Kamiura Y | Graduate School Of Natural Science And Technology Okayama University
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概要
- Kamiura Yoichiの詳細を見る
- 同名の論文著者
- Graduate School Of Natural Science And Technology Okayama Universityの論文著者
関連著者
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Kamiura Y
Graduate School Of Natural Science And Technology Okayama University
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YAMASHITA Yoshio
SORTEC Corporation
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Yamaguchi Yoh-ichi
Hoya Corporation
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Yamashita Y
Graduate School Of Natural Science And Technology Okayama University
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KAMIURA Yoichi
Faculty of Engineering, Okayama University
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HATTORI Takeshi
Department of Applied Physics, Tokyo University of Science
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Hattori Tetsuya
Depaetment Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Yamashita Y
Power Supply Materials And Devices Laboratory Corporate R&d Center Toshiba Corporation
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KAMIURA Yoichi
School of Engineering, Okayama University
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MITSUISHI Akiyoshi
Department of Applied Physics,Osaka University
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Kamiura Yoichi
School Of Engineering Okayama University
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Kamiura Yoichi
Faculty Of Engineering Okayama University
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Mitsuishi A
Department Of Applied Physics Osaka University
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Hattori Takeshi
Department Of Applied Physics Faculty Of Science Science University Of Tokyo:(present)the Institute
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YAMASHITA Yoshifumi
Faculty of Engineering, Okayama University
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Mitsuishi Akiyoshi
Department Of Applied Physics Faculty Of Engineering Osaka University
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Oda Toshiatsu
Department Of Applied Physics Faculty Of Engineering Hiroshima University
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Oda Toshiatsu
Department Of Applied Physics And Chemistry Faculty Of Engineering Hiroshima University
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TAKIYAMA Ken
Department of Applied Physics and Chemistry, Faculty of Engineering, Hiroshima University
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Takiyama Ken
Department Of Applied Physics And Chemistry Faculty Of Engineering Hiroshima University
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Ishiyama Toshihiko
Ntt Integrated Information & Energy Systems Laboratories
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Ishiyama T
Ntt Telecommunications Energy Lab. Tokyo Jpn
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Yamashita Yoshifumi
Faculty Of Engineering Okayama University
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Tanaka Tsuyoshi
Department of Earth and Environmental Sciences, Nagoya University
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Hashimoto F
Faculty Of Engineering Okayama University
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FUJITA Toshiaki
Department of Physics, Division of Material Science, Nagoya University
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FUJII Eiji
Industrial Technology Center of Okayama Prefecture
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Tanaka T
Department Of Electric And Electronic Engineering Toyohashi University Of Technology
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Fukuda K
Electrotechnical Lab. Ibaraki Jpn
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KAWASAKI Ken
Physics Department, Faculty of Education, Okayama University
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Yoshida M
Functional Materials Research Laboratories Nec Corporation
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Takiyama K
Department Of Applied Physics And Chemistry Faculty Of Engineering Hiroshima University
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Fujita Toshiaki
Department Of Applied Physics And Chemistry Faculty Of Engineering Hiroshima University
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Yoshida M
Yoshida Semiconductor Lab. Fukuoka Jpn
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Hashimoto Fumio
Department Of Orthodontics Graduate School Of Biomedical Sciences Nagasaki University
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Hashimoto Fumio
Laboratory Of Ornamental Horticulture Kagoshima University
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Hashimoto Fumio
School Of Engineering Okayama University
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YONEYAMA Shin-ichiro
School of Engineering, Okayama University
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YOSHIDA Masayuki
Yoshida Semiconductor Laboralory
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TAKAHASHI Manabu
Fukuoka Institute of Technology
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TSURUNO Reiji
Kyushu Institute of Design
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YOSHIDA Masayuki
Kyushu Institute of Design
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Tomokage H
Fukuoka Univ. Fukuoka Jpn
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Tomokage Hajime
Department Of Electronics Fukuoka University
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Tomokage Hajime
Department Of Electronics Faculty Of Engineering Fukuoka University
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Tanaka Tsuyoshi
Department Of Bioresources Chemistry Faculty Of Agriculture Okayama University
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Tsuruno Reiji
Department Of Visual Communication Design Kyushu Institute Of Design
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Yoshida Masayoshi
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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Hashimoto Fumio
School Of Engineering Okayam University
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Yoshida M
National Institute Of Advanced Industrial And Science Technology (aist)
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Takahashi M
Semiconductor Leading Edge Technologies Inc
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Fujii Eiji
First Department Of Oral And Maxillofacial Surgery Faculty Of Dentistry Tokyo Medical And Dental Uni
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Fujii Eiji
Research Laboratories Ii Tamanoi Vinegar Co. Ltd.
