Komuro M | Mirai Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Scienc
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概要
- KOMURO Masanoriの詳細を見る
- 同名の論文著者
- Mirai Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Sciencの論文著者
関連著者
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Komuro M
Mirai Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Scienc
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KOMURO Masanori
Electrotechnical Laboratory
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Hiroshima H
National Inst. Of Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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HIROSHIMA Hiroshi
Electrotechnical Laboratory
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Atoda Nobufumi
Laboratory For Advanced Optical Technology National Institute Of Advanced Industrial Science And Tec
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Atoda N
Sortec Ibaraki Jpn
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Koshida Nobuyoshi
Faculty Of Technology Tokyo University Of Agriculture And Technology
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Koshida Nobuyoshi
Department Of Electrical And Electronic Engineering Faculty Of Technology Tokyo University Of Agricu
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Koshida Nobuyoshi
Division Of Electronic And Information Engineering Faculty Of Technology Tokyo University Of Agricul
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Koshida N
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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KOSHIDA Nobuyoshi
Faculty of Technology, Tokyo University of Agriculture and Technology
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Taniguchi J
Department Of Applied Electronics Tokyo University Of Science
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吉田 起國
京大院エネルギー科学
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吉田 起國
京大原子エネルギー研
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吉田 起國
京大原研
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TANIGUCHI Jun
Department of Applied Electronics, Tokyo University of Science
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宮本 岩男
東京理科大学基礎工学部
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Yamada K
Department Of Physics Tohoku University
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Taniguchi Jun
Department Of Applied Electronics Tokyo University Of Science
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MIYAMOTO Iwao
Department of Applied Electronics, Tokyo University of Science
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Miyamoto Iwao
Department Of Applied Electronics Tokyo University Of Science
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YOSHIDA Kazuyoshi
Faculty of Technology, Tokyo Univer.sity of Agriculture and Technology
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Wada T
Department Of Materials Chemistry Ryukoku University
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Wada Takao
Department Of Electrical And Computer Engineering Nagoya Institute Of Technology
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Atoda Nobufumi
Sortec
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HARAICHI Satoshi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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HARAICHI Satoshi
Electrotechnical Laboratory
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Wada T
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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KOMURO Masanori
Advanced Semiconductor Research Center, AIST
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Wada T
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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WADA Toshimi
Electrotechnical Laboratory
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HIROSHIMA Hiroshi
Advanced Semiconductor Research Center; AIST
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WATANUKI Shinichi
Faculty of Technology, Tokyo Univer.sity of Agriculture and Technology
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Tokano Yuji
Department Of Applied Electronics Tokyo Science University
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Haraichi S
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Watanuki Shinichi
Faculty Of Technology Tokyo University Of Agriculture And Technology
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Wada T
Ryukoku Univ. Otsu Jpn
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Atoda Nobufumi
Electrotechnical Laboratory
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Koshida Nobuyoshi
Department Of Electrical And Electronic Engineering Tokyo University Of Agriculture And Technology
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TOKANO Yuji
Department of Applied Electronics, Tokyo University of Science
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宮本 岩男
東京理科大学基礎工学研究科電子応用工学専攻
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KAWASAKI Takeshi
Department of Physics, Faculty of Science, Tokyo University of Science
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Kobayashi Sota
Silicon Systems Research Laboratories Nec Corporation
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TAGUCHI Takao
SORTEC Corporation
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Sugiyama Y
Jst‐crest Ibaraki Jpn
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Watanabe N
Ntt Photonics Laboratories
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WATANABE Noriyuki
NTT Photonics Laboratories
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OGURA Mutsuo
Electrotechnical Laboratory
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Inoue S
Toshiba Corp. Kawasaki Jpn
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Wachi Hiroshi
Faculty Of Technokogy Tokyo University Of Agriculture And Technology
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Taguchi T
Research Laboratories Nippondenso Co. Ltd.
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Ichimura S
National Inst. Advanced Industrial Sci. And Technol.(aist) Ibaraki Jpn
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Kobayashi S
Science University Of Tokyo In Yamaguchi
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Kobayashi S
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology(aist)
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Inoue Seiji
Mirai Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And T
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SHIMIZU Keizo
Electrotechnical Laboratory
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Sasaki Fumio
Electrotechnical Laboratory
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Kobayashi Shunsuke
Electrotechnical Laboratory
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Kawasaki Takeshi
Department Of Chemistry Faculty Of Science Toho University
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Wachi Hiroshi
星薬科大学 臨床化学教室
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Sugiyama Yasuyuki
Ntt Interdisciplinary Research Laboratories:(present Address) Science And Technology Agency
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TANI Toshiro
Electrotechnical Laboratory, Tsukuba
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Ishii K
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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ICHIMURA Shingo
Electrotechnical Laboratory, Umezono
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Tani Toshiro
Electrochnical Laboratory
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SUGIYAMA Yoshinobu
Electrotechnical Laboratory
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TAGUCHI Takao
ASET Super-fine SR Lithography Laboratory
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Shimizu K
Electrotechnical Laboratory
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Shimizu Keizo
Electrotechnical Labolatory
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Watanabe Norikazu
Electrotechnical Lanoratory
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Kobayashi Shunsuke
Science University Of Tokyo
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Kobayashi Shunsuke
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology(aist)
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KANAYAMA Toshihiko
National Institute for Advanced Interdisciplinatry Research
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Ichimura Shingo
Electrotechnical Laboratory
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Tani T
Toyota Central R&d Labs. Inc.
