Sub-10-nm-Scale Lithography Using p-chloromethyl-methoxy-calix[4]arene Resist
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-06-30
著者
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FUJITA Jun-ichi
Fundamental Res. Labs., NEC Corporation
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OCHIAI Yukinori
Fundamental Res. Labs., NEC Corporation
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Ogura Takashi
Silicon Systems Research Laboratories Nec Corporation
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Ichikawa Masakazu
Joint Research Center For Atom Technology
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Ichikawa Masakazu
Joint Research Center For Atom Technology Angstrom Technology Partnership (jrcat-atp) C
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Ishida Masahiko
Fundamental And Environmental Research Laboratories Nec Corporation
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OHSHIMA Eiji
Tsukuba Research Laboratories, Tokuyama Corp.
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MOMODA Junji
Tsukuba Research Laboratories, Tokuyama Corp.
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