Yoshida M | Yoshida Semiconductor Lab. Fukuoka Jpn
スポンサーリンク
概要
関連著者
-
Yoshida M
Yoshida Semiconductor Lab. Fukuoka Jpn
-
Yoshida M
Functional Materials Research Laboratories Nec Corporation
-
Yoshida M
National Institute Of Advanced Industrial And Science Technology (aist)
-
YOSHIDA Masayuki
Kyushu Institute of Design
-
Yoshida Masayoshi
Department Of Electronic Engineering Faculty Of Engineering Osaka University
-
Ohmori Yutaka
Faculty Of Engineering Osaka University
-
Tomokage Hajime
Department Of Electronics Faculty Of Engineering Fukuoka University
-
TOMOKAGE Hajime
Department of Electronics, Fukuoka University
-
Tomokage H
Fukuoka Univ. Fukuoka Jpn
-
Tomokage Hajime
Department Of Electronics Fukuoka University
-
Tomokage Hajime
Department Of Electrical Engineering Faculty Of Engineering Kyushu University
-
Ohmori Y
Center For Advanced Science And Innovation (casi) Osaka University
-
FUJII Akihiko
Department of Electronic Engineering, Graduate School of Engineering, Osaka University
-
YOSHINO Katsumi
Department of Electronic Engineering, Graduate School of Engineering, Osaka University
-
Yoshida Masayoshi
Department of Cardiovascular Medicine, Kyushu University
-
Fujii Akihiko
Department Of Electrical Electronic And Informational Engineering Osaka University
-
Yoshino Katsumi
Department Of Electrical Engineering Faculty Of Engineering Osaka University
-
OHMORI Yutaka
Department of Electronic Engineering, Faculty of Engineering, Osaka University
-
Ohmori Yutaka
Department Of Electrical Engineering Faculty Of Engineering Osaka University
-
Yoshida Masayoshi
Department Of Cardiovascular Medicine Graduate School Of Medical Sciences Kyushu University
-
Fujii Akihiko
Faculty Of Engineering Keio University
-
YOSHINO Katsumi
Faculty of Engineering, Osaka University
-
Yoshino Katsumi
Faculty Of Engineering Osaka University
-
OHMORI Yutaka
Faculty of Engineering, Osaka University
-
YOSHIDA Masayoshi
Faculty of Engineering, Osaka University
-
Komeya Katutoshi
Graduate School Of Environment And Information Science Yokohama National University
-
NAKAMURA Kazutaka
Materials and Structures Laboratory, Tokyo Institute of Technology
-
KONDO Ken-ichi
Materials and Structures Laboratory, Tokyo Institute of Technology
-
Kondo K
Tokyo Inst. Technol. Yokohama Jpn
-
Kondo Kazuhiro
Fujitsu Laboratories Ltd.
-
TAKAHASHI Manabu
Fukuoka Institute of Technology
-
MOROOKA Masami
Department of Electrical Engineering, Fukuoka Institute of Technology
-
Kondo K
Fujitsu Laboratories Ltd.
-
Kondo Ken-ichi
Materials And Structures Laboratory Tokyo Institute Of Technology
-
師岡 正美
福岡工業大学電気工学科
-
Morooka Masami
Department Of Electrical Engineering Fukuoka Institute Of Technology
-
YABUTA Hisato
Department of Quantum Matter, ADSM, Hiroshima University
-
YOSHIDA Masatake
National Institute of Advanced Industrial Science and technology (AIST) Tsukuba Central 5
-
Komeya K
Graduate School Of Environment And Information Sciences Yokohama National Univ.
-
YAMAMICHI Shintaro
Functional Materials Research Laboratories, NEC Corporation
-
SONE Shuji
ULSI Device Development Laboratory, NEC Corporation
-
YOSHIDA Masaji
Fundamental Research Laboratories, NEC Corporation
-
Yabuta Hisato
Department Of Quantum Matter Adsm Hiroshima University
-
Yoshida Masatake
National Chemical Laboratory For Industry Tsukuba Research Center
-
HIRONAKA Yoichiro
Materials and Structures Laboratory, Tokyo Institute of Technology
-
Kondo K
Stanley Electric Co. Ltd. Yokohama Jpn
-
YOSHIDA Masayuki
Yoshida Semiconductor Laboralory
-
Fujimoto Yasushi
Materials And Structures Laboratory Tokyo Institute Of Technology
-
Yamamichi Shintaro
Functional Materials Research Laboratories Nec Corporation
-
Yamamichi Shintaro
Fundamental Research Laboratories Nec Corporation
-
Takahashi M
Semiconductor Leading Edge Technologies Inc
-
Sone S
Ulsi Device Development Laboratory Nec Corporation
-
Kato Y
Ulsi Device Development Laboratory Nec Corporation:(present Address)advanced Process R&d And Str
-
Yoshida Masaji
Fundamental Research Laboratories Nec Corporation
-
ARITA Koji
ULSI Device Development Laboratory, NEC Corporation
-
KATO Yoshitake
ULSI Device Development Laboratory, NEC Corporation
-
YABUTA Hisato
Fundamental Research Laboratories, NEC Corporation
-
YOSHIDA Masahiro
Central Research Laboratories, Idemitsu Kosan Co., Ltd.
