidation for Single-Electron Devices
- Investigation of Photoresponse in Photoconducting Semiconductor-Superconductor Microstructure
- Transport Properties and Fabrication of Coupled Electron Waveguides
- Evaluation of Edge Channel Width by Frequency Dependence of Capacitance Minima in Quantum Hall Regime
- Magnetic Electron Focusing Effect in GaAs/AlGaAs Heterostructure with Gate-Controlled Byway Channel
- Magnetotransport in Hexagonal and Rectangular Antidot Lattices
- Grain Boundary Structure and Bandtail Transport in High Mobility Poly-Si TFTs
- Investigation of In Situ Process for GaAs/AlGaAs Buried Quantum Wires
- Fabrication and Magnetotransport of One-Dimensional Lateral Surface Superlattice Fabricated by Low-Energy Ion Irradiation
- Magnetotransport in One-Dimensional Lateral Surface Superlattice Fabricated by Low-Energy Argon Ion Irradiation
- Variable-Range Hopping in Polycrystalline Silicon Thin-Film Transistor
- Electrical Conductions of High Mobility Poly-Si Thin Film Transistors at Low Temperatures
- Estimation of Damage Induced by Focused Ga Ion Beam Irradiation
- Transport Properties of Coupled Electron Waveguides Buried irn Heterostructure
- Single Particle Relaxation Times from Shubnikov-de Haas Oscillations in Antidot Structures
- Maskless Etching of AN Using Focused Ion Beam
- Maskless Ion Beam Assisted Etching of Si Using Chlorine Gas
- Abrupt Si/Ge/Si(001) Interfaces Fabricated with Bi as a Surfactant
- Which Surfactant Shall We Choose for the Heteroepitaxy of Ge/Si(001)? : Bi as a Surfactant with Small Self-Incorporation
- Structure and Resonant Characteristics of Amorphous Carbon Pillars Grown by Focused-Ion-Beam-Induced Chemical Vapor Deposition
- Formation and Characterization of Thin Oxide Layers on the Spatially Controlled Atomic-Step-Free Si(001) Surface
- Formation and Characterization of Thin Oxide Layers on the Spatially Controlled Atomic-Step-Free Si(001) Surface
- Spatially Controlled Formation of an Atomically Flat Si(001) Surface by Annealing with a Direct Current in an Ultrahigh Vacuum
- Electron-Beam-Induced Oxidation for Single-Electron Devices
- Spatially Controlled Formation of Atomically Flat Si(001) Surface by Annealing with a Direct Current in UHV
- Observation of Direct Band Gap Properties in Ge_nSi_m Strained-Layer Superlattices
- Nonlinear Dynamics in Directly Modulated Self-Pulsating Laser Diodes with a Highly Doped Saturable Absorption Layer(Optics and Quantum Electronics)
- Stability of Optical Dynamic Memory Operation under Period-Two State of Chaotic System
- Observation of 77 K Staircase I-V Characteristics in 2DEG's Irradiated by a Focused Ion Beam
- Single Electron Digital Phase Modulator
- Ballistic Electron Transmission in GaAs-AlGaAs Crossed Wire Junctions
- Transport Properties in Hexagonal Arrays of Antidots with Different Carrier Densities
- Ballistic Electron Transport on Periodic and Quasi-Periodic Triangular Lattices of Scatterers : Micro/nanofabrication and Devices
- Ballistic Electron Transport on Periodic and Quasi-Periodic Triangular Lattices of Scatterers
- Electron Focusing in a Widely Tapered Cross Junction
- Silicon nano-scale devices
- Single-Electron Memory Fabricated from Doped Silicon-on-Insulator Film
- Hot Electron Transport in Si-MOSFETs
- Transport Properties in Sub-10-nm-gate EJ-MOSFETs
- Si In-Plane Floating-Dot Memory with a Single Electron Transistor
- Fabrication and Characterization of 14-nm-Gate-Length EJ-MOSFETs
- Proposal of Pseudo Source and Drain MOSFETs for Evaluating 10-nm Gate MOSFETs
- Spatial Distributions of Individual Traps in a Si/SiO_2 Interface
- Spatial Distributions of Individual Traps in a Si/SiO_2 Interface
- Maskless Ion Implantation of Cerium by Focused Ion Beam : Techniques, Instrumentations and Measurement
- Development of an Ion and Electron Dual Focused Beam Apparatus for Three-Dimensional Microanalysis
- Behavior of Gallium Secondary Ion Intensity in Gallium Focused Ion Beam Secondary Ion Mass Spectrometry
- Confinement Potential in an Asymmetrically Biased Quantum Point Contact
- Fabrication of Ballistic Quantum Wires and Their Transport Properties : Microfabrication and Physics
- Confinement Potential in an Asymmetrically Biased Quantum Point Contact
- Bi-Level Structures for Focused Ion Beam Using Maskless Ion Etching
- Maskless Submicrometer Pattern Formation of Cr Films by Focused Sb Ion Implantation