Focused Ga Ion Beam Etching of Si in Chlorine Gas : Etching and Deposition Technology
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-01-31
著者
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Watanabe N
Ntt Photonics Laboratories
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WATANABE Noriyuki
NTT Photonics Laboratories
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Hiroshima H
National Inst. Of Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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KOMURO Masanori
Electrotechnical Laboratory
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HIROSHIMA Hiroshi
Electrotechnical Laboratory
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Watanabe Norikazu
Electrotechnical Lanoratory
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Komuro M
Mirai Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Scienc
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Watanabe N
Mitsubishi Materials Corp. Omiya Jpn
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WATANABE Noemia
Laboratorio de Quartzo, Departamento de Materiais, Faculdade de Engenharia Mecanica, UNICAMP
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