Kato Y | Ulsi Device Development Laboratory Nec Corporation:(present Address)advanced Process R&d And Str
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概要
- KATO Yoshitakeの詳細を見る
- 同名の論文著者
- Ulsi Device Development Laboratory Nec Corporation:(present Address)advanced Process R&d And Strの論文著者
関連著者
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Kato Y
Ulsi Device Development Laboratory Nec Corporation:(present Address)advanced Process R&d And Str
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YABUTA Hisato
Department of Quantum Matter, ADSM, Hiroshima University
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Yoshida M
Functional Materials Research Laboratories Nec Corporation
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YAMAMICHI Shintaro
Functional Materials Research Laboratories, NEC Corporation
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SONE Shuji
ULSI Device Development Laboratory, NEC Corporation
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Yabuta Hisato
Department Of Quantum Matter Adsm Hiroshima University
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Yoshida M
Yoshida Semiconductor Lab. Fukuoka Jpn
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YOSHIDA Masayuki
Kyushu Institute of Design
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Yoshida Masayoshi
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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Yamamichi Shintaro
Functional Materials Research Laboratories Nec Corporation
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Yamamichi Shintaro
Fundamental Research Laboratories Nec Corporation
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Yoshida M
National Institute Of Advanced Industrial And Science Technology (aist)
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Sone S
Ulsi Device Development Laboratory Nec Corporation
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Yashiro M
Univ. Tokyo Tokyo
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ARITA Koji
ULSI Device Development Laboratory, NEC Corporation
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KATO Yoshitake
ULSI Device Development Laboratory, NEC Corporation
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YABUTA Hisato
Fundamental Research Laboratories, NEC Corporation
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YOSHIDA Masaji
Fundamental Research Laboratories, NEC Corporation
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Arita K
Waseda Univ. Tokyo Jpn
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Yoshida Masaji
Fundamental Research Laboratories Nec Corporation
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Arita K
Ulsi Device Development Laboratory Nec Corporation
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Arita Koji
ULSI Device Development Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Kato Yoshitake
ULSI Device Development Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Sone Shuji
ULSI Device Development Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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金辺 忠
福井大学大学院工学研究科
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Kanabe Tadashi
Hamamatsu Photonics K.k.
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中井 光男
阪大レーザー研、アメリカ海軍研究所
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NAKATSUKA Masahiro
Department of Laser Power Photonics, Institute of Laser Engineering, Osaka University
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Matsui Hiroki
Central Research Laboratory Hamamatsu Photonics K.k.
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IZAWA Yasukazu
Institute for Laser Technology
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Kawashima T
Osaka Univ. Osaka Jpn
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Nakai Sadao
Institute of Laser Engineering, Osaka University
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KAN Hirofumi
Central Research Laboratory, Hamamatsu Photonics K.K.
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NAKATSUKA Masahiro
Institute of Laser Engineering, Osaka University
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IIZUKA Toshihiro
ULSI Device Development Laboratory, NEC Corporation
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YAMAGUCHI Hiromu
ULSI Device Development Laboratory, NEC Corporation
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AKAHANE Reiko
Fundamental Research Laboratories, NEC Corporation
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YAMAMICHI Shintaro
Fundamental Research Laboratories, NEC Corporation
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Kato Y
Nec Corp. Kanagawa Jpn
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Tokumaru Katsumi
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology
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中井 俊一
宇都宮大学工学部
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Yamanaka Masanobu
Institute of Laser Engineering, Osaka University
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KAWASHIMA Toshiyuki
Institute of Laser Engineering, Osaka University
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NAKAI Sadao
Kochi National College of Technology
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KANZAKI Takeshi
Central Research Laboratory, Hamamatsu Photonics K. K.
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KATO Yoshinori
Institute of Laser Engineering, Osaka University
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MATSUI Hiroki
Institute of Laser Engineering, Osaka University
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Mitani Kenichiro
Hypermedia Research Center Sanyo Electric Co. Ltd.
