Fabrication and Characterization of Comb-Shaped Lateral Field-Emitter Arrays
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概要
- 論文の詳細を見る
A new lateral field-emitter array (FEA) has been fabricated and its structural parameters affecting the emission characteristics have been investigated. The present FEA consists of an emitter made of a tungsten thin film (0.20-0.6μm) and a gate electrode self-aligned to the emitter with submicron spacing (0.3-0.7μm). The emitter has an array of rectangular tips with 3-μm-wide edges; the emitter looks like a comb when viewed from above. We have measured the dependence of the emission characteristics on structural parameters such as pitch (p), emitter-to-gate spacing (g) and emitter thickness (t). It was found from experimental results that the characteristics were strongly dependent on the above parameters, especially on the p/w ratio (w is the edge width; 3μm). An emission current of 2μA/tip was obtained at a gate voltage of 110 V with FEA of p/w=3.3, g=0.3μm and t=0.2μm. In this paper, the fabrication process and emission characteristics including stability are described in detail.
- 社団法人応用物理学会の論文
- 1993-03-15
著者
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Itoh Satoru
Department Of Applied Physics Hokkaido University
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Itoh S
Futaba Corp. Chiba Jpn
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Watanabe Teruo
Futaba Corporation
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Watanabe T
Components Development Group Sony Corporation
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Watanabe T
Ritsumeikan Univ. Shiga Jpn
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Watanabe Tetsu
Components Development Group Sony Corporation
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Watanabe T
Tokyo Inst. Technol. Kanagawa Jpn
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Watanabe T
Reserch And Development Division Toto Ltd.
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ITOH Junji
Electrotechnical Laboratory
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KANEMARU Seigo
Electrotechnical Laboratory
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Watanabe T
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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Watanabe T
Tohoku Univ. Sendai Jpn
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Watanabe Toshihide
Atr Adaptive Communications Research Laboratories:(present Address)science And Technical Research La
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Kanemaru S
Aist Ibaraki Jpn
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Kanemaru Seigo
Nanoelectronics Research Institute Aist
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Kanemaru Seigo
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Kanemaru Seigo
Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Kanemaru Seigo
Tsukuba Laboratory Yaskawa Electric Co. Ltd.
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Itoh J
Aist Ibaraki Jpn
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Itoh J
Nanoelectronics Research Institute Aist
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Itoh Junji
Tsukuba Laboratory Yaskawa Electric Co. Ltd.
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Itoh S
Kyushu Univ. Kasuga Jpn
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Itoh Shigeo
Futaba Corporation
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TSUBURAYA Kazuhiko
FUTABA Corporation
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