Kanemaru Seigo | Nanoelectronics Research Institute Aist
スポンサーリンク
概要
関連著者
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Kanemaru Seigo
Nanoelectronics Research Institute Aist
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Kanemaru Seigo
Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Kanemaru S
Aist Ibaraki Jpn
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Kanemaru Seigo
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Kanemaru Seigo
Tsukuba Laboratory Yaskawa Electric Co. Ltd.
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Itoh J
Nanoelectronics Research Institute Aist
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Itoh Junji
Tsukuba Laboratory Yaskawa Electric Co. Ltd.
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Kanemaru Seigo
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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KANEMARU Seigo
Electrotechnical Laboratory
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Itoh J
Aist Ibaraki Jpn
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ITOH Junji
Electrotechnical Laboratory
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Itoh Junji
Nanoelectronics Research Institute Aist
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MATSUKAWA Takashi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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Ishii K
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Suzuki E
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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NICOLAESCU Dan
Nanoelectronics Research Institute, AIST
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GAMO Hidenori
Technical Research Institute, Toppan Printing Co., Ltd.
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Matsukawa Takashi
Nanoelectronics Research Institute Aist
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Gamo Hidenori
Technical Research Institute Toppan Printing Co. Ltd.
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MASAHARA Meishoku
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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Hirano Tomohisa
Department Of Electrical Engineering Faculty Of Engineering Ehime University
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Filip Valeriu
Universiiy Of Buchareg Faculty Of Physics
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Maeda T
Advanced Industrial Sci. And Technol. Ibaraki Jpn
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MATSUKAWA Takashi
National Institute of Advanced Industrial Science and Technology
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TANOUE Hisao
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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Masahara Meishoku
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Liu Yongxun
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Hirano T
Shizuoka Univ. Shizuoka Jpn
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Tanoue Hisao
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Hirano T
Toppan Printing Co. Ltd.
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Matsukawa T
National Institute Of Advanced Industrial Science And Technology
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Nagao Masayoshi
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Filip V
Univ. Bucharest Bucharest‐magurele Rom
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Filip Lucian
University Of Bucharest Faculty Of Physics
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Hiroshima H
National Inst. Of Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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Ishii Keisuke
Department Of Obstetrics And Gynecology Niigata University Graduate School Of Medical And Dental Sci
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Ishi Keisuke
Department Of Materials Science And Engineering The National Defense Academy
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ISHII Kenichi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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SUZUKI Eiichi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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FURUKAWA Seijiro
Graduate School of Science and Engineering, Tokyo Institute of technology
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ISHIWARA Hiroshi
Graduate School of Science
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KANEMARU Seigo
Graduate School of Science and Engineering, Tokyo Institute of Technology
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MATSUKAWA Takashi
Electrotechnical Laboratory
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LIU Yongxun
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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NAGAO Masayoshi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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HIROSHIMA Hiroshi
Electrotechnical Laboratory
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Ishiwara Hiroshi
Tokyo Institute Of Technology Interdisciplinary Graduate School Of Science And Engineering
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Ishiwara Hiroshi
Precision & Intelligence Laboratory Tokyo Institute Of Technology
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Suzuki Eiichi
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Ishiwara H
Tokyo Institute Of Technology Interdisciplinary Graduate School Of Science And Engineering
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Tanoue H
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Tanoue H
National Institute Of Advanced Industrial Science And Technology (aist)
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Tanoue Hisao
Electrotechnical Laboratory
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Honda Keisuke
Department Of Obstetrics And Gynecology Niigata University School Of Medicine
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Nagao M
National Institute For Materials Science
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FURUKAWA Seigo
Department of Electronics, Nippondenso Technical College
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Furukawa S
Kyushu Inst. Technology Fukuoka Jpn
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GAMO Hidenori
Electronics Research Laboratory, Toppan Printing Co., Ltd.
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TSUBURAYA Kazuhiko
FUTABA Corporation
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Nicolaescu D.
Nanoelectronics Research Institute Aist
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Furukawa Seijiro
Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Ishii Kenichi
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology (aist)
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Suzuki Eiichi
Nanoelectronics Research Institute (NeRI), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Tsutsumi Toshiyuki
National Institute of Advanced Industrial Science and Technology:Meiyi University
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Ishii Kenichi
Nanoelectronics Research Institute (NeRI), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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ASANO Tanemasa
Graduate School of Information Science and Electrical Engineering, Kyushu University
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ISHII Kenichi
Electrotechnical Laboratory
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SEKIGAWA Toshihiro
Electrotechnical Laboratory
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Asano Tanemasa
Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Itoh Satoru
Department Of Applied Physics Hokkaido University
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Itoh S
Futaba Corp. Chiba Jpn
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Watanabe Teruo
Futaba Corporation
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Watanabe T
Components Development Group Sony Corporation
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Watanabe T
Ritsumeikan Univ. Shiga Jpn
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Watanabe Tetsu
Components Development Group Sony Corporation
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SAKAMOTO Kunihiro
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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Maeda T
Central Research Laboratory Hitachi Ltd.
