Fluorine Gas Field Ion Source : Beam Induced Physics and Chemistry

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Room Temperature Nanoimprinting Using Release-Agent Spray-Coated Hydrogen Silsesquioxane
Proximity Effect Correction by Pattern Modified Stencil Mask in Large-Field Projection Electron-Beam Lithography
Recent Progress in Electron-Beam Cell Projection Techology
Nanometer-Scale Patterning of Polystyrene Resists in Low-Voltage Electron Beam Lithography
Calixarene Electron Beam Resist for Nano-Lithography
Resolution-Limit Study of Chain-Structure Negative Resist by Electron Beam Lithography
Fluorine Gas Field Ion Source : Beam Induced Physics and Chemistry
Coulomb Interaction Effect in Cell Projection Lithography
Fabrication of Nanomanipulator with SiO_2/DLC Heterostructure by Focused-Ion-Beam Chemical Vapor Deposition
Brilliant Blue Observation from a Morpho-Butterfly-Scale Quasi-Structure
Sub-10-nm Electron Beam Lithography Using a Poly(α-methylstyrene) Resist with a Molecular Weight of 650
Photoluminescence Studies and Solar-Cell Application of CuInSe_2 Thin Films Prepared using Selenization Techniques
Effect of UV Irradiation on Microlens Arrays Fabricated by Room Temperature Nanoimprinting Using Organic Spin-on-Glass
In-situ Observation of the Three-Dimensional Nano-Structure Growth on Focused-Ion-Beam Chemical Vapor Deposition by Scanning Electron Microscope
Evaluation of Vacuum Microcapsule Fabricated using Focused-Ion-Beam Chemical-Vapor-Deposition
Fabrication of Diamond-Like Carbon Nanosprings by Focused-Ion-Beam Chemical Vapor Deposition and Evaluation of Their Mechanical Characteristics(Micro/Nano Fabrication,Microoptomechatronics)
Comparison of Young's Modulus Dependency on Beam Accelerating Voltage between Electron-Beam- and Focused Ion-Beam-Induced Chemical Vapor Deposition Pillars
Characterization of Hard Diamond-Like Carbon Films Formed by Ar Gas Cluster Ion Beam-Assisted Fullerene Deposition
Evaluation of Field Electron Emitter Fabricated Using Focused-Ion-Beam Chemical Vapor Deposition
Structure and Resonant Characteristics of Amorphous Carbon Pillars Grown by Focused-Ion-Beam-Induced Chemical Vapor Deposition
Direct Etching of Spin-on-Glass Films Exposed Using Synchrotron Radiation
Performance Check of Vegetation Fluorescence Imaging Lidar through In Vivo and Remote Estimation of Chlorophyll Concentration Inside Plant Leaves
Range-resolved Image Detection of Laser-induced Fluorescence of Natural Trees for Vegetation Distribution Monitoring
Self-Developing Properties of an Inorganic Electron Beam Resist and Nanometer-Scale Patterning Using a Scanning Electron Beam
Electron-Stimulated Desorption and in situ Scanning Electron Microscopy Study on Self-Developing Reaction of High-Resolution Inorganic Electron Beam Resist
Nanometer-Scale Direct Carbon Mask Fabrication Usirng Electron-Beam-Assisted Deposition
Optical Thin Film Formation with O_2 Cluster Ion Assisted Deposition
Ultra-Smooth Surface Preparation Using Gas Cluster Ion Beams
Photoelectron spectroscopy study of the valence band region in diamond-like carbon thin films
Excitation Energy Dependence for the Li 1s X-ray Photoelectron Spectra of LiMn_2O_4
Room Temperature Nanoimprint Technology Using Hydrogen Silsequjoxane (HSQ)
Measurement of Sidewall Roughness by Scanning Tunneling Microscope : Inspection and Testing
Measurement of Sidewall Roughness by Scanning Tunneling Microscope
0.25 μm Electron Beam Direct Writing Techniques for 256 Mbit Dynamic Random Access Memory Fabrication
Imprint Characteristics by Photo-Induced Solidification of Liquid Polymer
Novel Process for Visible Light Emission from Si Prepared by Ion Irradiation
0.15 μm Electron Beam Direct Writing for Gbit Dynamic Random Access Memory Fabrication
An Approach for Nanolithography Using Electron Holography
Proposal of Pseudo Source and Drain MOSFETs for Evaluating 10-nm Gate MOSFETs
Improved Registration Accuracy in E-Beam Direct Writing Lithography
Ten-Nanometer Resolution Nanolithography using Newly Developed 50-kV Electron Beam Direct Writing System : Micro/nanofabrication and Devices
Ten-Nanometer Resolution Nanolithography using Newly Developed 50-kV Electron Beam Direct Writing System
Composition and Growth Mechanisms of a Boron Layer Formed Using the Molecular Layer Doping Process
Nanolithography Using a Chemically Amplified Negative Resist by Electron Beam Exposure
Focused Ion Beam Lithography Using Novolak-Based Resist : Techniques, Instrumentations and Measurement
Fabrication of Y-Cu Liquid Metal Ion Sources : Techniques, Instrumentations and Measurement
Improvement of neuronal cell adhesiveness on parylene with oxygen plasma treatment(CELL AND TISSUE ENGINEERING)

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