Schematic Model for the Migration of Interstitialcy-Type Self-Interstitial Including the Middle State

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1997-12-15

著者

• Yoshida M

  Functional Materials Research Laboratories Nec Corporation

• Yoshida M

  Yoshida Semiconductor Lab. Fukuoka Jpn

• YOSHIDA Masayuki

  Yoshida Semiconductor Laboralory

• TAKAHASHI Manabu

  Fukuoka Institute of Technology

• TOMOKAGE Hajime

  Department of Electronics, Fukuoka University

• KAMIURA Yoichi

  Faculty of Engineering, Okayama University

• TSURUNO Reiji

  Kyushu Institute of Design

• YOSHIDA Masayuki

  Kyushu Institute of Design

• Tomokage H

  Fukuoka Univ. Fukuoka Jpn

• Tomokage Hajime

  Department Of Electronics Fukuoka University

• Tomokage Hajime

  Department Of Electronics Faculty Of Engineering Fukuoka University

• Tomokage Hajime

  Department Of Electrical Engineering Faculty Of Engineering Kyushu University

• Tsuruno Reiji

  Department Of Visual Communication Design Kyushu Institute Of Design

• Yoshida Masayoshi

  Department Of Electronic Engineering Faculty Of Engineering Osaka University

• Yoshida M

  National Institute Of Advanced Industrial And Science Technology (aist)

• Takahashi M

  Semiconductor Leading Edge Technologies Inc

• Kamiura Y

  Graduate School Of Natural Science And Technology Okayama University

• Kamiura Yoichi

  Faculty Of Engineering Okayama University

• Yashiro M

  Univ. Tokyo Tokyo

• Takahashi Minoru

  Ceramic Engineering Research Laboratory Nagoya Institute Of Technology

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