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TSUTSUMI Toshiyuki
Electron Devices Division, Electrotechnical Laboratory
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MAEDA Tatsuro
Electron Devices Division, Electrotechnical Laboratory
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SUZUKI Eiichi
Electron Devices Division, Electrotechnical Laboratory
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YOKOYAMA Hiroshi
Electrotechnical Laboratory
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Fujii Hideo
Core Research For Evolutional Science And Technology Program (crest) Japan Science And Technology Co
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Watanabe T
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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Watanabe Toshihide
Atr Adaptive Communications Research Laboratories:(present Address)science And Technical Research La
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Maeda T
Electron Devices Division Electrotechnical Laboratory
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KANEMARU Seigo
National Institute of Advanced Industrial Science and Technology
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NAGAI Kiyoko
Electrotechnical Laboratory
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TANOUE Hisao
National Institute of Advanced Industrial Science and Technology (AIST)
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Ishiwara Hiroshi
Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Sakamoto Kunihiro
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Matsukawa Takashi
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Sekigawa Toshihiro
Electron Devices Division Electrotechnical Laboratory
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Sekigawa Toshihiro
Electroinformatics Group Nanoelectronics Research Institute National Institute Of Advanced Industria
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Hosokawa Shinichi
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Asano Tanemasa
Graduate School Of Information Science And Electrical Engineering Kyushu University
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Itoh S
Kyushu Univ. Kasuga Jpn
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Nagai Kiyoko
Electrotechnical Lab.
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Nagao M
Laboratory Of Biosignals And Response Department Of Applied Molecular Biology Kyoto University
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HIRANO Takayuki
Kobe Steel Ltd.
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HIRANO Takayuki
Electrotechnical Laboratory
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Sekigawa T
Electron Devices Division Electrotechnical Laboratory
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Yokoyama H
Ntt Corp. Kanagawa Jpn
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Itoh Shigeo
Futaba Corporation
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Uemura Kamon
Sony Corporation
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Tsutsumi Toshiyuki
Electroinformatics Group Nanoelectronics Research Institute National Institute Of Advanced Industria
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Yoshida Tomoya
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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YAMAOKA Yoshikazu
Microelectronics Research Center, Sanyo Electric Co., Ltd.
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Nagao Masayoshi
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Yamaoka Yoshikazu
Microelectronics Research Center Sanyo Electric Co. Ltd.
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Matsukawa Takashi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Nagao Masayoshi
Nanoelectronics Research Institute, AIST, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Kanemaru Seigo
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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TANII Takashi
School of Science and Engineering, Waseda University
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OHDOMARI Iwao
School of Science and Engineering, Waseda University
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Ohdomari Iwao
School Of Science And Engineering Waseda University
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Tanii Takashi
School Of Science And Engineering Waseda University
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Aoki Toru
Shizuoka Univ. Hamamatsu Jpn
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Lee Hee
Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Lee Hee
Department Of Eecs Korea Advanced Institute Of Science And Technology
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Lee Hee
Department Of Electrical Engineering And Computer Science Kaist
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Neo Yoichiro
Shizuoka Univ. Hamamatsu Jpn
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Neo Yoichiro
Research Institute Of Electronics Shizuoka University
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Inoue T
Tohoku Univ. Sendai Jpn
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Inoue T
Advanced Discrete Semiconductor Technology Laboratory Corporated Research And Development Center Tos
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Inoue Tatsuya
Materials And Components Research Laboratory Components And Devices Research Center Matsushita Elect
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Inoue Tetsushi
Research Laboratory Of Resources Utilization Tokyo Institute Of Technology
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Watanabe T
Tokyo Inst. Technol. Kanagawa Jpn
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YAMAUCHI Hiromi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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ISHII Kenichi
National Institute of Advanced Industrial Science and Technology
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SUZUKI Eiichi
National Institute of Advanced Industrial Science and Technology
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Watanabe T
Reserch And Development Division Toto Ltd.