-
SENDA Norio
Central Research Laboratories, Idemitsu Kosan Co., Ltd.
-
Morishima Chikayoshi
Faculty Of Engineering Osaka University
-
Arita K
Waseda Univ. Tokyo Jpn
-
Senda Norio
Central Research Laboratories Idemitsu Kosan Co. Ltd.
-
Yamaguchi H
Matsushita Electric Industrial Co. Ltd. Osaka Jpn
-
Yamaguchi H
Ntt Basic Research Laboratories
-
Suzuki Y
Showa Shell Sekiyu K.k. Kanagawa
-
YOSHIDA Masaaki
Department of Electrical and Computer Engineering, Hachinohe National College of Technology
-
Yoshida Masaaki
Department Of Electrical And Computer Engineering Hachinohe National College Of Technology
-
Inoue M
Department Of Electrical Engineering Osaka Prefectural Technical College
-
Inoue M
Osaka Inst. Technol. Osaka Jpn
-
Suzuki Y
Hitachi Ltd. Tokyo Jpn
-
Inoue Masami
Association Of Super-advanced Electronics Technologies (aset)
-
Inoue T
Tohoku Univ. Sendai Jpn
-
Inoue T
Advanced Discrete Semiconductor Technology Laboratory Corporated Research And Development Center Tos
-
Inoue Tatsuya
Materials And Components Research Laboratory Components And Devices Research Center Matsushita Elect
-
Inoue Tetsushi
Research Laboratory Of Resources Utilization Tokyo Institute Of Technology
-
Shirouzu Shigenori
Central Research Laboratories Idemitsu Kosan Co. Ltd.
-
Inoue Masumi
Department Of Quantum Engineering Nagoya University
-
Suzuki Y
Optoelectronic Division Electrotechnical Laboratory
-
MOROOKA Masami
Fukuoka Institute of Technology
-
SUZUKI Yoshifumi
Department of Internal Medicine, Social Insurance Chuo General Hospital
-
KITAGAWA Hajime
Department of Electronic Materials Engineering, Fukuoka Institute of Technology
-
IIZUKA Toshihiro
ULSI Device Development Laboratory, NEC Corporation
-
YAMAGUCHI Hiromu
ULSI Device Development Laboratory, NEC Corporation
-
AKAHANE Reiko
Fundamental Research Laboratories, NEC Corporation
-
YAMAMICHI Shintaro
Fundamental Research Laboratories, NEC Corporation
-
LESAICHERRE Pierre-Yves
ULSI Device Development Laboratories, NEC Corporation
-
Inoue Takahito
Electrotechnical Laboratory
-
Kitagawa H
Canon Inc. Utsunomiya Jpn
-
Kitagawa Hajime
Deportment Of Information Electronics Fukuoka Institute Of Technology
-
Kitagawa Hajime
Production-systems Engineering Toyohashi University Of Technology
-
KAMIURA Yoichi
Faculty of Engineering, Okayama University
-
TSURUNO Reiji
Kyushu Institute of Design
-
Inoue M
Advanced Technology R&d Center Mitsubishi Electric Corp.
-
INOUE Morio
Kyoto Research Laboratory, Matsushita Electronics Corporation
-
Tsuruno Reiji
Department Of Visual Communication Design Kyushu Institute Of Design
-
SUZUKI Yoshifumi
NTT Electrical Communications Laboratories
-
Suzuki Yoshiichi
Central Research And Development Laboratory Showa Shell Sekiyu K.k.