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Sasaki F
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology
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Manaka Susumu
Fundamental Research Laboratories Nec Corporation
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Ogura M
Jst‐crest Ibaraki Jpn
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Taguchi T
Department Of Electrical And Electronic Engineering Yamaguchi University
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Ogura Masahiko
Energy Technology Research Institute National Institute Of Advanced Industrial Science And Technolog
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Ishii Ken'ichi
Electrotechnical Laboratory
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Watanabe N
Mitsubishi Materials Corp. Omiya Jpn
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Kanayama Toshihiko
National Inst. Of Advanced Industrial Sci. And Technol. Ibaraki Jpn
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WATANABE Noemia
Laboratorio de Quartzo, Departamento de Materiais, Faculdade de Engenharia Mecanica, UNICAMP
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Kawasaki Takeshi
Department Of Applied Electronics Tokyo Science University
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Wachi Hiroshi
Faculty Of Pharmaceutical Sciences Hoshi University
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KAWASAKI TAKESHI
Department of Applied Chemistry, Waseda University
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SAKAI Nobuji
Toyo Gosei Co., Ltd., Photosensitive Materials Research Center
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ISHII Kenichi
Electrotechnical Laboratory
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ISHIDA Masahiko
NEC Fundamental and Environmental Research Laboratories
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OCHIAI Yukinori
NEC Fundamental and Environmental Research Laboratories
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Yoshida K
Nagoya Univ. Nagoya Jpn
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Fujita J
Crest-jst
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Fujita Jun-ichi
Nec Fundamental Research Laboratories
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Tada Kentaro
Toyo Gosei Co. Ltd.
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Ishii Keisuke
Department Of Obstetrics And Gynecology Niigata University Graduate School Of Medical And Dental Sci
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Sakai Nobuji
Toyo Gosei Co. Ltd Chiba Jpn
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Sakai Nobuji
Toyo Gosei Co. Ltd.
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NAMATSU Hideo
NTT Basic Research Laboratories
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INOUE Seiji
Department of Biochemistry, Osaka University of Pharmaceutical Sciences
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MATSUI Shinji
Himeji Institute of Technology, Graduate School of Science, LASTI
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越田 信義
東京農工大 大学院
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Koshida Nobuyoshi
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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Ishida M
Sii Nanotechnology Inc.
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KOGO Yasuo
Department of Material Science and Technology, Faculty of Industrial Science and Technology, Tokyo U
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MISAWA Shunji
Electrotechnical Laboratory
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Ishigaki Hiroyuki
Laboratory Of Advanced Science And Technology Himeji Institute Of Technology
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Ichikawa Masakazu
Joint Research Center For Atom Technology
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Ichikawa Masakazu
Joint Research Center For Atom Technology Angstrom Technology Partnership
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Ichikawa Masakazu
Joint Research Center For Atom Technology Angstrom Technology Partnership (jrcat-atp) C
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Ichikawa Mitsuru
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Kobayashi Shunsuke
Liquid Crystal Institute Science University Of Tokyo In Yamaguchi
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GORWADKAR Sucheta
Electrotechnical Laboratory
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HIRAYAMA Motoki
Tokai University
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MATSUI Shinji
Laboratory of Advanced Science and Technology for Industry, Himeji Institute of Technology
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Kogo Y
Department Of Materials Science And Technology Tokyo University Of Science
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Kogo Yasuo
Department Of Material Science And Engineering Science University Of Tokyo
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Kogo Yasuo
Department Of Material Science And Technology Tokyo University Of Science
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Kishi Yasuo
Functional Materials Research Center Sanyo Electric Co. Ltd.
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Misawa S
Tsukuba Institute For Super Materials Ulvac Japan Ltd.
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Namatsu H
Ntt Basic Res. Lab. Kanagawa Jpn
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IWASA Masayuki
SII Nanotechnology Inc.
