Effect of Polishing on Time Dependence of Average Substitutional Impurity Concentration in Dissociative and Kick-Out Mechanisms
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-04-15
著者
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MOROOKA Masami
Fukuoka Institute of Technology
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Yoshida M
Yoshida Semiconductor Lab. Fukuoka Jpn
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TAKAHASHI Manabu
Fukuoka Institute of Technology
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YOSHIDA Masayuki
Kyushu Institute of Design
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