Yashiro M | Univ. Tokyo Tokyo
スポンサーリンク
概要
関連著者
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Yashiro M
Univ. Tokyo Tokyo
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Yoshida M
Functional Materials Research Laboratories Nec Corporation
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Yoshida Masayoshi
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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YOSHIDA Masayuki
Kyushu Institute of Design
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Yoshida M
National Institute Of Advanced Industrial And Science Technology (aist)
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Yoshida M
Yoshida Semiconductor Lab. Fukuoka Jpn
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Komeya Katutoshi
Graduate School Of Environment And Information Science Yokohama National University
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NAKAMURA Kazutaka
Materials and Structures Laboratory, Tokyo Institute of Technology
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KONDO Ken-ichi
Materials and Structures Laboratory, Tokyo Institute of Technology
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Kondo K
Tokyo Inst. Technol. Yokohama Jpn
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Kondo Kazuhiro
Fujitsu Laboratories Ltd.
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Kondo K
Fujitsu Laboratories Ltd.
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Ohmori Y
Center For Advanced Science And Innovation (casi) Osaka University
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Ohmori Yutaka
Faculty Of Engineering Osaka University
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Kondo Ken-ichi
Materials And Structures Laboratory Tokyo Institute Of Technology
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YASHIRO Morio
Department of Applied Chemistry, Faculty of Engineering, Tokyo Institute of Polytechnics
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Nakamura K
Materials And Structures Laboratory Tokyo Institute Of Technology
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Ohmori Y
Osaka Univ. Osaka Jpn
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Komiyama Makoto
Department Of Chemistry And Biotechnology Faculty Of Engineering The University Of Tokyo
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FUJII Akihiko
Department of Electronic Engineering, Graduate School of Engineering, Osaka University
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YOSHINO Katsumi
Department of Electronic Engineering, Graduate School of Engineering, Osaka University
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Yoshida Masayoshi
Department of Cardiovascular Medicine, Kyushu University
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YABUTA Hisato
Department of Quantum Matter, ADSM, Hiroshima University
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Fujii Akihiko
Department Of Electrical Electronic And Informational Engineering Osaka University
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Yoshino Katsumi
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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YOSHIDA Masatake
National Institute of Advanced Industrial Science and technology (AIST) Tsukuba Central 5
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Komeya K
Graduate School Of Environment And Information Sciences Yokohama National Univ.
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YAMAMICHI Shintaro
Functional Materials Research Laboratories, NEC Corporation
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SONE Shuji
ULSI Device Development Laboratory, NEC Corporation
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OHMORI Yutaka
Department of Electronic Engineering, Faculty of Engineering, Osaka University
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Yabuta Hisato
Department Of Quantum Matter Adsm Hiroshima University
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Yoshida Masatake
National Chemical Laboratory For Industry Tsukuba Research Center
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HIRONAKA Yoichiro
Materials and Structures Laboratory, Tokyo Institute of Technology
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Kondo K
Stanley Electric Co. Ltd. Yokohama Jpn
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KOMIYAMA Makoto
Department of Chemistry and Biotechnology, Graduate School of Engineering, The University of Tokyo
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Komiyama Makoto
Department Of Chemistry And Biotechnology Graduate School Of Engineering The University Of Tokyo
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Fujimoto Yasushi
Materials And Structures Laboratory Tokyo Institute Of Technology
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Yamamichi Shintaro
Functional Materials Research Laboratories Nec Corporation
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Yamamichi Shintaro
Fundamental Research Laboratories Nec Corporation
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Sone S
Ulsi Device Development Laboratory Nec Corporation
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Kato Y
Ulsi Device Development Laboratory Nec Corporation:(present Address)advanced Process R&d And Str