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Kawasaki Ken
Physics Department Faculty Of Education Okayama University
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Fukuda Kuniya
Department Of Engineering Physics Faculty Of Engineering Kyoto University
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YAMASHITA Yoshifumi
Graduate School of Natural Science and Technology, Okayama University
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KAMIURA Yoichi
Graduate School of Natural Science and Technology, Okayama University
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ISHIYAMA Takeshi
Graduate School of Natural Science and Technology, Okayama University
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ISHIYAMA Takeshi
Faculty of Engineering, Okayama University
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FUKUDA Kazuhisa
Faculty of Engineering, Okayama University
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OHYAMA Shigeki
Faculty of Engineering, Okayama University
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Ohyama Shigeki
Faculty Of Engineering Okayama University:(present Address)matsushita-kotobuki Electronics Industrie
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YONEYAMA Shimao
MC Electronics Co. Ltd.
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Yashiro M
Univ. Tokyo Tokyo
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Kurata T
Mitsubishi Electric Corp. Hyogo Jpn
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KURATA Tetsuyuki
Department of Applied Physics, Osaka University
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FUJII Eiji
Department of Applied Physics, Osaka University
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Takahashi Minoru
Ceramic Engineering Research Laboratory Nagoya Institute Of Technology
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HASHIMOTO Fumio
School of Engineering , Okayama University
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Sakai Hiroto
Department Of Quantum Engineering Nagoya University
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MUKAI Takashi
Nitride Semiconductor Research Laboratory, Nichia Corporation
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Takahashi Masayoshi
Nitride Semiconductor Research Laboratory Nichia Corporation
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Mukai Takashi
Nitride Semiconductor Research Laboratory Nichia Corporation
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KAMIURA Yoshitomo
College of Integrated Arts and Sciences, University of Osaka Prefecture
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MIYOSHI Kozo
Department of Applied Physics, Faculty of Engineering, Hiroshima University
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MISE Kimihiro
Department of Applied Physics, Faculty of Engineering, Hiroshima University
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FURUKANE Utaro
Faculty of Engineering, Hiroshima Denki-Institute of Technology
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KAMIURA Yoshitomo
Department of Applied Physics and Chemistry, Faculty of Engineering, Hiroshima University
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SAKAI Hisashi
Department of Electrical Engineering, Hiroshima-Denki Institute of Technology
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FUKUOKA Noboru
Department of Physics, Faculty of Science, Naruto University of Education
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Miyoshi Kozo
Department Of Applied Physics Faculty Of Engineering Hiroshima University
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Kamiura Yoshitomo
College Of Integrated Arts And Sciences University Of Osaka Prefecture
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Kawasaki K
Tokyo Inst. Technol. Yokohama Jpn
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Furukane U
Hiroshima Denki Inst. Technol. Hiroshima Jpn
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Furukane Utaro
Faculty Of Engineering Hiroshima Denki Institute Of Technology
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SUGIYAMA Hazime
School of Engineering, Okayama University
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TOMOKAGE Hajime
Department of Electronics, Fukuoka University
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TOMOKAGE Hajime
Depratment of Electronics, Fukuoka University
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Tomokage Hajime
Department Of Electrical Engineering Faculty Of Engineering Kyushu University
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Kawasaki Koji
Interdisciplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Yamano Koji
Sanyo Erectric Co. Ltd.
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Mise Kimihiro
Department Of Applied Physics Faculty Of Engineering Hiroshima University
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Fukuoka Noboru
Department Of Physics College Of General Education Osaka University
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Fukuoka Noboru
Department Of Physics College Of General Education Osaka Univ.