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SASAMORI Kenichiro
Institute for Materials Research, Tohoku University
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Yamauchi Hiromi
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Inoue Takahito
Electrotechnical Laboratory
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NAZUKA Yutaro
Electrotechnical Laboratory
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SHIMIZU Keizo
Electrotechnical Laboratory
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Shimizu K
Department Of Physical Electronics Tokyo Institute Of Technology
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Watanabe T
Tohoku Univ. Sendai Jpn
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NAGAO Masayoshi
National Institute of Advanced Industrial Science and Technology
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HOSOKAWA Shinichi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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TSUTSUMI Toshiyuki
National Institute of Advanced Industrial Science and Technology
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HIROSHIMA Hiroshi
National Institute of Advanced Industrial Science and Technology
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TOMIZAWA Kazutaka
Meiyi University
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Shimizu K
Electrotechnical Laboratory
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Shimizu Keizo
Electrotechnical Lanoratory
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Shimizu Keizo
Electrotechnical Labolatory
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Nazuka Yutaro
Electrotechnical Laboratory:faculty Of Engineering Tokai University
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Nakao Masao
Microelectronics Research Center Sanyo Electric Co. Ltd.
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Yamauchi Hiroshi
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Murata Yoko
Nagase Chemtex Corporation
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Shimizu K
Univ. Tokyo Chiba Jpn
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Kotani Takeshi
Nagase Chemtex Corporation
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OZAWA Ken
Department of Electrical and Electronic Engineering, Faculty of Engineering, Musashi Institute of Te
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EHARA Keigo
Toyokohan Co., Ltd.
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ITOH Junji
National Institute of Advanced Industrial Science and Technology
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NAGAO Masayoshi
Electrotechnical Laboratory
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TANABE Hisao
Dai Nippon Printing Co., Ltd.
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FUJII Hideo
Electrotechnical Laboratory
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FUJII Hideo
Kobe Steel Ltd.
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Tanabe Hisao
Dai Nippon Printing Co. Ltd.
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Hagiwara Kei
Nhk Sci. And Technol. Res. Lab. Tokyo Jpn
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Nicolaescu Dan
National Institute of Advanced Industrial Science & Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibara
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Filip Valeriu
Faculty of Physics, University of Bucharest, P. O. Box MG-11, Bucharest-Magurele 76900, Romania
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KAI Teruhiko
Technical Research Institute, Toppan Printing Co., Ltd.
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UEMURA Koji
Electrotechnical Laboratory
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UEMURA Koji
Tsukuba Laboratory, Yaskawa Electric Co., Ltd.
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YAMAOKA Yoshikazu
Electrotechnical Laboratory
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Yoshida Tomoya
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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Ozawa Ken
Department Of Electrical And Electronic Engineering Faculty Of Engineering Musashi Institute Of Tech
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Inoue T
Applied Laser Engineering Research Institute
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Ehara Keigo
Toyokohan Co. Ltd.
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GOTO Takashi
Microelectronics Research Center, Sanyo Electric Co., Ltd.
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ISHIZAKI Mamoru
Toppan Printing Co., Ltd.,
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GAMO Hidenori
Toppan Printing Co., Ltd.,
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USHIKI Kazunari
Electrotechnical Laboratory
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TSUBURAYA Kazuhiko
Electrotechnical Laboratory
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Ishizaki Mamoru
Toppan Printing Co. Ltd.
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Kai Teruhiko
Technical Research Institute Toppan Printing Co. Ltd.
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Goto Takashi
Microelectronics Research Center Sanyo Electric Co. Ltd.