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Ohmori Yutaka
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Yoshida Masayoshi
Department Of Cardiovascular Medicine Graduate School Of Medical Sciences Kyushu University
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Komiyama M
Research Center For Advanced Science And Technology The University Of Tokyo
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Fujimoto Y
Department Of Electrical And Electronic Engineering Toyohashi University Of Technology:(present)mats
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Hironaka Yasuhisa
Materials And Structures Laboratory Tokyo Institute Of Technology
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ARITA Koji
ULSI Device Development Laboratory, NEC Corporation
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KATO Yoshitake
ULSI Device Development Laboratory, NEC Corporation
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YABUTA Hisato
Fundamental Research Laboratories, NEC Corporation
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YOSHIDA Masaji
Fundamental Research Laboratories, NEC Corporation
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YOSHIDA Masayuki
Yoshida Semiconductor Laboralory
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TAKAHASHI Manabu
Fukuoka Institute of Technology
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Miyake K
Institute Of Applied Physics Crest Japan Science And Technology Corporation (jst) University Of Tsuk
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Tomokage H
Fukuoka Univ. Fukuoka Jpn
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Tomokage Hajime
Department Of Electronics Fukuoka University
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Tomokage Hajime
Department Of Electronics Faculty Of Engineering Fukuoka University
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Takahashi M
Semiconductor Leading Edge Technologies Inc
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Arita K
Waseda Univ. Tokyo Jpn
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Yoshida Masaji
Fundamental Research Laboratories Nec Corporation
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Arita K
Ulsi Device Development Laboratory Nec Corporation
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Takahashi Minoru
Ceramic Engineering Research Laboratory Nagoya Institute Of Technology
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Suzuki Y
Showa Shell Sekiyu K.k. Kanagawa
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YOSHIDA Masaaki
Department of Electrical and Computer Engineering, Hachinohe National College of Technology
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Yoshida Masaaki
Department Of Electrical And Computer Engineering Hachinohe National College Of Technology
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Suzuki Y
Hitachi Ltd. Tokyo Jpn
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Inoue T
Tohoku Univ. Sendai Jpn
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Inoue T
Advanced Discrete Semiconductor Technology Laboratory Corporated Research And Development Center Tos
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Inoue Tatsuya
Materials And Components Research Laboratory Components And Devices Research Center Matsushita Elect
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Inoue Tetsushi
Research Laboratory Of Resources Utilization Tokyo Institute Of Technology
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Suzuki Y
Optoelectronic Division Electrotechnical Laboratory
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Higuchi Maiko
Department of Pharmacy, Kumamoto University Hospital
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SUZUKI Yoshifumi
Department of Internal Medicine, Social Insurance Chuo General Hospital
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IIZUKA Toshihiro
ULSI Device Development Laboratory, NEC Corporation
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YAMAGUCHI Hiromu
ULSI Device Development Laboratory, NEC Corporation
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AKAHANE Reiko
Fundamental Research Laboratories, NEC Corporation
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YAMAMICHI Shintaro
Fundamental Research Laboratories, NEC Corporation
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Inoue Takahito
Electrotechnical Laboratory
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TOMOKAGE Hajime
Department of Electronics, Fukuoka University
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KAMIURA Yoichi
Faculty of Engineering, Okayama University
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TSURUNO Reiji
Kyushu Institute of Design
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Tomokage Hajime
Department Of Electrical Engineering Faculty Of Engineering Kyushu University
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Tsuruno Reiji
Department Of Visual Communication Design Kyushu Institute Of Design
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SUZUKI Yoshifumi
NTT Electrical Communications Laboratories
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Suzuki Yoshiichi
Central Research And Development Laboratory Showa Shell Sekiyu K.k.
