Fabrication of 40-150nm Gate Length Ultrathin n-MOSFETs Using ELTRAN SOI Wafers
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概要
- 論文の詳細を見る
- 1998-09-07
著者
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ISHII Kenichi
Electrotechnical Laboratory
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SEKIGAWA Toshihiro
Electrotechnical Laboratory
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Hiroshima H
National Inst. Of Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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Ishii Keisuke
Department Of Obstetrics And Gynecology Niigata University Graduate School Of Medical And Dental Sci
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Ishi Keisuke
Department Of Materials Science And Engineering The National Defense Academy
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Maeda T
Advanced Industrial Sci. And Technol. Ibaraki Jpn
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Maeda T
Central Research Laboratory Hitachi Ltd.
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TSUTSUMI Toshiyuki
Electron Devices Division, Electrotechnical Laboratory
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MAEDA Tatsuro
Electron Devices Division, Electrotechnical Laboratory
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SUZUKI Eiichi
Electron Devices Division, Electrotechnical Laboratory
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KANEMARU Seigo
Electrotechnical Laboratory
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Maeda T
Electron Devices Division Electrotechnical Laboratory
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Ishii K
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Kanemaru S
Aist Ibaraki Jpn
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Kanemaru Seigo
Nanoelectronics Research Institute Aist
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Kanemaru Seigo
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Kanemaru Seigo
Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Kanemaru Seigo
Tsukuba Laboratory Yaskawa Electric Co. Ltd.
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Suzuki E
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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NAGAI Kiyoko
Electrotechnical Laboratory
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HIROSHIMA Hiroshi
Electrotechnical Laboratory
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Sekigawa Toshihiro
Electron Devices Division Electrotechnical Laboratory
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Sekigawa Toshihiro
Electroinformatics Group Nanoelectronics Research Institute National Institute Of Advanced Industria
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Nagai Kiyoko
Electrotechnical Lab.
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Honda Keisuke
Department Of Obstetrics And Gynecology Niigata University School Of Medicine
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Sekigawa T
Electron Devices Division Electrotechnical Laboratory
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Tsutsumi Toshiyuki
Electroinformatics Group Nanoelectronics Research Institute National Institute Of Advanced Industria
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Kanemaru Seigo
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Tsutsumi Toshiyuki
National Institute of Advanced Industrial Science and Technology:Meiyi University
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