Manaka Susumu | Fundamental Research Laboratories Nec Corporation

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概要

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著作論文

Room Temperature Nanoimprinting Using Release-Agent Spray-Coated Hydrogen Silsesquioxane
Nanometer-Scale Patterning of Polystyrene Resists in Low-Voltage Electron Beam Lithography
Calixarene Electron Beam Resist for Nano-Lithography
Resolution-Limit Study of Chain-Structure Negative Resist by Electron Beam Lithography
Fluorine Gas Field Ion Source : Beam Induced Physics and Chemistry
Fabrication of Nanomanipulator with SiO_2/DLC Heterostructure by Focused-Ion-Beam Chemical Vapor Deposition
Brilliant Blue Observation from a Morpho-Butterfly-Scale Quasi-Structure
Sub-10-nm Electron Beam Lithography Using a Poly(α-methylstyrene) Resist with a Molecular Weight of 650
Photoluminescence Studies and Solar-Cell Application of CuInSe_2 Thin Films Prepared using Selenization Techniques
Effect of UV Irradiation on Microlens Arrays Fabricated by Room Temperature Nanoimprinting Using Organic Spin-on-Glass
In-situ Observation of the Three-Dimensional Nano-Structure Growth on Focused-Ion-Beam Chemical Vapor Deposition by Scanning Electron Microscope
Evaluation of Vacuum Microcapsule Fabricated using Focused-Ion-Beam Chemical-Vapor-Deposition
Fabrication of Diamond-Like Carbon Nanosprings by Focused-Ion-Beam Chemical Vapor Deposition and Evaluation of Their Mechanical Characteristics(Micro/Nano Fabrication,Microoptomechatronics)
Comparison of Young's Modulus Dependency on Beam Accelerating Voltage between Electron-Beam- and Focused Ion-Beam-Induced Chemical Vapor Deposition Pillars
Characterization of Hard Diamond-Like Carbon Films Formed by Ar Gas Cluster Ion Beam-Assisted Fullerene Deposition
Evaluation of Field Electron Emitter Fabricated Using Focused-Ion-Beam Chemical Vapor Deposition
Structure and Resonant Characteristics of Amorphous Carbon Pillars Grown by Focused-Ion-Beam-Induced Chemical Vapor Deposition
Direct Etching of Spin-on-Glass Films Exposed Using Synchrotron Radiation
Self-Developing Properties of an Inorganic Electron Beam Resist and Nanometer-Scale Patterning Using a Scanning Electron Beam
Electron-Stimulated Desorption and in situ Scanning Electron Microscopy Study on Self-Developing Reaction of High-Resolution Inorganic Electron Beam Resist
Nanometer-Scale Direct Carbon Mask Fabrication Usirng Electron-Beam-Assisted Deposition
Optical Thin Film Formation with O_2 Cluster Ion Assisted Deposition
Ultra-Smooth Surface Preparation Using Gas Cluster Ion Beams
Photoelectron spectroscopy study of the valence band region in diamond-like carbon thin films
Excitation Energy Dependence for the Li 1s X-ray Photoelectron Spectra of LiMn_2O_4
Room Temperature Nanoimprint Technology Using Hydrogen Silsequjoxane (HSQ)
Imprint Characteristics by Photo-Induced Solidification of Liquid Polymer
Novel Process for Visible Light Emission from Si Prepared by Ion Irradiation
Proposal of Pseudo Source and Drain MOSFETs for Evaluating 10-nm Gate MOSFETs
Ten-Nanometer Resolution Nanolithography using Newly Developed 50-kV Electron Beam Direct Writing System : Micro/nanofabrication and Devices
Ten-Nanometer Resolution Nanolithography using Newly Developed 50-kV Electron Beam Direct Writing System
Nanolithography Using a Chemically Amplified Negative Resist by Electron Beam Exposure
Focused Ion Beam Lithography Using Novolak-Based Resist : Techniques, Instrumentations and Measurement
Fabrication of Y-Cu Liquid Metal Ion Sources : Techniques, Instrumentations and Measurement
Improvement of neuronal cell adhesiveness on parylene with oxygen plasma treatment(CELL AND TISSUE ENGINEERING)

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