Fabrication and Characterization of 14-nm-Gate-Length EJ-MOSFETs
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概要
- 論文の詳細を見る
- 1997-09-16
著者
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Fujita J
Crest-jst
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OCHIAI Yukinori
Fundamental Res. Labs., NEC Corporation
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SAKAMOTO Toshitsugu
Fundamental Research Laboratories, NEC Corporation
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BABA Toshio
Fundamental Research Laboratories, NEC Corporation
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SAKAMOTO Tetsuo
Institute of Industrial Science, The University of Tokyo
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KAWAURA Hisao
Fundamental and Environmental Research Laboratories, NEC Corporation
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Sakamoto Toshitugu
Faculty Of Engineering Science Osaka University
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Baba T
Fundamental Research Laboratories Nec Corporation:(present Office)silicon System Laboratories Nec Co
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Baba Toshio
Fundamental And Environmental Research Laboratories Nec Corporation
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Shiokawa Takao
Semiconductor Laboratory Riken The Institute For Physical And Chemical Research
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Sakamoto T
Department Of Communication Engineering Faculty Of Computer Science And System Engineering Okayama P
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Kawaura H
Fundamental Research Laboratories Nec Caporation
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Sakamoto Toshitsugu
Fundamental Research Laboratories Nec Corporation
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Sakamoto Toshitsugu
Fundamental and Environmental Research Labs., NEC Corp., Tsukuba, Ibaraki 305-8501, Japan
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