Kojima Y | Nagoya Univ. Nagoya Jpn

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概要

• KOJIMA Yoshikatsuの詳細を見る
• 同名の論文著者
• Nagoya Univ. Nagoya Jpnの論文著者

関連著者

• Kojima Y

  Nagoya Univ. Nagoya Jpn

• NAKAJIMA Ken

  ULSI Device Development Labs, NEC Corporation

• Manaka Susumu

  Fundamental Research Laboratories Nec Corporation

• Matsui S

  Graduate School Of Science Laboratory Of Advanced Science And Technology For Industry (lasti) Univer

• KOJIMA Yoshikatsu

  ULSI Device Development Laboratories, NEC Corporation

• Kojima Yoshikatsu

  ULSI Device Development Laboratories, NEC Corp.

• HIRASAWA Satomi

  ULSI Device Development Laboratories, NEC Corporation

• OCHIAI Yukinori

  Fundamental Res. Labs., NEC Corporation

• MATSUI Shinji

  Fundamental Res. Labs., NEC Corporation

• Hirasawa S

  Nec Corp. Kanagawa Jpn

• Hirasawa Satomi

  Ulsi Device Development Laboratories Nec Corporation

• Kondoh Kenji

  Ulsi Device Development Laboratories Nec Corp.

• Mukai H

  Hokkaido Univ. Hokkaido Jpn

• Mukai Hiroshi

  Nec Factory Engineering Corporation

• AIZAKI Naoaki

  ULSI Device Development Laboratories, NEC Corporation

• Aizaki N

  Ulsi Device Development Labs. Nec Corporation

• Kojima Yoshikatsu

  Fundamental Research Labs. Nec Corporation

• Tamura Takao

  Ulsi Device Development Laboratories Nec Corp.

• Ishida Shinji

  Ulsi Devices Development Laboratories Nec Corporation

• Ishida S

  Toshiba Microelectronics Corp.

• Aoki K

  Texas Instruments Japan Ltd. Ibaraki Jpn

• Nomura E

  Nec Corp. Ibaraki Jpn

• Nomura Eiichi

  Fundamental Research Labs Nec Corporation

• YAMASHITA Hiroshi

  ULSI Device Development Labs, NEC Corporation

• NOZUE Hiroshi

  ULSI Device Development Laboratories, NEC Corporation

• EMA Takahiro

  ULSI Device Development Laboratories, NEC Corporation

• OCHIAI Yukinori

  Fundmental Research Laboratories, NEC Coroiration

• NOMURA Eiichi

  Fundmental Research Laboratories, NEC Coroiration

• KOJIMA Yoshikatsu

  Fundmental Research Laboratories, NEC Coroiration

• MATSUI Shinji

  Fundmental Research Laboratories, NEC Coroiration

• Ema Takahiro

  Ulsi Device Development Laboratories Nec Corp.

• Nozue H

  Leepl Corp. Kanagawa Jpn

• Nakajima Kensuke

  Research Institute Of Electrical Communication Tohoku University

• Aoki K

  Toshiba Corp. Yokohama Jpn

• Saitoh N

  Osaka Univ. Osaka Jpn

• HIROTA Takao

  ULSI Device Development Laboratories, NEC Corporation

• Hirota Takao

  Ulsi Device Development Laboratories Nec Corporation

• YAMADA Yasuhisa

  ULSI Device Development Laboratories, NEC Corp.

• TOKUNAGA Kenichi

  ULSI Device Development Laboratories, NEC Corp.

• ONODA Naka

  ULSI Device Development Laboratories, NEC Corp.

• Onoda Naka

  Ulsi Device Development Laboratories Nec Corporation

• SAITOH Naoto

  Takatsuka Unit, Seiko Instruments Inc.

• AKAMINE Tadao

  Takatsuka Unit, Seiko Instruments Inc.

• AOKI Kenji

  Takatsuka Unit, Seiko Instruments Inc.

• KOJIMA Yoshikazu

  Takatsuka Unit, Seiko Instruments Inc.

• Yamada Yasuhisa

  Ulsi Device Development Laboratories Nec Corp.

• Tokunaga Kenichi

  Ulsi Device Development Laboratories Nec Corp.

• Akamine Tadao

  Takatsuka Unit Seiko Instruments Inc.

• Yamashita H

  Teikyo Univ. Tokyo Jpn

• Yamashita Hiroshi

  Ulsi Device Development Division Nec Corporation

• Nozue Hiroshi

  ULSI Device Development Laboratories, NEC Corp., 1120 Shimokuzawa, Sagamihara, Kanagawa 229, Japan

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著作論文

• Fluorine Gas Field Ion Source : Beam Induced Physics and Chemistry
• 0.25 μm Electron Beam Direct Writing Techniques for 256 Mbit Dynamic Random Access Memory Fabrication
• 0.15 μm Electron Beam Direct Writing for Gbit Dynamic Random Access Memory Fabrication
• Improved Registration Accuracy in E-Beam Direct Writing Lithography
• Composition and Growth Mechanisms of a Boron Layer Formed Using the Molecular Layer Doping Process
• Focused Ion Beam Lithography Using Novolak-Based Resist : Techniques, Instrumentations and Measurement
• Fabrication of Y-Cu Liquid Metal Ion Sources : Techniques, Instrumentations and Measurement

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