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Suzuki Yoshifumi
Department Of Materials Science Faculty Of Engineering Kyushu Institute Of Technology
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Suzuki Yoshishige
Joint Research Center For Atom Technology(jrcat)-national Institute For Advanced Interdisciplinary R
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Suzuki Yasuzou
Nanotechnology Research Institute National Institute Of Advanced Industrial Science And Technology
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Tange Tomoyuki
Materials and Structures Laboratory, Tokyo Institute of Technology
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Inoue Tomoharu
Materials and Structures Laboratory, Tokyo Institute of Technology
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CHIKAURA Yoshinori
Department of Materials Science, Faculty of Engineering, Kyushu Institute of Technology
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KII Hideki
Department of Materials Science, Faculty of Engineering, Kyushu Institute of Technology
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Higuchi Maiko
Department Of Chemistry And Biotechnology Graduate School Of Engineering The University Of Tokyo
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Akahane Reiko
Fundamental Research Laboratories Nec Corporation:(present Address)functional Materials Laboratories
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Tange Tomoyuki
Materials And Structures Laboratory Tokyo Institute Of Technology
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Kamiura Y
Graduate School Of Natural Science And Technology Okayama University
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Kamiura Yoichi
Faculty Of Engineering Okayama University
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Yamaguchi H
Matsushita Electric Industrial Co. Ltd. Osaka Jpn
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Yamaguchi H
Ntt Basic Research Laboratories
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Kii Hideki
Department Of Materials Science Faculty Of Engineering Kyushu Institute Of Technology
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Chikaura Y
Department Of Materials Science Faculty Of Engineering Kyushu Institute Of Technology
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Chikaura Yoshinori
Department Of Applied Science For Integrated System Engineering Graduate School Of Engineering Kyush
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Ishikubo Akira
Department Of Chemistry And Biotechnology Graduate School Of Engineering The University Of Tokyo
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Suzuki Yoshifumi
Department Of Electrical And Electronic Engineering Kanagawa Institute Of Technology
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Inoue T
Applied Laser Engineering Research Institute
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Iizuka Toshihiro
Ulsi Device Development Laboratory Nec Corporation
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Yoshida Masaaki
Department Of Applied Chemistry Faculty Of Engineering Utsunomiya University
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重川 秀実
筑波大学物理工学系
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Kondo K
Kyoto Univ. Kyoto Jpn
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重川 秀実
Univ. Tsukuba Tsukuba
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Shigekawa Hidemi
Institute Of Applied Physics University Of Tsukuba
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Shigekawa Hidemi
Institute Of Applied Physics And Crest Japan Science And Technology Corporation (jst) University Of
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TAKEDA Naoya
Department of Neurosurgery, Nishi-Kobe Medical Center
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Ueno Hideki
Laboratory Of Biology Faculty Of Education Niigata University
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Ueno Hideki
Department Of Electrical Engineering Faculty Of Engineering Himeji Of Technology
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Ueno Hideki
Osaka R&d Laboratories Sumitomo Electric Industries Ltd.
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Fujii Akihiko
Faculty Of Engineering Keio University
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TAKARADA Tohru
Department of Applied Chemistry, Graduate School of Engineering, Kyushu University
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Ueno H
Himeji Inst. Technol. Himeji Jpn
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Matsuki T
Ulsi Device Development Laboratory Nec Corporation
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YOSHINO Katsumi
Faculty of Engineering, Osaka University
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Takarada Tohru
Department Of Applied Chemistry Graduate School Of Engineering Kyushu University
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Takarada Tohru
Department Of Chemistry And Biotechnology Faculty Of Engineering University Of Tokyo
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Yoshino Katsumi
Faculty Of Engineering Osaka University
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KATAYAMA Masahide
CRC Solutions Corp.
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YAMAMOTO Ichiro
ULSI Device Development Laboratory, NEC Corporation
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MATSUKI Takeo
ULSI Device Development Laboratory, NEC Corporation
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YABUTA Hisato
Functional Materials Research Laboratories, NEC Corporation
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MIYASAKA Yoichi
Functional Materials Research Laboratories, NEC Corporation
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SONE Shuji
Fundamental Research Laboratories, NEC Corporation
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KATO Yoshitake
Fundamental Research Laboratories, NEC Corporation
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YAMAMICHI Shintaro
ULSI Device Development Laboratories, NEC Corporation
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LESAICHERRE Pierre-Yves
ULSI Device Development Laboratories, NEC Corporation
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NISHIMOTO Shozo
ULSI Device Development Laboratories, NEC Corporation
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Wakabayashi Kunihiko
Materials And Structures Laboratory Tokyo Institute Of Technology
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TAKENAKA Hisataka
NTT Advanced Technology Corporation
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TOMOKAGE Hajime
Depratment of Electronics, Fukuoka University
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SUMAOKA Jun
Department of Chemistry and Biotechnology, Graduate School of Engineering, The University of Tokyo
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OHMORI Yutaka
Faculty of Engineering, Osaka University
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ISHII Youichi
Department of Chemistry and Biotechnology, Graduate School of Technology, The University of Tokyo
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KAKIMOTO Masaya
Osaka R & D Laboratories, Sumitomo Electric Industries, Ltd.