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SAKAMOTO Yoshifumi
Graduate School of Natural Science and Technology, Okayama University
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BAO Namula
Graduate School of Natural Science and Technology, Okayama University
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KAMIURA Yoichi
Division of Industrial Innovation Sciences, The Graduate School of Natural Science and Technology, O
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KANESHIRO Masahiro
Division of Industrial Innovation Sciences, The Graduate School of Natural Science and Technology, O
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TAMURA Jin
Division of Industrial Innovation Sciences, The Graduate School of Natural Science and Technology, O
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ISHIYAMA Takeshi
Division of Industrial Innovation Sciences, The Graduate School of Natural Science and Technology, O
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YAMASHITA Yoshifumi
Division of Industrial Innovation Sciences, The Graduate School of Natural Science and Technology, O
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MITANI Tomotsugu
Nitride Semiconductor Research Laboratory, Nichia Corporation
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HIRAMATSU Toshinobu
Faculty of Engineering, Okayama University
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HAYASHI Masao
Faculty of Engineering, Okayama University
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NISHIYAMA Yoshihide
Faculty of Engineering, Okayama University
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Tamura Jin
Division Of Industrial Innovation Sciences The Graduate School Of Natural Science And Technology Oka
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Kaneshiro Masahiro
Division Of Industrial Innovation Sciences The Graduate School Of Natural Science And Technology Oka
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Mitani Tomotsugu
Nitride Semiconductor Research Laboratory Nichia Corporation
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Bao Namula
Graduate School Of Natural Science And Technology Okayama University
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USUI Tatehito
Department of Applied Physics and Chemistry, Faculty of Engineering, Hiroshima University
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KAMIURA Yositomo
Department of Applied Physics and Chemistry, Faculty of Engineering, Hiroshima University
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MITSUISHI Akiyoshi
School of Engineering, Okayamct University
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SAKJI Yoshio
Department of Applied Physics, Osaka University
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KAMIURA Yoichi
Department of Applied Physics, Osaka University
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Sakji Yoshio
Department Of Applied Physics Osaka University:matsubara High School
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Usui Tatehito
Department Of Applied Physics And Chemistry Faculty Of Engineering Hiroshima University:(present Add
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Sugiyama Hazime
School Of Engineering Okayama University
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Miyoshi K
Ulsi Device Development Laboratory Nec Corporation
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Sakai Hisashi
Department Of Electric Engineering Hiroshima Denki Institute Of Technology
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Kawasaki K
Nissan Motor Co. Ltd. Tokyo Jpn
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Kamiura Yositomo
Department Of Applied Physics And Chemistry Faculty Of Engineering Hiroshima University
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Nishiyama Yoshihide
Faculty Of Engineering Okayama University
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Hayashi Masao
Faculty Of Engineering Okayama University
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Hayashi Masao
Faculty Of Engineering Kyushu Sangyo University
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Ohyama Shigeki
Faculty Of Engineering Okayama University:(present Address)matsushita-kotobuki Electronics Industries Co. Ltd.
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FUJITA Toshiaki
Department of Applied Physics and Chemistry, Faculty of Engineering, Hiroshima University
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Oda Toshiatsu
Department of Applied Physics and Chemistry,Faculty of Engineering,Hiroshima University
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ODA Toshiatsu
Department of Applied Physics and Chemistry, Faculty of Engineering, Hiroshima University
著作論文
- Spectroscopic Study of Rapid Mixing and Cooling of a High-Density He Plasma Flow Penetrating into Hydrogen Gas
- Cascade Fluorescences from Laser-Excited Lithium Atoms Immersed in a Static Electric Field for Plasma Diagnostics
- Defects Produced in Germanium by Quenching and Electron Irradiation
- A Copper-Related Shallow Acceptor in Quenched Germanium
- One Bond-Type Migration of Phosphorus in Silicon by Interstitialcy Mechanism
- Schematic Model for the Migration of Interstitialcy-Type Self-Interstitial Including the Middle State
- Characteristic of Strained SiGe Film Preventing Hydrogen from Penetrating into Si Substrate Detected by Spreading Resistance Method
- Charge-State and Isotope Effects on the Recovery Process of Stress-Induced Reorientation of Pt-H_2 Complex in Silicon
- Enhancement of Blue Emission from Mg-Doped GaN Using Remote Plasma Containing Atomic Hydrogen
- Observation of Long Relaxation from Fe^0(3d^8) to Fe^+(3d^7) by Electron Spin Resonance Measurement
- Stress-Induced Level Shift of a Hydrogen-Carbon Complex in Silicon : Semiconductors
- Isotope Effects on the Dissociation of a Hydrogen-Carbon Complex in Silicon
- Electronically Induced Instability of a Hydrogen-Carbon Complex in Silicon and Its Dissociation Mechanism
- Far-Infrared Optical Properties of Quenched Germanium; V. Uniaxial Stress Effects on the SA_1 Acceptors : Semiconductors and Semiconductor Devices
- Far-Infrared Optical Properties of Quenched Germanium : IV. Uniaxial Stress Effects on the SA_2 Acceptor
- Measurement of Intensity and Polarization of HeI Forbidden Lines for Diagnostics of Electric Field in a Plasma
- Far-Infrared Optical Properties of Quenched Germanium III. : Effects of Additional Impurities
- Far-Infrared Optical Properties of Quenched Germanium. : II. Magnetic Field Effects
- Far-Infrared Optical Properties of Quenched Germanium I.: The Temperature Dependence of the Absorption and the Photothermal Ionization Spectra