-
Suzuki Yoshifumi
Department Of Materials Science Faculty Of Engineering Kyushu Institute Of Technology
-
Suzuki Yoshishige
Joint Research Center For Atom Technology(jrcat)-national Institute For Advanced Interdisciplinary R
-
Suzuki Yasuzou
Nanotechnology Research Institute National Institute Of Advanced Industrial Science And Technology
-
Lesaicherre Pierre-yves
Ulsi Device Development Laboratories Nec Corporation
-
Tange Tomoyuki
Materials and Structures Laboratory, Tokyo Institute of Technology
-
Inoue Tomoharu
Materials and Structures Laboratory, Tokyo Institute of Technology
-
CHIKAURA Yoshinori
Department of Materials Science, Faculty of Engineering, Kyushu Institute of Technology
-
KII Hideki
Department of Materials Science, Faculty of Engineering, Kyushu Institute of Technology
-
YOSHIMOTO Kenji
Department of Electronic Engineering, Faculty of Engineering, Osaka University
-
YOSHIDA Masakatsu
Kyoto Research Laboratory, Matsushita Electronics Corp.
-
ISHIKAWA Katsuya
Kyoto Research Laboratory, Matsushita Electronics Corp.
-
Lesaicherre P‐y
Ulsi Device Development Laboratories Nec Corporation
-
Inoue Morio
Kyoto Research Laboratory Matsushita Electronics Corp.
-
Kitagawa Hajime
Department Of Electrical Engineering Faculty Of Engineering Kyushu University
-
Akahane Reiko
Fundamental Research Laboratories Nec Corporation:(present Address)functional Materials Laboratories
-
Tange Tomoyuki
Materials And Structures Laboratory Tokyo Institute Of Technology
-
Kamiura Y
Graduate School Of Natural Science And Technology Okayama University
-
Kamiura Yoichi
Faculty Of Engineering Okayama University
-
Shichijyo S
Mitsui Chemicals Inc.
-
Shirouzu S
Health Sci. Foundation Moa. Fukuoka Jpn
-
Kondo K
Kyoto Univ. Kyoto Jpn
-
Ishii T
Idemitsu Material Co. Ltd. Chiba Jpn
-
Inoue M
Setsunan Univ. Osaka Jpn
-
ISHITANI Akihiko
ULSI Device Development Laboratories, NEC Corporation
-
Ueno Hideki
Laboratory Of Biology Faculty Of Education Niigata University
-
Ueno Hideki
Department Of Electrical Engineering Faculty Of Engineering Himeji Of Technology
-
Ueno Hideki
Osaka R&d Laboratories Sumitomo Electric Industries Ltd.
-
Nakagawa T
Riken
-
Inoue M
Assoc. Super‐advanced Electronics Technol. (aset) Yokohama Jpn
-
Inoue M
Nanomaterials Microdevices Research Center Osaka Institute Of Technology
-
NAKASHIMA Shin-ichi
Department of Applied Physics,Osaka University
-
Inoue M
Kyoto Univ. Kyoto Jpn
-
Ueno H
Himeji Inst. Technol. Himeji Jpn
-
Matsuki T
Ulsi Device Development Laboratory Nec Corporation
-
KATAYAMA Masahide
CRC Solutions Corp.
-
YAMAMOTO Ichiro
ULSI Device Development Laboratory, NEC Corporation
-
MATSUKI Takeo
ULSI Device Development Laboratory, NEC Corporation
-
YABUTA Hisato
Functional Materials Research Laboratories, NEC Corporation
-
MIYASAKA Yoichi
Functional Materials Research Laboratories, NEC Corporation
-
SONE Shuji
Fundamental Research Laboratories, NEC Corporation
-
KATO Yoshitake
Fundamental Research Laboratories, NEC Corporation
-
YAMAMICHI Shintaro
ULSI Device Development Laboratories, NEC Corporation
-
NISHIMOTO Shozo
ULSI Device Development Laboratories, NEC Corporation
-
YAMAGUCHI Hiromu
Fundamental Research Laboratories, NEC Corporation
-
SAKUMA Toshiyuki
Fundamental Research Laboratories, NEC Corporation
-
MIYASAKA Yoichi
Fundamental Research Laboratories, NEC Corporation
-
Wakabayashi Kunihiko
Materials And Structures Laboratory Tokyo Institute Of Technology
-
Inoue Masataka
Nanomaterials Microdevices Research Center Osaka Institute Of Technology
-
TAKENAKA Hisataka
NTT Advanced Technology Corporation
-
TOMOKAGE Hajime
Depratment of Electronics, Fukuoka University
-
MIYAMOTO Tokuo
Department of Electronics, Faculty of Engineering, Fukuoka University
-
Hirota Shouichi
Department of Electronics, Fukuoka University
-
KAKIMOTO Masaya
Osaka R & D Laboratories, Sumitomo Electric Industries, Ltd.
-
KOJIMA Hiroyuki
Osaka R & D Laboratories, Sumitomo Electric Industries, Ltd.
-
SHIROUZU Shigenori
R&D Center, Idemitsu Material Co., Ltd.
-
CHINO Shinji
R&D Center, Idemitsu Material Co., Ltd.
