Structural and Electrical Characterization of SrTiO_3 Thin Films Prepared by Metal Organic Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-09-30
著者
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ISHITANI Akihiko
ULSI Device Development Laboratories, NEC Corporation
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Yoshida M
Functional Materials Research Laboratories Nec Corporation
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YOSHIDA Masaji
Fundamental Research Laboratories, NEC Corporation
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LESAICHERRE Pierre-Yves
ULSI Device Development Laboratories, NEC Corporation
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YAMAGUCHI Hiromu
Fundamental Research Laboratories, NEC Corporation
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SAKUMA Toshiyuki
Fundamental Research Laboratories, NEC Corporation
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MIYASAKA Yoichi
Fundamental Research Laboratories, NEC Corporation
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Yoshida M
Yoshida Semiconductor Lab. Fukuoka Jpn
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Lesaicherre Pierre-yves
Ulsi Device Development Laboratories Nec Corporation
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Yoshida M
National Institute Of Advanced Industrial And Science Technology (aist)
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Lesaicherre P‐y
Ulsi Device Development Laboratories Nec Corporation
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Yoshida Masaji
Fundamental Research Laboratories Nec Corporation
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Yamaguchi H
Matsushita Electric Industrial Co. Ltd. Osaka Jpn
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Yamaguchi H
Ntt Basic Research Laboratories
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Sakuma Toshiyuki
Fundamental Research Laboratories Nec Corporation
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Ishitani Akihiko
Ulsi Device Development Laboratories Nec Corporation
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Yamaguchi Hiromu
Fundamental Research Laboratories Nec Corporation
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Miyasaka Yoichi
Fundamental Research Laboratories Nec Corporation
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