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KOJIMA Hiroyuki
Osaka R & D Laboratories, Sumitomo Electric Industries, Ltd.
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Takenaka Hisataka
Ntt Advanced Technology Corp.
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Yamamichi Shintaro
Ulsi Device Development Laboratories Nec Corporation
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Lesaicherre Pierre-yves
Ulsi Device Development Laboratories Nec Corporation
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Kondo Kunitaka
Institute Of Physics University Of Tsukuba
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Yoshida Masataka
National Institute of Materials and Chemical Research
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MORITOH Tatsumi
Materials and Structures Laboratory, Tokyo Institute of Technology
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MATSUOKA Shohei
Materials and Structures Laboratory, Tokyo Institute of Technology
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OGURA Toshiyuki
Materials and Structures Laboratory, Tokyo Institute of Technology
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HATTORI Shyuhei
Materials and Structures Laboratory, Tokyo Institute of Technology
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KOZU Naoshi
School of Engineering, Tokyo University
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TANAKA Kazuo
Faculty of Engineering and Institute of Laser Engineering, Osaka University
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OZAKI Norimasa
Faculty of Engineering and Institute of Laser Engineering, Osaka University
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SASATANI Yasufumi
Faculty of Engineering and Institute of Laser Engineering, Osaka University
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OHTANI Masayuki
Deportment of Earth and Space Science, Graduate School of Science, Osaka University
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TSUNEMI Hiroshi
Deportment of Earth and Space Science, Graduate School of Science, Osaka University
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NOVIKOV Dmitri
Hamburger Syncrotron-Strahrungs Labor. Deutches Electronen-Synchrotron
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MATERLIK Gerhard
Hamburger Syncrotron-Strahrungs Labor. Deutches Electronen-Synchrotron
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HIRONAKA Yasuhisa
Faculty of Engineering, Osaka University
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YOSHIDA Masayoshi
Faculty of Engineering, Osaka University
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YOSHIMOTO Kenji
Department of Electronic Engineering, Faculty of Engineering, Osaka University
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Lesaicherre P‐y
Ulsi Device Development Laboratories Nec Corporation
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Kozu Naoshi
School Of Engineering Tokyo University
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Sumaoka Jun
Department Of Chemistry And Biotechnology Graduate School Of Engineering The University Of Tokyo
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Ueta Hiroshi
The Department Of Electronic Engineering Osaka University
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Ishii Youichi
Department Of Applied Chemistry Faculty Of Engineering Chuo University
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Ishii Youichi
Department Of Applied Chemistry Faculty Of Science And Engineering Chuo University
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Takenaka H
Ntt Advanced Technology Corp.
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Ozaki Norimasa
Faculty Of Engineering And Institute Of Laser Engineering Osaka University
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Kondo Ken'ichi
Broadcasting Science Research Laboratories Of Nippon Hoso Kyokai:(present Address) Moririka Electron
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Kato Yoshitake
Fundamental Research Laboratories Nec Corporation
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Hattori Shyuhei
Materials And Structures Laboratory Tokyo Institute Of Technology
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Moritoh Tatsumi
Materials And Structures Laboratory Tokyo Institute Of Technology
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Matsuoka Shohei
Materials And Structures Laboratory Tokyo Institute Of Technology
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Tsunemi Hiroshi
Deportment Of Earth And Space Science Graduate School Of Science Osaka University
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WASHIZU Yusuke
Department of Chemistry and Biotechnology, Graduate School of Engineering, The University of Tokyo
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Takeda N
Kyushu Univ. Fukuoka
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Takeda Naoya
Department Of Materials Science And Technology Faculty Of Engineering Niigata University
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Washizu Y
Nagoya Univ. Aichi
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Ohtani Masayuki
Deportment Of Earth And Space Science Graduate School Of Science Osaka University
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ISHIKUBO Akira
Department of Chemistry and Biotechnology, Faculty of Engineering, University of Tokyo
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Sasatani Yasufumi
Faculty Of Engineering And Institute Of Laser Engineering Osaka University
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Kojima Hiroyuki
Osaka Natl. Res. Inst.
