Sekigawa Toshihiro | Electroinformatics Group Nanoelectronics Research Institute National Institute Of Advanced Industria

スポンサーリンク

概要

関連著者

もっと見る

著作論文

Experimental Fabrication of XMOS Transistors Using Lateral Solid-Phase Epitaxy of CVD Silicon Films
Effects of Film Quality of Hydrogenated Amorphous Silicon Grown by Thermal Chemical-Vapor-Deposition on Subsequent in-situ Hydrogenation Processes
FinFET-Based Flex-Vth SRAM Design for Drastic Standby-Leakage-Current Reduction
Fabrication of 40-150 nm Gate Length Ultrathin n-MOSFETs Using Epitaxial Layer Transfer SOI Wafers
Fabrication of 40-150nm Gate Length Ultrathin n-MOSFETs Using ELTRAN SOI Wafers
Improvement of SiO_2/4H-SiC Interface Using High-Temperature Hydrogen Annealing at Low Pressure and Vacuum Annealing
Improvement of SiO2/4H-SiC Interface by Using High Temperature Hydrogen Annealing at 1000℃
Optimization of the Body Bias Voltage Set (BBVS) for Flex Power FPGA(Reconfigurable Device and Design Tools,Reconfigurable Systems)
Preliminary Evaluation of Flex Power FPGA : A Power Reconfigurable Architecture with Fine Granularity(Recornfigurable Systems)(Reconfigurable Systems)
Elongated shaped Si Island Formation on 3C-SiC by Chemical Vapor Deposition and Its Application to Antiphase Domain Observation
Atomically Flat 3C-SiC Epilayers by Low Pressure Chemical Vapor Deposition
Characteristics of Three-μm-Thick Silicon Solar Cells Using Bonded Silicon-on-Insulator Wafer
Surface Passivation of Thin Silicon Solar Cells Using Silicon-on-Insulator Wafer
High-Frequency Precise Characterization of Intrinsic FinFET Channel
A 0.7-V Opamp in Scaled Low-Standby-Power FinFET Technology

もっと見る

スポンサーリンク