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Nakatsuka Masahiro
Institute Of Laser Engineering Osaha University
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Kuwabara Shigeyuki
Graduate School Of Science And Technology Niigata University
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Kawashima Toshiyuki
Hamamatsu Photonics K.k.
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Kan Hirofumi
Central Research Institute Hamamatsu Photonics K. K.
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Kanabe Tadashi
Institute Of Laser Engineering Osaka University
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Yamanaka C
Institute Of Laser Engineering Osaka University
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Yamanaka Masanobu
Institute Of Laser Engineering Osaka University
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Nakai Sadao
Institute Of Laser Engineering Osaka University
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Nakai Sadao
Department Of Electrical Engineering Osaka University
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Kan H
Hamamatsu Photonics K.k. Hamakita Jpn
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Kimura T
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology
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Kato Yoshiaki
Advanced Photon Research Center Kansai Research Establishment Japan Atomic Energy Research Institute
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Kawashima T
Hamamatsu Photonics K.k.
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Nakai S
Institute Of Laser Engineering Osaka University
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Nakai S
Osaka Univ. Osaka Jpn
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Nakai M
Institute Of Laser Engineering Osaka University
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Akahane Reiko
Fundamental Research Laboratories Nec Corporation:(present Address)functional Materials Laboratories
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中井 俊一
Faculty Of Engineering Utstunomiya University
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MITANI Kiyoshi
Isobe R&D Center, Shin-Estu Handotai Co., Lid.
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Yamaguchi H
Matsushita Electric Industrial Co. Ltd. Osaka Jpn
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Nakatsuka M
Osaka Univ. Osaka Jpn
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Akatsuka M
Corporate Research And Development Laboratories Sumitomo Metal Industries Limited
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Yamaguchi H
Ntt Basic Research Laboratories
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Kimura T
Institute Of Applied Physics 21th Century Coe Nano Project University Of Tsukuba
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Nishikino M
Division Of Electric Electronic And Information Engineering Graduate School Of Engineering Osaka Uni
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Kato Y
Process Research Process R&d Laboratories For Technology Development Banyu Pharmaceutical Co. Lt
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KUWABARA Susumu
Isobe R&D Center, Shin-Etsu Handotai Co., Ltd.
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YATSUGAKE Yasuo
Hitachi Electronics Engineering Co., Ltd.
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KATO Yuichiro
Hitachi Electronics Engineering Co., Ltd.
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Mitani K
Sanyo Electric Co. Ltd. Gifu Jpn
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Mitani Kiyoshi
Isobe R&d Center Shin-etsu Handotai
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Yatsugake Yasuo
Hitachi Electronics Engineering Co. Ltd.
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Iizuka Toshihiro
Ulsi Device Development Laboratory Nec Corporation
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Kato Yoshinori
Institute Of Laser Engineering Osaka University
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Kimura Tatsumi
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology
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Nakai Sadao
Institute Of Laser Engineering Faculty Of Engineering Osaka University
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Yagi M
Institute Of Laser Engineering Osaka University
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Kuwabara Susumu
Isobe R&D Center, Shin-Etsu Handotai Co., Ltd.