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IMAI Takamitsu
Department of Chemistry and Biotechnology, Graduate School of Engineering, University of Tokyo
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IRISAWA Makoto
Department of Chemistry and Biotechnology, Graduate School of Engineering, University of Tokyo
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SHIGEKAWA Hidemi
Center for Tsukuba Advanced Research Alliance and Institute of Materials Science, University of Tsuk
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Matsuki Takeo
Ulsi Device Development Laboratory Nec Corporation
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Kajii H
Osaka Univ. Osaka Jpn
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Ogura Toshiyuki
Materials And Structures Laboratory Tokyo Institute Of Technology
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Kakimoto Masaaki
Osaka R&d Laboratories Sumitomo Electric Industries Ltd.
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Katayama M
Crc Solutions Corp.
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Irisawa M
Department Of Chemistry And Biotechnology Graduate School Of Engineering University Of Tokyo
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Irisawa Makoto
Department Of Chemistry And Biotechnology Faculty Of Engineering The University Of Tokyo
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Imai T
Toda Kogyo Corp. Hiroshima
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Nishimoto Shozo
Ulsi Device Development Laboratories Nec Corporation
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Yoshino Katsumi
Faculty Of Engineering Of Osaka University
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Yamamoto Ichiro
Ulsi Device Development Laboratories Nec Corporation
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Yamamoto Ichiro
Ulsi Device Development Laboratory Nec Corporation
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Kojima Hiroyuki
Osaka National Research Institute Agency Of Industrial Science And Technology
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Yoshida Masaaki
Department Of Biology Graduate School Of Science Osaka University
著作論文
- Spectroscopy of Hard X-Rays (2-15 keV) Generated by Focusing Femtosecond Laser on Metal Targets
- Low Temperature Recovery of Ru(Ba, Sr)TiO_3/Ru Capacitors Degraded by Forming Gas Annealing
- Electrical Properties of (Ba,Sr)TiO_3 Films on Ru Bottom Electrodes Prepared by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition at Extremely Low Temperature and Rapid Thermal Annealing
- Electrical Properties of (Ba,Sr)TiO_3 Films on Ru Bottom Electrodes Prepared by ECR Plasma CVD at Extremely Low Temperature and RTA
- Low Temperature Deposition of (Ba, Sr)TiO_3 Films by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition
- Bulk Boundary Condition for Numerical Solution of Simultaneous Diffusion Equations of Phosphorus and Point Defects in Silicon
- One Bond-Type Migration of Phosphorus in Silicon by Interstitialcy Mechanism
- Picosecond Pulsed X-Ray Diffraction from a Pulsed Laser Heated Si(111)
- Time-Resolved X-ray Shadowgraphy Experiment of Laser Ablation of Aluminum using Laser-Induced Picosecond Pulsed X-rays
- Spall behavior of steels under hypervelocity impact
- Laser-Induced Shock Compression of Tantalum to 1.7 TPa
- Energy-Dispersive Synchrotron Radiation Topographic Observation of InAs/GaAs Lattice-Mismatched Layer
- X-ray Penetration Depth for Large Lattice-Mismatched Heteroepitaxial Layer by Dynamical Diffraction Theory using Computer Simulation
- Schematic Model for the Migration of Interstitialcy-Type Self-Interstitial Including the Middle State
- Enhancement of Electroluminescence Intensity from Dye-Doped Poly(3-Alkylthiophene) Light Emitting Diode with Different Alkyl-Side-Chain Length
- Electroluminescent Diodes Utilizing Polysilanes
- Polarity-Dependent Multicolor Organic Electroluminescent Device
- Two-Band Electroluminescent Emission in Organic Electroluminescent Diode with Phthalocyanine Film
- Pulse Response of Electroluminescence in Poly(3-alkylthiophene) Mixed with Fluorescent Dye
- Hydrolysis of Diribonucleoside Monophosphate Diesters Assisted by a Manganese(II) Complex
- Effect of Alkaline Earth Metal Ions on the Phosphodiester Hydrolysis of RNA
- Lanthanide Complexes with High Stability and Efficiency for the Hydrolysis of a Ribonucleptide Dimer
- Unprecedentedly Fast DNA Hydrolysis by the Synergism of the Cerium(IV)-Praseodymium(III)and the Cerium(IV)-Neodymium(III)Combinations^1
- Dinulear Lanthanum (III) Complex for Efficient Hydrolysis of RNA