Sub-10-nm Electron Beam Lithography Using a Poly(α-methylstyrene) Resist with a Molecular Weight of 650
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-12-30
著者
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Fujita J
Crest-jst
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Nomura E
Nec Corp. Ibaraki Jpn
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Nomura Eiichi
Fundamental Research Laboratories Nec Corporation
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Nomura Eiichi
Fundamental Research Labs Nec Corporation
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MANAKO Shoko
Fundamental Res. Labs., NEC Corporation
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FUJITA Jun-ichi
Fundamental Res. Labs., NEC Corporation
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OCHIAI Yukinori
Fundamental Res. Labs., NEC Corporation
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TANIGAKI Katsumi
Fundamental Research Laboratories, NEC Corporation
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Tanigaki Katsumi
Fundamental Research Laboratories Nec Corporation:(present Address) Department Of Material Science F
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Manaka Susumu
Fundamental Research Laboratories Nec Corporation
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