Nanometer-Scale Patterning of Polystyrene Resists in Low-Voltage Electron Beam Lithography
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1997-12-30
著者
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Fujita J
Crest-jst
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Nomura E
Nec Corp. Ibaraki Jpn
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Nomura Eiichi
Fundamental Research Laboratories Nec Corporation
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Nomura Eiichi
Fundamental Research Labs Nec Corporation
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MANAKO Shoko
Fundamental Res. Labs., NEC Corporation
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FUJITA Jun-ichi
Fundamental Res. Labs., NEC Corporation
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OCHIAI Yukinori
Fundamental Res. Labs., NEC Corporation
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MATSUI Shinji
Fundamental Res. Labs., NEC Corporation
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Manaka Susumu
Fundamental Research Laboratories Nec Corporation
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