Electron-Stimulated Desorption and in situ Scanning Electron Microscopy Study on Self-Developing Reaction of High-Resolution Inorganic Electron Beam Resist
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-07-15
著者
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Fujita J
Crest-jst
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FUJITA Jun-ichi
Fundamental Res. Labs., NEC Corporation
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OCHIAI Yukinori
Fundamental Res. Labs., NEC Corporation
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MATSUI Shinji
Fundamental Res. Labs., NEC Corporation
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WATANABE Hideyuki
Diamond Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
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WATANABE Heiji
Joint Research Center for Atom Technology, Angstrom Technology Partnership (JRCAT-ATP), c
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ICHIKAWA Masakazu
Joint Research Center for Atom Technology, Angstrom Technology Partnership (JRCAT-ATP), c
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Watanabe Hirohito
Institute Of Material Science University Of Tsukuba
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Watanabe H
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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Watanabe H
Semiconductor Leading Edge Technol. Inc. Yokohama Jpn
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Ishida M
Sii Nanotechnology Inc.
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Ichikawa Masakazu
Joint Research Center For Atom Technology
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Ichikawa Masakazu
Joint Research Center For Atom Technology Angstrom Technology Partnership
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Ichikawa Masakazu
Joint Research Center For Atom Technology Angstrom Technology Partnership (jrcat-atp) C
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Ichikawa Mitsuru
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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WATANABE Hajime
ULSI Laboratory, Mitsubishi Electric Corporation
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Manaka Susumu
Fundamental Research Laboratories Nec Corporation
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IWASA Masayuki
SII Nanotechnology Inc.
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Watanabe Hideo
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Watanabe Heiji
Joint Research Center For Atom Technology Angstrom Technology Partnership (jrcat-atp)
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Iwasa Masayuki
Sii Nanotechnology Inc. Tokyo Jpn
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