Ishida Masahiko | Fundamental And Environmental Research Laboratories Nec Corporation
スポンサーリンク
概要
関連著者
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Ishida Masahiko
Fundamental And Environmental Research Laboratories Nec Corporation
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FUJITA Jun-ichi
Fundamental Res. Labs., NEC Corporation
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OCHIAI Yukinori
Fundamental Res. Labs., NEC Corporation
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Ogura Takashi
Silicon Systems Research Laboratories Nec Corporation
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OHSHIMA Eiji
Tsukuba Research Laboratories, Tokuyama Corp.
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MOMODA Junji
Tsukuba Research Laboratories, Tokuyama Corp.
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Ochiai Yukinori
System Devices And Fundamental Research Nec Corporation
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Ichikawa Masakazu
Joint Research Center For Atom Technology
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Ichikawa Masakazu
Joint Research Center For Atom Technology Angstrom Technology Partnership (jrcat-atp) C
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Arai K
Electrotechnical Laboratory
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NARIHIRO Mitsuru
System Devices Research Laboratories, NEC Corporation
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ARAI Kohichi
System Devices Research Laboratories, NEC Corporation
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NATSUKA Yasutaka
Tsukuba Laboratory, Tokuyama Corporation
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Natsuka Yasutaka
Tsukuba Laboratory Tokuyama Corporation
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Narihiro Mitsuru
System Devices And Fundamental Research Nec Corporation
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Ochiai Yukinori
Fundamental Research Laboratories, NEC Corp., 34 Miyukigaoka, Tsukuba 305-8501, Japan
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Fujita Jun-ichi
Fundamental Research Laboratories, NEC Corp., 34 Miyukigaoka, Tsukuba 305-8501, Japan
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Ohshima Eiji
Tsukuba Research Laboratories, Tokuyama Corp., 40 Wadai, Tsukuba 300-4247, Japan
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Ishida Masahiko
Fundamental Research Laboratories, NEC Corp., 34 Miyukigaoka, Tsukuba 305-8501, Japan
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Ogura Takashi
Silicon Systems Research Laboratories, NEC Corp., 1120 Shimokuzawa Sagamihara, Kanagawa 229-1198, Japan
著作論文
- 10-nm-Scale Pattern Delineation Using Calixarene Electron Beam Resist for Complementary Metal Oxide Semiconductor Gate Etching
- Sub-10-nm-Scale Lithography Using p-chloromethyl-methoxy-calix[4]arene Resist
- Sub-10-nm-Scale Lithography Using $p$-chloromethyl-methoxy-calix[4]arene Resist