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Nakatsuka Masahiro
Institute for Laser Technology, 1-8-4 Utsubo-Honmachi, Nishi-ku, Osaka 550-0004, Japan
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YAMAGUCHI Hiromu
ULSI Device Development Laboratories, NEC Corporation
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Iizuka Toshihiro
ULSI Device Development Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229, Japan
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Akatsuka Masanori
Department of Laser Power Photonics, Institute of Laser Engineering, Osaka University
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Matsuki T
Ulsi Device Development Laboratory Nec Corporation
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YAMAMOTO Ichiro
ULSI Device Development Laboratory, NEC Corporation
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MATSUKI Takeo
ULSI Device Development Laboratory, NEC Corporation
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YABUTA Hisato
Functional Materials Research Laboratories, NEC Corporation
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MIYASAKA Yoichi
Functional Materials Research Laboratories, NEC Corporation
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SONE Shuji
Fundamental Research Laboratories, NEC Corporation
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KATO Yoshitake
Fundamental Research Laboratories, NEC Corporation
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YAMAMICHI Shintaro
ULSI Device Development Laboratories, NEC Corporation
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LESAICHERRE Pierre-Yves
ULSI Device Development Laboratories, NEC Corporation
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NISHIMOTO Shozo
ULSI Device Development Laboratories, NEC Corporation
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SHEN Qing
Department of Industrial Chemistry, Faculty of Engineering, University of Tokyo
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Shen Qing
Department Of Applied Chemistry Faculty Of Engineering University Of Tokyo
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KANABE Tadashi
Institute of laser Engineering, Osaka University
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MATSUI Ken
Central Research Laboratory, Hamamatsu Photonics K. K.
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MIYAMOTO Masahiro
Central Research Laboratory, Hamamatsu Photonics K. K.
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HIRUMA Teruo
Central Research Laboratory, Hamamatsu Photonics K. K.
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KANEBE Tadashi
Institute of Laser Engineering, Osaka University
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EGUCHI Takeyoshi
Institute of Laser Engineering, Osaka University
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Yamamichi Shintaro
Ulsi Device Development Laboratories Nec Corporation
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Lesaicherre Pierre-yves
Ulsi Device Development Laboratories Nec Corporation
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TOYODA Taro
Department of Applied Physics and Chemistry, University of Electro-Communications
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Eguchi Takeyoshi
Institute Of Laser Engineering Osaka University
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Lesaicherre P‐y
Ulsi Device Development Laboratories Nec Corporation
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Matsui Ken
Central Research Laboratory Hamamatsu Photonics K. K.
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Toyoda Taro
Department Of Applied Physics And Chemistry The University Of Electro-communications
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Hirohata Toru
Central Research Laboratory Hamamatsu Photonics K.k.
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Kato Yuichiro
Department Of Applied Plysics And Chemistry University Of Electro-communications
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Kato Yoshitake
Fundamental Research Laboratories Nec Corporation
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Matsuki Takeo
Ulsi Device Development Laboratory Nec Corporation
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Hirohada Toru
Central Research Laboratory Hamamatsu Photonics K. K.
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Nishimoto Shozo
Ulsi Device Development Laboratories Nec Corporation
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Miyamoto Masahiro
Central Research Laboratory Hamamatsu Photonics K. K.
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Yamamoto Ichiro
Ulsi Device Development Laboratories Nec Corporation
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Yamamoto Ichiro
Ulsi Device Development Laboratory Nec Corporation
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SHEN Qing
Department of Applied Physics and Chemistry, The University of Electro-Communications
著作論文
- Low Temperature Recovery of Ru(Ba, Sr)TiO_3/Ru Capacitors Degraded by Forming Gas Annealing
- Electrical Properties of (Ba,Sr)TiO_3 Films on Ru Bottom Electrodes Prepared by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition at Extremely Low Temperature and Rapid Thermal Annealing
- Electrical Properties of (Ba,Sr)TiO_3 Films on Ru Bottom Electrodes Prepared by ECR Plasma CVD at Extremely Low Temperature and RTA
- Low Temperature Deposition of (Ba, Sr)TiO_3 Films by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition
- Quasi-CW 110kW AlGaAs Laser Diode Array Module for Inertial Fusion Energy Laser Driver : Optics and Quantum Electronics
- Design and Performance of a Diode-Pumped Nd:Silica-Phosphate Glass Zig-Zag Slab Laser Amplffier for Inertial Fusion Energy : Optics and Quantum Electronics
- Detection of Particles on Quarter μm Thick or Thinner SOI Wafers
- Detection of Particles on Quarter um Thick or Thinner SOI Wafers
- Photoacoustic and Photoluminescence Studies of CdS_xSe_ Doped Glasses