-
HAYASHI Mikiya
R&D Center, Idemitsu Material Co., Ltd.
-
ISHII Tatsuo
R&D Center, Idemitsu Materials Co., Ltd.
-
IGA Toru
R&D Center, Idemitsu Material Co., Ltd.
-
KAWAHARA Hideaki
Department of Biotechnology, Faculty of Engineering, Kansai University
-
Takenaka Hisataka
Ntt Advanced Technology Corp.
-
Yamamichi Shintaro
Ulsi Device Development Laboratories Nec Corporation
-
Kondo Kunitaka
Institute Of Physics University Of Tsukuba
-
Shigematsu Koji
Central Research Laboratory Mitsui Mining & Smelting Co. Ltd.
-
SHIGEMATSU Kazuyoshi
Central Research Laboratories, Idemitsu Kosan Cc. Ltd.
-
SAKAMOTO Shuji
Central Research Laboratories, Idemitsu Kosan Cc. Ltd.
-
NAKAGAWA Takashi
Central Research Laboratories, Idemitsu Kosan Cc. Ltd.
-
SHIKUMA Haruo
Central Research Laboratories, Idemitsu Kosan Co. Ltd.
-
TAGAMI Sanae
Central Research Laboratories, Idemitsu Kosan Co. Ltd.
-
Yoshida Masataka
National Institute of Materials and Chemical Research
-
Shigematsu K
Faculty Of Education Iwate University
-
MORITOH Tatsumi
Materials and Structures Laboratory, Tokyo Institute of Technology
-
MATSUOKA Shohei
Materials and Structures Laboratory, Tokyo Institute of Technology
-
OGURA Toshiyuki
Materials and Structures Laboratory, Tokyo Institute of Technology
-
HATTORI Shyuhei
Materials and Structures Laboratory, Tokyo Institute of Technology
-
KOZU Naoshi
School of Engineering, Tokyo University
-
TANAKA Kazuo
Faculty of Engineering and Institute of Laser Engineering, Osaka University
-
OZAKI Norimasa
Faculty of Engineering and Institute of Laser Engineering, Osaka University
-
SASATANI Yasufumi
Faculty of Engineering and Institute of Laser Engineering, Osaka University
-
OHTANI Masayuki
Deportment of Earth and Space Science, Graduate School of Science, Osaka University
-
TSUNEMI Hiroshi
Deportment of Earth and Space Science, Graduate School of Science, Osaka University
-
NOVIKOV Dmitri
Hamburger Syncrotron-Strahrungs Labor. Deutches Electronen-Synchrotron
-
MATERLIK Gerhard
Hamburger Syncrotron-Strahrungs Labor. Deutches Electronen-Synchrotron
-
HIRONAKA Yasuhisa
Faculty of Engineering, Osaka University
-
SHIROUZU Shigenori
R & D Center, Idemitsu Material Co., Ltd.
-
YOSHIDA Mitsuru
Earthquake Research Institute, University of Tokyo
-
YAMADA Akira
Faculty of Technology, Tokyo University of Agriculture and Technology
-
MIZOGUCHI Kohji
Department of Applied Physics, Osaka University
-
Kozu Naoshi
School Of Engineering Tokyo University
-
Ueta Hiroshi
The Department Of Electronic Engineering Osaka University
-
Takenaka H
Ntt Advanced Technology Corp.