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Sasamori Kenichiro
Institute For Materials Research Tohoku University
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Yamauchi Hiromi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Masahara Meishoku
Nanoelectronics Research Institute, AIST, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Masahara Meishoku
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Masahara Meishoku
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Sakamoto Kunihiro
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Sakamoto Kunihiro
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Liu Yongxun
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Liu Yongxun
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Matsukawa Takashi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Nagao Masayoshi
National Institute of Advanced Industrial Science & Technology (AIST)
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Itoh Junji
National Institute of Advanced Industrial Science & Technology (AIST)
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Hosokawa Shinichi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Itoh Junji
Nanoelectronics Research Institute, AIST, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Sato Takanobu
Institute of Appied Physics, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8573, Japan
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Ishii Kenichi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Ishii Kenichi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Tanoue Hisao
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Tanii Takashi
School of Science and Engineering, Waseda University, 3-4-1 Ohkubo, Shinjuku, Tokyo 169-8555, Japan
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Filip Valeriu
Faculty of Physics, University of Bucharest
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Kanemaru Seigo
Nanoelectronics Research Institute, AIST, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
著作論文
- Emission and focusing characteristics of volcano-structured double-gated field emitter arrays
- Nanoscale Evaluation of Structure and Surface Potential of Gated Field Emitters by Scanning Maxwell-Stress Microscope
- Growth and Characterization of Compositionally Graded (Ca, Sr)F_2 Layers on Si(111) Substrates
- Control of Crystal Orientations in Lattice-Mismatched SrF_2 and (Ca, Sr)F_2 Films on Si Substrates by Intermediate CaF_2 Films
- Fabrication of ultrathin Si Channel Wall For Vertical Double-Gate Metal-Oxide-Semiconductor Field-Effect Transistor (DG MOSFET) by Using Ion-Bombardment-Retarded Etching (IBRE)
- P-Channel Vertical Double-Gate MOSFET Fabricated by Utilizing Ion-Bombardment-Retarded Etching Processs
- Novel Process for Vertical Double-Gate (DG) Metal-Oxide-Semiconductor Field-Effect-Transistor (MOSFET) Fabrication
- Close Observation of the Geometrical Features of an Ultranarrow Silicon Nanowire Device
- Fabrication of 40-150 nm Gate Length Ultrathin n-MOSFETs Using Epitaxial Layer Transfer SOI Wafers
- Fabrication of 40-150nm Gate Length Ultrathin n-MOSFETs Using ELTRAN SOI Wafers
- Fabrication of Metal-Oxide-Semiconductor Field-Effect-Transistor-Structured Silicon Field Emitters with a Polysilicon Dual Gate
- Fabrication of a New Si Field Emitter Tip with Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) Structure
- A New Metal-Oxide-Semiconductor Field-Effect-Transistor-Structured Si Field Emitter Tip
- Emission Characteristics of Ion-Implanted Silicon Emitter Tips
- Programmable Conductivity of Silicon Nanowires with Side Gates by Surface Charging
- Mechanism of Tungsten Plug Corrosion during Chemical Stripping Process : Scanning Maxwell-Stress Microscopy and Electrochemical Potentiometry Studies
- CHF_3 Plasma Treatment of Si Field Emitter Arrays For No Damage Vacuum Packaging
- Electrical Characteristics of Air-Bridge-Structured Silicon Nanowire Fabricated by Micromachining a Silicon-on-Insulator Substrate
- Fabrication of a Nanometer-Scale Si-Wire by Micromachining of a Silicon-on-Insulator Substrate
- General Analytical Relationship for Electric Field of Gated Field Emitters
- Oscillator Ionization Vacuum Gauge with Field Emitters
- Dual-Gate Electron Emission Structure with Nanotube-on-Emitter for X-Ray Generation
- Emission Characteristics of Amorphous Silicon Field Emitter Arrays Sealed in a Vacuum Package
- Fabrication of a New Field Emitter Array with a Built-in Thin-Film Transistor on Glass
- Fabrication of a Three-Dimensional Vacuum Magnetic Sensor with a Si Tip
- Fabrication of Si Field Emitter Tip for a Three-Dimensional Vacuum Magnetic Sensor
- Fabrication of Silicon Field Emitter Arrays Integrated with Beam Focusing Lens
- Fabrication of Field Emitter Arrays with Hydrogenated Amorphous Silicon on Glass
- Development of Thin-Film Bending Technique Induced by Ion-Beam Irradiation
- Emission Statistics for HfC Emitter Arrays after Residual Gas Exposure
- Modeling of Focused Carbon Nanotube Array Emitters for Field-Emission Displays
- Modeling of Optimized Field Emission Nanotriodes with Aligned Carbon Nanotubes of Variable Heights
- Fabrication and Characterization of Comb-Shaped Lateral Field-Emitter Arrays
- A Novel Electron-Beam Exposure Epitaxy for Growing GaAs Films on Fluoride/Si Structures
- Low-Operation-Voltage Comb-Shaped Field Emitter Array
- Fabrication of Silicon Field Emitter Arrays with 0.1-μm-Diameter Gate by Focused Ion Beam Lithography
- Fabrication of Petal-Shaped Vertical Field Emitter Arrays
- Fabrication and Characterization of Cross-Edge-Structured Vertical Field Emitter Arrays
- Vacuum Microtriode with Comb-Shaped Lateral Field-Emitter Array
- Fabrication of ultrathin Si Channel Wall For Vertical Double-Gate Metal-Oxide-Semiconductor Field-Effect Transistor (DG MOSFET) by Using Ion-Bombardment-Retarded Etching (IBRE)
- Novel Process for Vertical Double-Gate (DG) Metal-Oxide-Semiconductor Field-Effect-Transistor (MOSFET) Fabrication
- P-Channel Vertical Double-Gate MOSFET Fabricated by Utilizing Ion-Bombardment-Retarded Etching Processs
- Programmable Conductivity of Silicon Nanowires with Side Gates by Surface Charging