FUJITA Jun-ichi | Fundamental Res. Labs., NEC Corporation
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概要
関連著者
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FUJITA Jun-ichi
Fundamental Res. Labs., NEC Corporation
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OCHIAI Yukinori
Fundamental Res. Labs., NEC Corporation
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Fujita J
Crest-jst
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MATSUI Shinji
Fundamental Res. Labs., NEC Corporation
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Manaka Susumu
Fundamental Research Laboratories Nec Corporation
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MANAKO Shoko
Fundamental Res. Labs., NEC Corporation
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Nomura E
Nec Corp. Ibaraki Jpn
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Nomura Eiichi
Fundamental Research Laboratories Nec Corporation
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Nomura Eiichi
Fundamental Research Labs Nec Corporation
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WATANABE Hideyuki
Diamond Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
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Watanabe Hirohito
Institute Of Material Science University Of Tsukuba
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Watanabe H
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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Watanabe H
Semiconductor Leading Edge Technol. Inc. Yokohama Jpn
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Ichikawa Masakazu
Joint Research Center For Atom Technology
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Ichikawa Masakazu
Joint Research Center For Atom Technology Angstrom Technology Partnership (jrcat-atp) C
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WATANABE Hajime
ULSI Laboratory, Mitsubishi Electric Corporation
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Watanabe Hideo
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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WATANABE Heiji
Joint Research Center for Atom Technology, Angstrom Technology Partnership (JRCAT-ATP), c
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ICHIKAWA Masakazu
Joint Research Center for Atom Technology, Angstrom Technology Partnership (JRCAT-ATP), c
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Ishida M
Sii Nanotechnology Inc.
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Ogura Takashi
Silicon Systems Research Laboratories Nec Corporation
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Ichikawa Masakazu
Joint Research Center For Atom Technology Angstrom Technology Partnership
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Ichikawa Mitsuru
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Ishida Masahiko
Fundamental And Environmental Research Laboratories Nec Corporation
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IWASA Masayuki
SII Nanotechnology Inc.
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Fujita Jun-ichi
Fundamental Research Laboratories Nec Corporation
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OHSHIMA Eiji
Tsukuba Research Laboratories, Tokuyama Corp.
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MOMODA Junji
Tsukuba Research Laboratories, Tokuyama Corp.
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Watanabe Heiji
Joint Research Center For Atom Technology Angstrom Technology Partnership (jrcat-atp)
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Iwasa Masayuki
Sii Nanotechnology Inc. Tokyo Jpn
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OHNISHI Yoshitake
Fundamental Research Laboratories, NEC Corporation
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SAKAMOTO Toshitsugu
Fundamental Research Laboratories, NEC Corporation
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TANIGAKI Katsumi
Fundamental Research Laboratories, NEC Corporation
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Ohshima Ken-ichi
Institute Of Materials Science University Of Tsukuba
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UWE Hiromoto
Institute of Applied Physics, University of Tsukuba
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SAKAMOTO Tetsuo
Institute of Industrial Science, The University of Tokyo
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Ohshima Ken-ichi
Institute Of Applide Physics University Of Tsukuba
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Tanigaki Katsumi
Fundamental Research Laboratories Nec Corporation:(present Address) Department Of Material Science F
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Sakamoto Toshitugu
Faculty Of Engineering Science Osaka University
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WATANABE Heiji
Fundamental Research Laboratories, NEC Corporation
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BABA Masakazu
Fundamental Research Laboratories, NEC Corporation
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Kim H‐t
Seoul National Univ. Seoul Kor
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Kim Hyun-tak
Institute Of Applied Physics University Of Tsukuba
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Baba M
Institute For Solid State Physics University Of Tokyo
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Uwe Hiromoto
Institure Of Applied Physics University Of Tsukuba
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Baba Masakazu
Fundamental Research Laboratories Nec Corporation
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Baba Masakazu
Ntt Information And Communication Systems Laboratories
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Shiokawa Takao
Semiconductor Laboratory Riken The Institute For Physical And Chemical Research
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Watanabe Heiji
Fundamental Research Laboratories Nec Corporation
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Sakamoto T
Department Of Communication Engineering Faculty Of Computer Science And System Engineering Okayama P
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Aizaki Naoaki
Fundamental Research Laboratories Nec Corporation
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SUMI Atsushi
Institute of Applied Physics, University of Tsukuba
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TERASHIMA Koichi
Fundamental Research Laboratories, NEC Corporation
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Sumi A
Department Of Applied Physics School Of Engineering Nagoya University
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Sakamoto Toshitsugu
Fundamental Research Laboratories Nec Corporation
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Ohshima K
Univ. Tsukuba Tsukuba Jpn
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SAMOTO Norihiko
Kansai Electronics Research Laboratories, NEC Corporation
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Terashima Koichi
Fundamental Research Laboratories Nec Corporation
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Ohnishi Yoshitake
Fundamental Research Laboratories Nec Corporation
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Samoto Norihiko
Kansai Electronics Research Laboratories Nec Corporation
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Ochiai Yukinori
Fundamental Research Laboratories, NEC Corp., 34 Miyukigaoka, Tsukuba 305-8501, Japan
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Fujita Jun-ichi
Fundamental Research Laboratories, NEC Corp., 34 Miyukigaoka, Tsukuba 305-8501, Japan
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Ohshima Eiji
Tsukuba Research Laboratories, Tokuyama Corp., 40 Wadai, Tsukuba 300-4247, Japan
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Sakamoto Toshitsugu
Fundamental and Environmental Research Labs., NEC Corp., Tsukuba, Ibaraki 305-8501, Japan
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Ishida Masahiko
Fundamental Research Laboratories, NEC Corp., 34 Miyukigaoka, Tsukuba 305-8501, Japan
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Ogura Takashi
Silicon Systems Research Laboratories, NEC Corp., 1120 Shimokuzawa Sagamihara, Kanagawa 229-1198, Japan
著作論文
- Nanometer-Scale Patterning of Polystyrene Resists in Low-Voltage Electron Beam Lithography
- Calixarene Electron Beam Resist for Nano-Lithography
- Resolution-Limit Study of Chain-Structure Negative Resist by Electron Beam Lithography
- Sub-10-nm Electron Beam Lithography Using a Poly(α-methylstyrene) Resist with a Molecular Weight of 650
- Self-Developing Properties of an Inorganic Electron Beam Resist and Nanometer-Scale Patterning Using a Scanning Electron Beam
- Electron-Stimulated Desorption and in situ Scanning Electron Microscopy Study on Self-Developing Reaction of High-Resolution Inorganic Electron Beam Resist
- Nanometer-Scale Direct Carbon Mask Fabrication Usirng Electron-Beam-Assisted Deposition
- Sub-10-nm-Scale Lithography Using p-chloromethyl-methoxy-calix[4]arene Resist
- Synthesis of Superconducting Epitaxial Films of Ba_K_xBiO_3 by Laser Ablation
- YBa_2Cu_3O_y Superconducting Thin Film Obtained by Laser Annealing : Electrical Properties of Condensed Matter
- Nanolithography Using a Chemically Amplified Negative Resist by Electron Beam Exposure
- Sub-10-nm-Scale Lithography Using $p$-chloromethyl-methoxy-calix[4]arene Resist