Fukuda Kuniya | Department Of Engineering Physics Faculty Of Engineering Kyoto University

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著作論文

Preparation of Polycrystalline Silicon by Hydrogen-Radical-Enhanced Chemical Vapor Deposition
The Role of Hydrogen Radicals in the Growth of a-Si and Related Alloys
Improvement of SiO_2/4H-SiC Interface Using High-Temperature Hydrogen Annealing at Low Pressure and Vacuum Annealing
Improvement of SiO2/4H-SiC Interface by Using High Temperature Hydrogen Annealing at 1000℃
Microwave Characteristics of TiO_2-Bi_2O_3 Dielectric Resonator
Influence of Rare Earth Ions on BaO-TiO_2-Rare Earth Oxide Ceramics for Microwave Applications
Stress-Induced Level Shift of a Hydrogen-Carbon Complex in Silicon : Semiconductors
Isotope Effects on the Dissociation of a Hydrogen-Carbon Complex in Silicon
Relationship between Water Diffusivity of Dielectric Films and Accelerated Hot Carrier Degradation Caused by Water
Water Diffusivity of Dielectric Films Evaluated with Use of D_2O
Measurement of Oscillator Strengths for Three Lines among the 4s4p ^3P-4p^2 ^3P Multiplet of Zn I
Line Broadening Measurement in High Density Plasma : I. H_α and H_β
Application of Dye Laser to the Hook Method on the Population Measurement of Excited He and Ne Atoms in the Pulsed Discharge
New Oscillatory Structures of Ne_2 and Ar_2 Emission Continua in the Vacuum Ultraviolet
Measurements of Oscillator Strengths for the Transitions from the Metastable ^3P Levels of Alkaline-Earth Atoms.II.Magnesium
Absorption and Dispersion Studies of the 4_s4_p ^3P-4p^2^3P Multiplet of Zn.I
Collisional Excitation Transfer and Radiative Decay of Ne 2p Levels in Capillary Discharge
Collisional Excitation Transfer between 2p Levels of Ne in Capillary Discharge
Formation of He_2 Molecule in the Afterglow of Pulsed Discharge
Extreme Ultraviolet Spectra of Emission from Plasma Focus. : II. ArXI to ArXV Ion Lines from 130 to 230Å

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