-
Ozaki Norimasa
Faculty Of Engineering And Institute Of Laser Engineering Osaka University
-
Miyamoto T
Tokyo Inst. Technol. Tokyo Jpn
-
Miyamoto Tokuo
Department Of Electronics Engineering And Computer Science Faculty Of Engineering Fukuoka University
-
Kondo Ken'ichi
Broadcasting Science Research Laboratories Of Nippon Hoso Kyokai:(present Address) Moririka Electron
-
Kato Yoshitake
Fundamental Research Laboratories Nec Corporation
-
SAKAMOTO Shinichi
Kita-itami Works, Mitsubishi Electric Corporation
-
Hattori Shyuhei
Materials And Structures Laboratory Tokyo Institute Of Technology
-
Moritoh Tatsumi
Materials And Structures Laboratory Tokyo Institute Of Technology
-
Mizoguchi Kohji
Department Of Applied Physics Osaka University
-
Mizoguchi Kohji
Department Of Applied Physics Faculty Of Engineering Osaka City University
-
Matsuoka Shohei
Materials And Structures Laboratory Tokyo Institute Of Technology
-
Tsunemi Hiroshi
Deportment Of Earth And Space Science Graduate School Of Science Osaka University
著作論文
- Spectroscopy of Hard X-Rays (2-15 keV) Generated by Focusing Femtosecond Laser on Metal Targets
- Low Temperature Recovery of Ru(Ba, Sr)TiO_3/Ru Capacitors Degraded by Forming Gas Annealing
- Electrical Properties of (Ba,Sr)TiO_3 Films on Ru Bottom Electrodes Prepared by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition at Extremely Low Temperature and Rapid Thermal Annealing
- Electrical Properties of (Ba,Sr)TiO_3 Films on Ru Bottom Electrodes Prepared by ECR Plasma CVD at Extremely Low Temperature and RTA
- Low Temperature Deposition of (Ba, Sr)TiO_3 Films by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition
- Structural and Electrical Characterization of SrTiO_3 Thin Films Prepared by Metal Organic Chemical Vapor Deposition
- Effective Diffusion Coefficient and Controlling Process of P Diffusion in Si Based on the Pair Diffusion Models of Vacancy and Interstitial Mechanisms
- Bulk Boundary Condition for Numerical Solution of Simultaneous Diffusion Equations of Phosphorus and Point Defects in Silicon
- One Bond-Type Migration of Phosphorus in Silicon by Interstitialcy Mechanism
- Effect of Polishing on Time Dependence of Average Substitutional Impurity Concentration in Dissociative and Kick-Out Mechanisms
- Changes of DLTS Spectrum with Gold Concentration and Gold-Diffusion Temperature in N-Type Silicon
- Annealing of Supersaturated Low-Temperature Substitutional Gold in Silicon
- A Simple Method to Determine λ from Isothermal Capacitance Measurements
- Three States of Substitutional Gold in Silicon
- Effect of Annealing Method upon Annealing Characteristics of Supersaturated Substitutional Gold in Silicon
- Conformational Characteristics of Biphenylene-Ether-Ketone
- Stress-Optical Coefficients in Polycarbonates
- Picosecond Pulsed X-Ray Diffraction from a Pulsed Laser Heated Si(111)
- Time-Resolved X-ray Shadowgraphy Experiment of Laser Ablation of Aluminum using Laser-Induced Picosecond Pulsed X-rays
- Spall behavior of steels under hypervelocity impact
- Laser-Induced Shock Compression of Tantalum to 1.7 TPa
- Energy-Dispersive Synchrotron Radiation Topographic Observation of InAs/GaAs Lattice-Mismatched Layer
- X-ray Penetration Depth for Large Lattice-Mismatched Heteroepitaxial Layer by Dynamical Diffraction Theory using Computer Simulation
- Schematic Model for the Migration of Interstitialcy-Type Self-Interstitial Including the Middle State
- Enhancement of Electroluminescence Intensity from Dye-Doped Poly(3-Alkylthiophene) Light Emitting Diode with Different Alkyl-Side-Chain Length
- Electroluminescent Diodes Utilizing Polysilanes
- Polarity-Dependent Multicolor Organic Electroluminescent Device
- Two-Band Electroluminescent Emission in Organic Electroluminescent Diode with Phthalocyanine Film
- Pulse Response of Electroluminescence in Poly(3-alkylthiophene) Mixed with Fluorescent Dye
- Ultraviolet Electroluminescent Diode Utilizing Poly(methylphenylsilane)
- Unique Electroluminescent Characteristics of Light-Emitting Diode Utilizing Poly(3-alkylthiophene) Containing Fluorescent Dye
- Novel Characteristics of Electrolumimescent Diode with Organic Multiple-Quantum-Well Structure
- Conformational Characteristics of Poly-ether-ether-ketone and Poly-ether-nitrile
- Polarization Anisotropy of Organic Electroluminescent Diode with Periodic Multilayer Structure Utilizing 8-Hydroxyquinoline Aluminum and Aromatic Diamine
- Color-Variable Electroluminescent Diode with Single Quantum Well Structure Utilizing 8-Hydroxyquinoline Aluminum and Aromatic Diamine
- Efficient Energy Transfer in Organic Multilayer Structure Utilizing 8-Hydroxyquinoline Aluminum and Aromatic Diamine
- Unique Dynamic Characteristics of Electroluminescent Diode with Superlattice Structure Utilizing Cyclopentadiene Derivative and Aromatic Diamine
- Novel Optical and Electroluminescent Characteristics in Organic Superlattice Structure Utilizing Cyclopentadiene Derivative and Aromatic Diamine
- Contour Detection of Underground Cylindrical Cavities by Means of Acoustic Pulse Reflection Method
- Characterization of Ion Implantation Dose by Raman Scattering and Photothermal Wave Techniques
- Secondary Defects of As^+ Implanted Silicon Measured by Thermal Wave Technique