Photoelectron spectroscopy study of the valence band region in diamond-like carbon thin films
スポンサーリンク
概要
著者
-
Haruyama Y
Graduate School Of Science Laboratory Of Advanced Science And Technology For Industry (lasti) Univer
-
Haruyama Yuichi
Uvsor Facility Institute For Molecular Science:(present Address)laboratory Of Advanced Science And T
-
Haruyama Yuichi
Institute Of Physics University Of Tsukuba
-
Manaka Susumu
Fundamental Research Laboratories Nec Corporation
-
Matsui S
Graduate School Of Science Laboratory Of Advanced Science And Technology For Industry (lasti) Univer
関連論文
- Room Temperature Nanoimprinting Using Release-Agent Spray-Coated Hydrogen Silsesquioxane
- Electronic Structure of Stoichiometric and Reduced SrTiO_3(100) srufaces : A Photoemission Study
- Nanometer-Scale Patterning of Polystyrene Resists in Low-Voltage Electron Beam Lithography
- Calixarene Electron Beam Resist for Nano-Lithography
- Resolution-Limit Study of Chain-Structure Negative Resist by Electron Beam Lithography
- Fluorine Gas Field Ion Source : Beam Induced Physics and Chemistry
- Fabrication of Nanomanipulator with SiO_2/DLC Heterostructure by Focused-Ion-Beam Chemical Vapor Deposition
- Brilliant Blue Observation from a Morpho-Butterfly-Scale Quasi-Structure
- Characteristics of Nano-Electrostatic Actuator Fabricated by Focused Ion Beam Chemical Vapor Deposition
- Sub-10-nm Electron Beam Lithography Using a Poly(α-methylstyrene) Resist with a Molecular Weight of 650
- Photoluminescence Studies and Solar-Cell Application of CuInSe_2 Thin Films Prepared using Selenization Techniques
- Spectroscopy Studies of Temperature-Induced Valence Transition on EuNi_2(Si_Ge_x)2 around Eu 3d-4f, 4d-4f and Ni 2p-3d Excitation Regions
- Scanning Tunneling Microscopy and Spectroscopy Observation of Reduced BaTiO_3(100) Surface
- Photoemission Study of Mixed-Valent Tm-monochalcogenides : Evidence of Electron-Correlation Effect in Different Tm-Core Levels (Condensed Matter: Electronic Structure, Electrical, Magnetic and Optical Properties)
- Photoemission Study of Mixed-Valent Tm-monochalcogenides : Evidence of Electron-Correlation Effect in Different Tm-Core Levels
- Photoemission study of the Au-SrTiO3(100) surface (特集 量子ビームによるナノバイオ科学と基盤技術)
- Effect of UV Irradiation on Microlens Arrays Fabricated by Room Temperature Nanoimprinting Using Organic Spin-on-Glass
- In-situ Observation of the Three-Dimensional Nano-Structure Growth on Focused-Ion-Beam Chemical Vapor Deposition by Scanning Electron Microscope
- Evaluation of Vacuum Microcapsule Fabricated using Focused-Ion-Beam Chemical-Vapor-Deposition
- Fabrication of Diamond-Like Carbon Nanosprings by Focused-Ion-Beam Chemical Vapor Deposition and Evaluation of Their Mechanical Characteristics(Micro/Nano Fabrication,Microoptomechatronics)
- Comparison of Young's Modulus Dependency on Beam Accelerating Voltage between Electron-Beam- and Focused Ion-Beam-Induced Chemical Vapor Deposition Pillars
- Nanomechanical Switch formed by Focused-Ion-Beam Chemical Vapor Deposition
- Nozzle-Nanostructure Fabrication on Glass Capillary by Focused-Ion-Beam Chemical Vapor Deposition and Etching
- Characterization of Hard Diamond-Like Carbon Films Formed by Ar Gas Cluster Ion Beam-Assisted Fullerene Deposition
- Relationship between field emission properties and material characteristics of diamond-like carbon fabricated by focused-ion-beam chemical vapor deposition
- Evaluation of Field Electron Emitter Fabricated Using Focused-Ion-Beam Chemical Vapor Deposition
- Structure and Resonant Characteristics of Amorphous Carbon Pillars Grown by Focused-Ion-Beam-Induced Chemical Vapor Deposition
- Direct Etching of Spin-on-Glass Films Exposed Using Synchrotron Radiation
- Self-Developing Properties of an Inorganic Electron Beam Resist and Nanometer-Scale Patterning Using a Scanning Electron Beam
- Electron-Stimulated Desorption and in situ Scanning Electron Microscopy Study on Self-Developing Reaction of High-Resolution Inorganic Electron Beam Resist
- Nanometer-Scale Direct Carbon Mask Fabrication Usirng Electron-Beam-Assisted Deposition
- Optical Thin Film Formation with O_2 Cluster Ion Assisted Deposition
- Ultra-Smooth Surface Preparation Using Gas Cluster Ion Beams
- Photoelectron spectroscopy study of the valence band region in diamond-like carbon thin films
- Photoelectron spectroscopy study of the valence band region in diamond-like carbon thin films
- X-ray photelectron spectroscopy study of diamond-like carbon thin films formed by Ar gas cluster ion beam-assisted fullerene deposition
- X-ray photoelectron spectroscopy study of diamond-like carbon thin films formed by Ar gas cluster ion beam-assisted fullerene deposition
- Surface Modification of Poly(tetrafluoroethylene) by Synchrotron Radiation Exposure under Several Kinds of Gas Atmosphere
- Excitation Energy Dependence for the Li 1s X-ray Photoelectron Spectra of LiMn_2O_4
- Photoexcitation Process Leading to Modification on Poly(tetrafluoroethylene) Surface by Irradiation of Synchrotron Radiation in Soft X-ray Region
- Nanoimprint Mold Repair by Ga^+ Focused-Ion-Beam Direct Etching
- Synchrotron Radiation Effect in the Soft X-ray Region on the Surface Properties of Pyromellitic Dianhydride-Oxydianline Polyimide
- Surface Modification of Fluorocarbon Polymers by Synchrotron Radiation
- Room Temperature Nanoimprint Technology Using Hydrogen Silsequjoxane (HSQ)
- Measurement of Sidewall Roughness by Scanning Tunneling Microscope : Inspection and Testing
- Measurement of Sidewall Roughness by Scanning Tunneling Microscope
- Imprint Characteristics by Photo-Induced Solidification of Liquid Polymer
- Novel Process for Visible Light Emission from Si Prepared by Ion Irradiation
- An Approach for Nanolithography Using Electron Holography
- Proposal of Pseudo Source and Drain MOSFETs for Evaluating 10-nm Gate MOSFETs
- Ten-Nanometer Resolution Nanolithography using Newly Developed 50-kV Electron Beam Direct Writing System : Micro/nanofabrication and Devices
- Ten-Nanometer Resolution Nanolithography using Newly Developed 50-kV Electron Beam Direct Writing System
- Nanolithography Using a Chemically Amplified Negative Resist by Electron Beam Exposure
- Focused Ion Beam Lithography Using Novolak-Based Resist : Techniques, Instrumentations and Measurement
- Fabrication of Y-Cu Liquid Metal Ion Sources : Techniques, Instrumentations and Measurement
- Improvement of neuronal cell adhesiveness on parylene with oxygen plasma treatment(CELL AND TISSUE ENGINEERING)