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IGAKU Yutaka
Laboratory of Advanced Science and Technology, Himeji Institute of Technology
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ENDO Kinju
Faculty of Technology, Tokyo Univer.sity of Agriculture and Technology
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Tada Kentaro
Toyo Gosei Chiba Jpn
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HASHIMOTO Masahiro
Faculty of Technology, Tokyo University of Agriculture and Technology
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KASAHARA Nobuyuki
Department of Applied Electronics, Tokyo University of Science
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TANIGUCHI Jun
Science University of Tokyo
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INOUE Seiji
Science University of Tokyo
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KIMURA Naoya
Science University of Tokyo
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TOKANO Yuji
Science University of Tokyo
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KOBAYASHI Kazuhiko
CRESTEC
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MIYAZAKI Takeshi
CRESTEC
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OHYI Hideyuki
CRESTEC
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OHNO Naoto
Department of Applied Electronics, Science University of Tokyo
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Endo Kinju
Faculty Of Technology Tokyo Univer.sity Of Agriculture And Technology
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Igaku Yutaka
Laboratory Of Advanced Science And Technology Himeji Institute Of Technology
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Ando Masanobu
Tokyo University Of Agriculture And Technology
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Matsui Shinji
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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OHTAKA Koichi
Tokyo University of Agriculture and Technology
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Kasahara Nobuyuki
Department Of Applied Electronics Tokyo University Of Science
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Matsui Shinji
Laboratory Of Advanced Science And Technology For Industry (lasti) Graduate School Of Science Univer
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Hashimoto Masahiro
Faculty Of Technology Tokyo University Of Agriculture And Technology
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Ohno N
Osaka Electro‐communication Univ. Neyagawa Jpn
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Hashimoto Masahiro
Faculty Of Engineering Tokyo Institute Of Technology
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Inoue Seiji
Department Of Biochemistry Osaka University Of Pharmaceutical Sciences
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Iwasa Masayuki
Sii Nanotechnology Inc. Tokyo Jpn
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Matsui Shinji
Laboratory Of Advanced Science And Technolgy For Industory Himeji Institute Of Technology
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Inoue Seiji
Department of Applied Electronics, Tokyo University of Science
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Kogo Yasuo
Department of Material Science and Technology, Tokyo University of Science
著作論文
- Time-Resolved Observation of Laser-Induced Surface Reaction for Si/Cl_2 System Using Second-Harmonic Generation
- Observation of Etching Reaction for Si/XeF_2 System Using Second-Harmonic Generatiorn
- SiO_2/c-Si Bilayer Electron-Beam Resist Process for Nano-Fabrication
- SiO_2/Poly-Si Multilayered Electron Beam Resist Process for Fabrication of Ultrasmall Tunnel Junctions
- Annealing Behavior of Irradiation-Induced Damagein an AlGaAs/GaAs Heterostructure by Low-Ertergy Electron Beam
- Room Temperature Nanoimprint Technology Using Hydrogen Silsequjoxane (HSQ)
- Effects of Electron Irradiation on Two-Dimensional Electron Gas in AlGaAs/GaAs Heterostructure
- Electrical Properties of Nanometer-Width Refractory Metal Lines Fabricated by Focused Ion Beam and Oxide Resists
- 50-nm Metal Line Fabrication by Focused Ion Beam and Oxide Resists : Focused Ion Beam Process
- 50-nm Metal Line Fabrication by Focused Ion Beam and Oxide Resists
- Focused Ion Beam Fabrication of Fine Metal Structures by Oxide Resists : Beam-Induced Physics and Chemistry
- Focused Ga Ion Beam Etching of Si in Chlorine Gas : Etching and Deposition Technology
- Focused Ga Ion Beam Etching of Si in Chlorine Gas
- Focused Ion Beam Fabrication of Fine Metal Structures by Oxide Resists
- Measurement of Adhesive Force Between Mold and Photocurable Resin in Imprint Technology
- Dual Function of Thin MoO_3 and WO_3 Films as Negative and Positive Resists for Focused Ion Beam Lithography
- Improvement of Imprinted Pattern Uniformity Using Sapphire Mold
- Uniformity in Patterns Imprinted Using Photo-Curable Liquid Polymer
- Imprint Characteristics by Photo-Induced Solidification of Liquid Polymer
- Preparation of Diamond Mold Using Electron Beam Lithography for Application to Nanoimprint Lithography
- Electron Beam Assisted Chemical Etching of Single-Crystal Diamond Substrates with Hydrogen Gas
- Fundamental Characteristic of Capillary-Type Cluster Ion Source and Its Application for Selective Deposition of Aluminum Film : Etching and Deposition Technology
- Fundamental Characteristics of Capillary-Type Cluster Ion Source and Its Application for Selective Deposition of Aluminum Film
- Focused Ion Beam Lithography with Transition Metal Oxide Resists : Lithography Technology
- Characteristics of SiO_2 as a High-Resolution Electron Beam Resist